• Title/Summary/Keyword: Laser Micromachining

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Rapid Manufacturing of 3D Micro Products by UV Laser Ablation and Phase Change Filling (UV 레이저 어블레이션과 상변화 충진을 이용한 3차원 마이크로 부품의 쾌속 제작)

  • Shin B. S.;Kim J. G.;Chang W. S.;Whang K. H.
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.11 s.176
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    • pp.196-201
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    • 2005
  • UV laser micromachining are generally used to create microstructures for micro product through a sequence of lithography-based photopatterning steps. However, the micromachining process is not suitable for the rapid realization of complex 3D micro product because it depends on worker experiences, excessive cost and time to make many masks. In this paper, the more effective micro rapid manufacturing process, which is developed upon the base of laser micromachining, is proposed to fabricate micro products directly using UV laser ablation and phase change filling. The filling process is useful to hold the micro product during the next ablation step. The proposed micro rapid manufacturing process is also proven experimentally that enables to fabricate the 3D micro products of UV sensitive polymer from 3D CAD data to functional micro parts.

Fabrication of Electrostatic Electron Lens for Electron Beam Microcolumn using the Laser Micromachining (레이저 미세가공 기술을 이용한 초소형 전자빔 장치용 정전장 전자렌즈의 제작)

  • Ahn, Seung-Jun;Kim, Dae-Wook;Kim, Ho-Seop;Kim, Yeong-Jeong;Lee, Yong-San
    • Korean Journal of Materials Research
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    • v.11 no.9
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    • pp.792-796
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    • 2001
  • For electron beam lithography and SEM(scanning electron microscopy) applications, miniaturized electrostatic lenses called a microcolumn have been fabricated. In this paper, we report the fabrication technique for 20~30$\mu\textrm{m}$ apertures of electron lenses based on silicon and Mo membrane using an active Q-switched Nd:YAG laser. Experimental conditions of laser micromachining for silicon and Mo membrane are improved. The geometrical structures, such as the diameter and the preciseness of the micron-size aperture are dependent upon the total energy of the laser pulse train, laser pulse width, and the diameter of laser spot.

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Micromachining Thin Metal Film Using Laser Photo Patterning Of Organic Self-Assembled Monolayers (유기 자기조립 단분자막의 레이저 포토 패터닝을 이용한 금속 박막의 미세 형상 가공 기술)

  • 최무진;장원석;신보성;김재구
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2003.06a
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    • pp.219-222
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    • 2003
  • Self-Assembled Monolayers(SAMs) by alkanethiol adsorption to thin metal film are widely being investigated for applications as coating layer for anti-stiction or friction reduction and in fabrication of micro structure of molecular and bio molecular. Recently, there have been many researches on micro patterning using the advantages of very thin thickness and etching resistance in selective etching of thin metal film of Self- Assembled Monolayers. In this report, we present the micromachining thin metal film by Mask-Less laser patterning of alknanethiolate Self-Assembled Monolayers.

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Three Dimensional Micromachining using Excimer laser (엑시머 레이저를 이용한 3차원 마이크로가공)

  • ;;;Masuzawa
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1997.10a
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    • pp.1076-1079
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    • 1997
  • A new 3D micromachining method, called Hole Area Modulation(HAM), has been introduced and experimentally confirmed its feasibility. In this method, information on the depth of machining is converted to the sizes of small holes in the mask. The machining is carried out with a simple 2D movement of the workpiece. This method can be applied for machining various kinds of microcavities in various materials. In this paper, a mathematical model for excimer laser micromachining based on HAM and also determination of the optimal laser ablation conditions(width, Hole radius, step size, path, etc.) is completed by employing using Genetic Algorithm(GA).

