• 한국재료학회지
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• 제14권4호
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• pp.235-238
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• 2004

The LT-MBE (low temperature molecular beam epitaxy) allows to dope GaAs with Mn over its solubility limit. A 75 urn thick GaMnAs layers are grown on a low temperature grown LT-GaAs buffer layer at a substrate temperature of $260^{\circ}C$ by varying Mn contents ranged from 0.03 to 0.05. The typical growth rate for GaMnAs layer is fixed at 0.97 $\mu\textrm{m}$/h and the V/III ratio is varied from 25 to 34. The electrical and magnetic properties are investigated by Hall effect and superconducting quantum interference device(SQUID) measurements, respectively. Double crystal X-ray diffraction(DCXRD) is also performed to investigate the crystallinity of GaMnAs layers. The $T_{c}$ of the $Ga_{l-x}$ /$Mn_{x}$ As films grown by LT-MBE are enhanced from 38 K to 65 K as x increases from 0.03 into 0.05 whereas the $T_{c}$ becomes lower to 45 K when the V/III ratio increases up to 34 at the same composition of x=0.05. This means that the ferromagnetic exchange coupling between Mn-ion and a hole is affected by the growth condition of the enhanced V/III ratio in which the excess-As and As-antisite defects may be easily incorporated into GaMnAs layer.

• 한국자기학회:학술대회 개요집
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• 한국자기학회 2004년도 동계학술연구발표회 논문개요집
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• pp.42-42
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• 2004

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.78-79
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• 2005

We report on optically excited terahertz (THz) omission from low-temperature (LT) grown GaAs. We have used 70 fs titanium-sapphire laser pulses with wavelengths at 800 nm to generate THz radiation pulses. The LT-GaAs layers are grown on semi-insulating GaAs substrates with GaAs buffer layer by molecular beam epitaxy (MBE). The THz emission from the LT-GaAs surface is strong and does not show any significant variation in the strength of the THz emission over several different angles between the polarization of the excitation laser pulse and the crystallographic orientation of the LT-GaAs.

• 열처리공학회지
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• 제29권3호
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• pp.124-131
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• 2016

GaN and InN epilayers with nucleation layer (LT-buffer) were grown on (0001) sapphire substrates by radio-frequency plasma-assisted molecular beam epitaxy (RF-MBE). As-grown and annealed GaN and InN nucleation layers grown at various growth condition were observed by reflection high-energy electron diffraction (RHEED). When temperature of effusion cell for III source was very low, diffraction pattern with cubic symmetry was observed and zincblende nucleation layer was flattened easily by annealing. As cell temperature increased, LT-GaN and LT-InN showed typical diffraction pattern from wurtzite structure, and FWHM of (10-12) plane decreased remarkably which means much improved crystalline quality. Diffraction pattern was changed to be from streaky to spotty when plasma power was raised from 160 to 220 W because higher plasma power makes more nitrogen adatoms on the surface and suppressed surface mobility of III species. Therefore, though wurtzite nucleation layer was a little hard to be flattened compared to zincblende, higher cell temperature led to easier movement of III surface adatoms and resulted in better crystalline quality of GaN and InN epilayers.

• 한국재료학회지
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• 제18권8호
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• pp.444-449
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• 2008

Samples of GaMnAs, GaMnAs codoped with Be, and GaMnAs simultaneously codoped with Be and Mg were grown via low-temperature molecular beam epitaxy (LT-MBE). Be codoping is shown to take the Ga sites into the lattice efficiently and to increase the conductivity of GaMnAs. Additionally, it shifts the semiconducting behavior of GaMnAs to metallic while the Mn concentration in the GaMnAs solid solution is reduced. However, with simultaneous codoping of GaMnAs with Be and Mg, the Mn concentration increases dramatically several times over that in a GaMnAs sample alone. Mg and Be are shown to eject Mn from the Ga sites to form MnAs and MnGa precipitates.

• 한국진공학회지
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• 제21권5호
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• pp.264-272
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• 2012

본 논문에서는 InGaAs 반도체에 기반한 테라헤르쯔(THz) 송/수신기(Tx/Rx) 제작을 위한 기초 연구로서, InGaAs 박막의 THz 발생 및 검출 특성에 관한 결과를 보고한다. THz 발생과 검출 특성 조사에는 각각 MBE 장비로 고온(HT) 및 저온(LT)에서 성장한 InGaAs 박막이 사용되었으며, THz 발생에는 photo-Dember 표면방출 방법이 시도되었다. HT-InGaAs 기판 위에 제작한 전송선(Ti/Au)의 가장자리에 Ti:Sapphire fs 펄스 레이저(60 ps/83 MHz)를 조사하여 THz파를 발생시켰으며, 이때 THz 검출에는 LT-GaAs가 사용되었다. 시간지연에 따른 전류신호를 Fourier 변환하여 얻은 THz 스펙트럼의 주파수 범위는 약 0.5~2 THz이었으며, 여기 레이저 출력에 대한 신호의 세기는 지수함수적 변화를 보였다. THz 검출 특성에 사용한 LT-InGaAs Rx에는 쌍극자(5/20 ${\mu}m$) 구조의 안테나가 탑재되어 있으며, 차단 주파수는 약 2 THz이었다.