• 제목/요약/키워드: Ion electrical mobility

검색결과 76건 처리시간 0.026초

Effects of CF4 Plasma Treatment on Characteristics of Enhancement Mode AlGaN/GaN High Electron Mobility Transistors

  • Horng, Ray-Hua;Yeh, Chih-Tung
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.62-62
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    • 2015
  • In this study, we study the effects of CF4 plasma treatment on the characteristics of enhancement mode (E-mode) AlGaN/GaN high electron mobility transistors (HEMTs). The CF4 plasma is generated by inductively coupled plasma reactive ion etching (ICP-RIE) system. The CF4 gas is decomposed into fluorine ions by ICP-RIE and then fluorine ions will effect the AlGaN/GaN interface to inhibit the electron transport of two dimension electron gas (2DEG) and increase channel resistance. The CF4 plasma method neither like the recessed type which have to utilize Cl2/BCl3 to etch semiconductor layer nor ion implantation needed high power to implant ions into semiconductor. Both of techniques will cause semiconductor damage. In the experiment, the CF4 treatment time are 0, 50, 100, 150, 200 and 250 seconds. It was found that the devices treated 100 seconds showed best electric performance. In order to prove fluorine ions existing and CF4 plasma treatment not etch epitaxial layer, the secondary ion mass spectrometer confirmed fluorine ions truly existing in the sample which treatment time 100 seconds. Moreover, transmission electron microscopy showed that the sample treated time 100 seconds did not have etch phenomena. Atomic layer deposition is used to grow Al2O3 with thickness 10, 20, 30 and 40 nm. In electrical measurement, the device that deposited 20-nm-thickness Al2O3 showed excellent current ability, the forward saturation current of 210 mA/mm, transconductance (gm) of 44.1 mS/mm and threshold voltage of 2.28 V, ION/IOFF reach to 108. As IV concerning the breakdown voltage measurement, all kinds of samples can reach to 1450 V.

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EQCM법을 이용한 자기조립된 Viologen 유도체의 광학적 특성 및 전기화학적 특성 연구 (Optical and Electrochemical Property of Self-Assembled Monolayers Containing Viologen Derivative by EQCM Study)

  • 이동윤;박상현;박재철;권영수
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2006년도 제37회 하계학술대회 논문집 C
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    • pp.1305-1306
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    • 2006
  • A monolayer assembly of anthracene-viologen linked thiol ($AMVC_{8}SH$) was fabricated on a gold electrode by self-assembly method. Structural property of the self-assembled monolayers (SAMs) was carried out by optical and electrochemical method. Firstly, we investigated PL spectrum and UV/visible absorption for the optical properties in solution state. Secondly, we determined the characteristics of charge transfer in different electrolyte solutions by electrochemical quartz crystal microbalance (EQCM). From the data, the PL spectrum and UV/visible absorption were observed and the well-defined shape peaks were nearly equal charges during redox reactions and existed to an excellent linear relationship between the scan rates and existed to currents. The mass change was determined during redox reaction. The mass change behavior of SAMs was not only governed by the mobility of the ion in the viologen but the valence of the ion in the electrolyte solution.

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유체 시뮬레이션을 이용한 유도결합 Ar/CH4 플라즈마의 특성 분석 (Characterization of Inductively Coupled Ar/CH4 Plasma using the Fluid Simulation)

  • 차주홍;이호준
    • 전기학회논문지
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    • 제65권8호
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    • pp.1376-1382
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    • 2016
  • The discharge characteristics of inductively coupled $Ar/CH_4$ plasma were investigated by fluid simulation. The inductively coupled plasma source driven by 13.56 Mhz was prepared. Properties of $Ar/CH_4$ plasma source are investigated by fluid simulation including Navier-Stokes equations. The schematics diagram of inductively coupled plasma was designed as the two dimensional axial symmetry structure. Sixty six kinds of chemical reactions were used in plasma simulation. And the Lennard Jones parameter and the ion mobility for each ion were used in the calculations. Velocity magnitude, dynamic viscosity and kinetic viscosity were investigated by using the fluid equations. $Ar/CH_4$ plasma simulation results showed that the number of hydrocarbon radical is lowest at the vicinity of gas feeding line due to high flow velocity. When the input power density was supplied as $0.07W/cm^3$, CH radical density qualitatively follows the electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density.

