• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.46-49
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• 2002

Recent trends of low-temperature polycrystalline Si (LTPS) TFT technologies are presented. Characteristics of LTPS TFT processes are compared with those of a-Si TFT's. In order to compete with well-established a-Si TFT-LCD technology, LTPS process has to be as simple as possible. One of the most critical processes, recrystallization of a-Si thin films, could be the process for the differentiation of LTPS technology. Along with these technical reviews, a recent development of the 5.0-inch LTPS TFT-LCD is presented. In order to achieve high-performance display characteristics and save the power consumption, the transflective mode is adopted. The 5.0-inch display with 186 pixel-per-inch, high-resolution LCD was measured to be 10% for the reflectance and 70:1 for the contrast ratio. This display is designed for a high information content hand-held PC (HHPC) application.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1319-1322
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• 2007

Planar PIN photodiode is compatible with LTPS process, and its fabrication requires no additional manufacturing process. In this study we design the optimum dimension of PIN diodes with two nitride layers to improve the efficiency of PIN diodes. The PIN photo sensor shows very good sensitivity to ambient light illuminance.

• 한국정보디스플레이학회:학술대회논문집
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• 2007.08b
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• pp.1340-1343
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• 2007

We have simultaneously fabricated LTPS TFTs and integrated photodiodes on the same glass substrates without any additional LTPS process. The structure of an integrated photodiode is a lateral p-i-n diode with a gate. The performances of a photodiode were improved at a negative gate voltage.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.685-688
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• 2008

Mini-LVDS has been widely used for high speed data transmission because it provides low EMI and high bandwidth for display driver. In this paper, a Mini-LVDS output buffer with LTPS TFT process is presented which provides sufficient performance in the presence of large variation in the threshold voltage and mobility and kink effect.

• 한국정보디스플레이학회:학술대회논문집
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• 2008.10a
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• pp.903-906
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• 2008

We developed the advanced LTPS (A-LTPS) manufacturing process. The a-Si TFT process was combined with selectively enlarging laser crystallization (SELAX) technology to improve the carrier mobility in the region where the peripheral circuits are to be fabricated. A 2.4-inch IPS-pro LCD panel for personal digital assistant use was successfully fabricated using the developed technology.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.1635-1639
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• 2006

LTPS has potential capability to realize various kinds of circuit integrations on panel glass because of its relatively higher field effect mobility of around 100cm2/Vs. Recent progress of LTPS technologies and advanced technologies, which are generally called "System on Glass (SOG)," will be discussed. The technology includes circuit integration, photo-sensor integration for input functions, and display quality and performance improvement.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1029-1032
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• 2005

A 262K-color QVGA LTPS AMLCD was developed. This panel has integrated gate driver and data multiplexer (1:3) by p_Si LTPS TFT process. The commercialized driver IC was adopted to implement this display. Fine image quality, low powerconsumption and cost-efficiency feature make the panel be suitable for mobile application.

• Journal of Information Display
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• v.9 no.3
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• pp.1-7
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• 2008

With the aim of creating a high-quality display system with value-added functions, we designed a current mode multiplexer for LTPS TFT devices. The multiplexers had less than 1 volt logic swing, and speed improvement was evident compared with that of conventional CMOS architecture. We refined the multiplexer to achieve a more stable current steering operation. By using the versatility of the multiplexer, a new NAND/AND and NOR/OR logic gates were designed through the simple modification of signal connections. Two micron LTPS TFT parameters were used during the HSPICE simulation of the circuits.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.11a
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• pp.40-40
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• 2009

The electrical characteristic of the conventional self-aligned polycrystalline silicon (poly-Si) TFTs are known to present several undesired effects such as large leakage current, kink effect and hot-carrier effects. In this paper, LTPS TFTs with different GOLDD length were fabricated and investigated the effect of the GOLDD. GOLDD length of 1, 1.5 and $2{\mu}m$ were used, while the thickness of the gate dielectrics($SiN_x/SiO_2$) was fixed at 65nm(40nm/25nm). The electrical characteristics show that the kink effect is reduced at the LTPS TFTs, and degradation from the hot-carrier effect was also decreased by increasing GOLDD length.

• 한국정보디스플레이학회:학술대회논문집
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• 2006.08a
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• pp.413-418
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• 2006

Highly stable thin-film transistor (TFT) pixel employing both low temperature polycrystalline silicon (LTPS) and amorphous silicon (a-Si) for active matrix organic light emitting diode (AMOLED) is discussed. ELA (excimer laser annealing) LTPS-TFT pixel should compensate $I_{OLED}$ variation caused by the non-uniformity of LTPS-TFT due to the fluctuation of excimer laser energy and amorphous silicon TFT pixel is desired to suppress the decrease of $I_{OLED}$ induced by the degradation of a-Si TFT. We discuss various compensation schemes of both LTPS and a-Si TFT employing the voltage and the current programming.