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http://dx.doi.org/10.5370/KIEE.2016.65.8.1376

Characterization of Inductively Coupled Ar/CH4 Plasma using the Fluid Simulation  

Cha, Ju-Hong (Dept. of Electrical and Computer Engineering, Pusan National University)
Lee, Ho-Jun (Dept. of Electrical and Computer Engineering, Pusan National University)
Publication Information
The Transactions of The Korean Institute of Electrical Engineers / v.65, no.8, 2016 , pp. 1376-1382 More about this Journal
Abstract
The discharge characteristics of inductively coupled $Ar/CH_4$ plasma were investigated by fluid simulation. The inductively coupled plasma source driven by 13.56 Mhz was prepared. Properties of $Ar/CH_4$ plasma source are investigated by fluid simulation including Navier-Stokes equations. The schematics diagram of inductively coupled plasma was designed as the two dimensional axial symmetry structure. Sixty six kinds of chemical reactions were used in plasma simulation. And the Lennard Jones parameter and the ion mobility for each ion were used in the calculations. Velocity magnitude, dynamic viscosity and kinetic viscosity were investigated by using the fluid equations. $Ar/CH_4$ plasma simulation results showed that the number of hydrocarbon radical is lowest at the vicinity of gas feeding line due to high flow velocity. When the input power density was supplied as $0.07W/cm^3$, CH radical density qualitatively follows the electron density distribution. On the other hand, central region of the chamber become deficient in CH3 radical due to high dissociation rate accompanied with high electron density.
Keywords
13.56 Mhz; Fluid simulation; PECVD; $Ar/CH_4$ plasma; Hydro carbon plasma;
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  • Reference
1 H. Biederman, Plasma Polymer Films, Imperial College Press(2004).
2 H. Yasuda, Plasma Polymerization, Academic Press, Inc. (1985).
3 COMSOL Multiphysics Version 4.4 User Guide, December 2013
4 GJM Hagelaar and LC Pitchford "solving the Boltzmann equation to obtain electron transport coefficients and rate coefficients for fluid models", Plasma Sources Sci Technol, 14, 722-733 (2005)   DOI
5 M. Heintze, M. Magureanu, and M. Kettlitz, J. Appl. Phys. 92, 7022(2002)   DOI
6 J. Phys. B: At. Mol. Opt. Phys. 36, 261-271(2003)   DOI
7 Cechan Tian and C R vidal "cross sections of the electron impact dissociative ionization of CO, $CH_4$ and C2H2", Journal of physics B : Atomic, Molecular and Optical Physics, 31, 4
8 D. K. Davies et al, Measurements of swarm parameters and derived electron collision cross section in methane, Journal of Applied physics, 65
9 S.-H Zheng and Santosh K Srivastava "Electron impact ionization and dissociative ionization of acetylene", Journal of Physics B Atomic Molecular and Optical Physics, 29, 14
10 Takashi Kimura et al "properties of inductively coupled rf Ar/H2 plasmas : Experiment and global model", J. Appl. Phys 107, 083308 (2010)   DOI
11 Michael A. Lieberman and Allan J. Lichtenberg, "principles of plasma discharges and materials processing", 547, (2005)
12 K. Peska et al "Mobilities of CH+ in He and of CH+3 in Ar", J Chem phys 77, 5253(1982)   DOI
13 Rovagnati, Beniamino "study of micron/sub-micron particle coating in low pressure plasmas via numerical simulations"(2008)