ZnO 스퍼터링에서 기판전압의 변화에 의한 성장 조절 (Control of ZnO Sputtering Growth by Changing Substrate Bias Voltage)

  • ;최재원;전원진;조중열
    • 반도체디스플레이기술학회지
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    • 제16권2호
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    • pp.94-97
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    • 2017
  • Amorphous Si has been used for data processing circuits in flat panel displays. However, low mobility of the amorphous Si is a limiting factor for the data transmission speed. Metal oxides such as ZnO have been studied to replace the amorphous Si. ZnO is a wide bandgap (3.3 eV) semiconductor with high mobility and good optical transparency. When ZnO is grown by sputtering with $O_2$ as an oxidizer, there can be many ion species arising from $O_2$ decomposition. $O^+$, $O_2{^+}$, and $O^-$ ions are expected to be the most abundant species, and it is not clear which one contributes to the ZnO growth. We applied alternating substrate voltage (0 V and -70 V) during sputtering growth. We studied changes in transistor characteristics induced by the voltage switching. We also compared ZnO grown by dc and rf sputtering. ZnO film was grown at $450^{\circ}C$ substrate temperature. ZnO thin-film transistor grown with these methods showed $7.5cm^2/Vsec$ mobility, $10^6$ on-off ratio, and -2 V threshold voltage.

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Polypyrrole를 이용한 전기활성 구동기의 제조 및 특성 (Preparation and Characterization of Polypyrrole Electroactive Actuators)

  • 박정태;최혁렬;김훈모;전재욱;남재도
    • 폴리머
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    • 제25권6호
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    • pp.826-832
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    • 2001
  • 본 연구에서는 폴리피를 (PPy)/gold/mylar 형태의 두 겹의 전기활성 구동기를 제작하였으며, 도판트의 종류에 따른 굽힘 구동 특성에 관한 연구를 수행하였다. 전도성 고분자는 전기적으로 산화/환원이 될 때에는 도판트의 이동에 의하여 부피 변화를 수반하게 된다. 도판트의 크기에 따라, 서로 다른 구동 특성을 나타내었는데, toluene sulfonate와 같은 작은 크기의 도판트는 산화/환원에 따라 PPy 필름의 내외로 자체 이동이 가능하며, 산화시에 PPy의 팽창이 관찰되었다. 그러나, dodecylbenzenesulfonate와 같은 커다란 도판트가 함유된 PPy는 산화/환원시에는 이들의 이온들은 움직임이 없는 것으로 나타났으며 환원시에 작은 양이온($Na^+$)이 필름내부로 유입되며 부피가 증가하는 현상이 관찰되었다.

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Low-Temperature Poly-Si TFT Charge Trap Flash Memory with Sputtered ONO and Schottky Junctions

  • An, Ho-Myoung;Kim, Jooyeon
    • Transactions on Electrical and Electronic Materials
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    • 제16권4호
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    • pp.187-189
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    • 2015
  • A charge-trap flash (CTF) thin film transistor (TFT) memory is proposed at a low-temperature process (≤ 450℃). The memory cell consists of a sputtered oxide-nitride-oxide (ONO) gate dielectric and Schottky barrier (SB) source/drain (S/D) junctions using nickel silicide. These components enable the ultra-low-temperature process to be successfully achieved with the ONO gate stacks that have a substrate temperature of room temperature and S/D junctions that have an annealing temperature of 200℃. The silicidation process was optimized by measuring the electrical characteristics of the Ni-silicided Schottky diodes. As a result, the Ion/Ioff current ratio is about 1.4×105 and the subthreshold swing and field effect mobility are 0.42 V/dec and 14 cm2/V·s at a drain voltage of −1 V, respectively.