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Femtosecond Micromachining Applications for Optical Devices

  • Sohn, Ik-Bu;Lee, Man-Seop;Woo, Jeong-Sik
    • Journal of the Optical Society of Korea
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    • v.8 no.3
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    • pp.127-131
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    • 2004
  • This paper investigates applications of femtosecond lasers for the micromachining of transparent materials and fabrication of optical devices. We show commercial micromachining examples of transparent materials which have been fabricated for various applications. Near infrared femtosecond laser processing is an attractive method to fabricate three-dimensional optical waveguides into various transparent materials. Focused femtosecond laser pulses induce a permanent refractive-index change only near the focal point. We also demonstrate a Y coupler with the splitting ratio of 1:1 written by femtosecond laser pulses into a fused silica glass. The minimum propagation loss of 0.8 ㏈/㎝ awl the refractive-index change of 0.006-0.01 at the wavelength of 1550 ㎚ were achieved by optimization of the laser fluence.

Determination of Optimal Excimer Laser Ablation Conditions Using Genetic Algorithm (유전자 알고리즘을 이용한 엑시머 레이저가공의 최적조건 선정)

  • 배창현;최경현;이석희
    • Transactions of the Korean Society of Machine Tool Engineers
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    • v.11 no.6
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    • pp.17-23
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    • 2002
  • A new 3D micromachining method called Hole Area Modulation(HAM), has been introduced to enhance the current micromachining technology. In this method, information on the depth of machining is converted to the sizes of small holes in the mask. The machining is carried out with a simple 2D movement of the workpiece. This method can be applied for machining various kinds of microcavities in various materials. In this paper, a machematical model for excimer laser micromachining based on HAM and also determination of optimal laser ablation conditions(width hole radius, step size, path, etc.) is performed by Genetic Algorithm(GA).

Micromachining Using Laser Beam Machining and Electrochemical Etching (레이저 빔 가공과 전해 에칭을 이용한 미세 가공)

  • Kim, Jang-Woo;Kwon, Min-Ho;Chung, Do-Kwan;Chu, Chong-Nam
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.10
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    • pp.1089-1095
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    • 2012
  • Laser beam machining (LBM) using nanosecond pulsed laser is widely known to be rapid and non-wear process for micromachining. However, the quality itself cannot meet the precision standard due to the recast layer and heat affected zone. In this paper, a fabrication method for machining micro features in stainless steel using a hybrid process of LBM using nanosecond pulsed laser and electrochemical etching (ECE) is reported. ECE uses non-contacting method for precise surface machining and selectively removes the recast layer and heat affected zone produced by laser beam in an effective way. Compared to the single LBM process, the hybrid process of LBM and ECE enhanced the quality of the micro features.

Analysis of die strength for laser dicing (레이저 다이싱에 의한 die strength 분석)

  • Lee, Young-Hyun;Choi, Kyung-Jin;Bae, Sung-Chang
    • Proceedings of the KIEE Conference
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    • 2006.04a
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    • pp.327-329
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    • 2006
  • In this paper, the cutting qualities by laser dicing and fracture strength of a silicon die is investigated. Laser micromachining is the non-contact process using thermal ablation and evaporation mechanisms. By these mechanisms, debris is generated and stick on the surface of wafer, which is the problem to apply laser dicing to semiconductor manufacture process. Unlike mechanical sawing using diamond blade, chipping on the surface and crack on the back side of wafer isn't made by laser dicing. Die strength by laser dicing is measured via the three-point bend test and is compared with the die strength by mechanical sawing. As a results, die strength by laser dicing shows a decrease of 50% in compared with die strength by mechanical sawing.

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Micromachining technology using photosensitive glass (감광성유리를 이용한 마이크로머시닝 기술)

  • Cho, Soo-Je
    • Laser Solutions
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    • v.14 no.1
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    • pp.25-29
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    • 2011
  • Micromachining of photosensitive glass by UV exposure, heat treatment, and etching processes is reported. Like photoresist, the photosensitive glass is also classified into positive and negative types by development characteristics. For the positive type, the exposed area is crystallized and etched away during the etching process in HF solution, whereas the unexposed area is crystallized and etched away for the negative type. The crystallized area of the photosensitive glass has an etch rate approximately 30~100 times faster than that of the amorphous area so that it becomes possible to fabricate microstructures in the glass. Based on the unique properties of glass such as high optical transparency, electrical insulation, and chemical/thermal stability, the glass micromachining technique introduced in this work could be widely applied to various devices in the fields of electronics, bio engineering, nanoelectonics and so on.

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