실리콘 이온 주입 후 고상 결정화 시킨 다결정 실리콘 TFT의 전기적 특성 (Electrical Characteristics of the Poly-Si TFT using SPC Films after Si Ion Implantation)

  • 이병주;김재영;강문상;구용서;안철
    • 전자공학회논문지A
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    • 제30A권10호
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    • pp.51-58
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    • 1993
  • N-channel TFTs fabricated on the pre-amorphized (by Si ion implantation) and recrystallized Si film having 10.1V threshold voltage, 20.7cm$^{2}$/V$\cdot$s field effect mobility and ~10$^{5}$/ ON/OFF ratio, whowed improved characteristics comparing to those obtained from the as-deposited (by LPCVD) poly Si film which had 11.2V, 9cm$^{2}$/V$\cdot$s and ~10$^{4}$ respectively.

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절연층상에 인을 주입시킨 실리콘 박막의 RTA 방법에 의한 재결정화 (Recrystallization of Phosphorus Ion Implanted Silicon on Insulator(SOI) by RTA Method)

  • 김춘근;김현수;김용태;민석기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1987년도 전기.전자공학 학술대회 논문집(I)
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    • pp.546-548
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    • 1987
  • We have studied 1iquid phase regrowth of phosphorus ion implanted silicon films on insulator (SOI) by rapid thermal annealing (RTA) method. Many twin boundaries were observed on the regrown silicon layer and mobility of the layer was increased from $14\;cm^2/v.sec$ to $38\;cm^2/v.sec$ after annealing at $1150^{\circ}C$ for 15 sec.

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날개전극형 코로나 모터의 기초 회전특성 및 에너지 효율 (Basic Rotation Characteristics and Energy Efficiencies of a Blade-Type Corona Motor)

  • 정재승;문재덕
    • 전기학회논문지
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    • 제59권10호
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    • pp.1862-1868
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    • 2010
  • A corona motor, as one of a powerful cooling means of microelectronic devices, has been employed because of its very simple structure of no coils and no brushes. In this paper, the effect of polarity of applied voltage and the number of blade corona electrodes on the fundamental properties of rotation of the motor was investigated. The I-V and rotation characteristics of the blade corona electrode were significantly different from the different polarities of applied voltages and the blade corona electrode numbers, due to the different space charge effect resulted by the different migration mobility of the positive and negative ions generated near the blade corona electrode tip of the rotor of the motor. The rotation speed of the motor was influenced significantly by the polarity of corona discharge, the number of blades, and mass of rotor. At the same corona current, an effective rotation can be obtained with the positive corona caused by the lower ion mobility. On the other hand, the higher rotation speed can be obtained with the negative corona resulted from its higher corona current. The highest rotation speed and energy efficiency can be obtained with the rotor having 4 blades.

rf 마그네트론 스퍼터링으로 증착한 Mg-doped Zinc Tin Oxide막의 특성에 미치는 산소의 영향 (Effects of Oxygen on the Properties of Mg-doped Zinc Tin Oxide Films Prepared by rf Magnetron Sputtering)

  • 박기철;마대영
    • 한국전기전자재료학회논문지
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    • 제26권5호
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    • pp.373-379
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    • 2013
  • Mg-doped zinc tin oxide (ZTO:Mg) thin films were prepared on glasses by rf magnetron sputtering. $O_2$ was introduced into the chamber during the sputtering. The optical properties of the films as a function of oxygen flow rate were studied. The crystal structure, elementary properties, and depth profiles of the films were investigated by X-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), and secondary ion mass spectrometry (SIMS), respectively. Bottom-gate transparent thin film transistors were fabricated on $N^+$ Si wafers, and the variation of mobility, threshold voltage etc. with the oxygen flow rate were observed.