• Title/Summary/Keyword: Ion distribution

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Monitoring Ion Energy Distribution in Capacitively Coupled Plasmas Using Non-invasive Radio-Frequency Voltage Measurements

  • Choi, Myung-Sun;Lee, Seok-Hwan;Jang, Yunchang;Ryu, Sangwon;Kim, Gon-Ho
    • Applied Science and Convergence Technology
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    • v.23 no.6
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    • pp.357-365
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    • 2014
  • A non-invasive method for ion energy distribution measurement at a RF biased surface is proposed for monitoring the property of ion bombardments in capacitively coupled plasma sources. To obtain the ion energy distribution, the measured electrode voltage is analyzed based on the circuit model which is developed with the linearized sheath capacitance on the assumption that the RF driven sheath behaves like a simple diode for a bias power whose frequency is much lower than the ion plasma frequency. The method is verified by comparing the ion energy distribution function obtained from the proposed model with the experimental result taken from the ion energy analyzer in a dual cathode capacitively coupled plasma source driven by a 100 MHz source power and a 400 kHz bias power.

The design and fabricationt for ion fraction measurement of plasma generator (플라즈마발생기의 이온분율 측정 장치 설계 및 제작)

  • Lee, Chan-Young
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.11a
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    • pp.368-368
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    • 2008
  • Ion implantation has been widely developed during the past decades to become a standard industrial tool. To comply with the growing needs in ion implantation, innovative technology for the control of ion beam parameters is required. Beam current, beam profile, ion fractions are of great interest when uniformity of the implant is an issue. Especially, it is important to measure the spatial distribution of beam power and also the energy distribution of accelerated ions. This energy distribution is influenced by the proportion of mass for ion in the plasma generator(ion source) and by charge exchange and dissociation within the accelerator structure and also by possible collective effects in the neutralizer which may affect the energy and divergence of ions. Hydrogen atom has been the object of a good study to investigate the energy distribution. Hydrogen ion sources typically produce multi-momentum beams consisting of atomic ion ($H^+$) and molecular ion ($H_2^+$ and $H_3^+$). In the beam injector, the molecular ions pass through a charge-exchanges gas cell and break up into atomic with one-half (from $H_2^+$) or one-third (from $H_3^+$) according to their accelerated energy. Burrell et al. have observed the Doppler shifted lines from incident $H^+$, $H_2^+$, and $H_3^+$ using a Doppler shift spectroscopy. Several authors have measured the proportion of mass for hydrogen ion and deuterium using an ion source equipped with a magnetic dipole filter. We developed an ion implanter with 50-KeV and 20-mA ion source and 100-keV accelerator tube, aiming at commercial uses. In order to measure the proportion of mass for ions, we designed a filter system which can be used to measure the ion fraction in any type of ion source. The hydrogen and helium ion species compositions are used a filter system with the two magnets configurations.

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Molecular dynamics simulation of ultra-low energy ion implantation for GSI device technology development (GSI소자 개발을 위한 극 저 에너지 이온 주입에 대한 분자 역학 시뮬레이션)

  • 강정원;손명식;황호정
    • Journal of the Korean Institute of Telematics and Electronics D
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    • v.35D no.3
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    • pp.18-27
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    • 1998
  • Molecular dynamicsinvestigations of ion implantation considering point defect generation were performed with ion energies in the range of ~1keV, Simulation starts perfect diamond cubic lattice site. Stillinger-Weber potential and ZBL potential were used to calculate forces between atoms. We have simulated slowing-down of ion velocity, ion trajectory and coupled-coing between ion and silicon. We also discussed distribution of point defect using rdial distribution function. We found that interstitial produced by ion bombardment mainly formed interstitial cluster.

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The guided field distribution characteristics in the ion-exchange channel glass waveguide (이온 교환 채널 유리 도파로의 도파광 분포특성)

  • 박정일;박태성;천석표;정홍배
    • Electrical & Electronic Materials
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    • v.8 no.3
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    • pp.332-339
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    • 1995
  • In this paper, it was investigated the guided field intensity distribution of the channel in the silver & potassium ion-exchange glass-waveguide. The guided field intensity distribution analysis of ion-exchange glass-waveguide was based on the combination of the WKB dispersion relationship method with a Gaussian distribution function of refractive index profile and the Field Shadow method to the modeling of the channel waveguide. As the results of the channel waveguide modeling, it was represented 2-dimensional and 3-dimensional field distribution of ion-exchange glass waveguide.

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Separation of Alkali and Alkaline Earth Metal Ions using Novel HDBPDA Ion Exchanger and Its Ion Exchange Characteristics (새로운 HDBPDA 이온교환체를 사용한 알칼리 및 알칼리토금속 이온들의 분리와 그의 이온교환특성)

  • Kim, Dong-Won;Kim, Chang-Suk;Choi, Ki-Young;Jeon, Young-Shin;Yoon, Yeo-Hag
    • Journal of the Korean Chemical Society
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    • v.37 no.9
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    • pp.820-825
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    • 1993
  • The ion exchange capacity of HDBPDA ion exchanger, {(4,5) : (13,14)-dibenzo-6,9,12-trioxa-3,15,21-triazabicyclo[15.3.l]heneicosa-(1,17,19)(18,20,21) triene ion exchanger: HDBPDA ion exchanger} was 3.8 meq/g. The distribution coefficients of alkali and alkaline earth metal ions in water and the various concentration of hydrochloric acid were determined. Concentration of hydrochloric acid have almost not influenced on the distribution coefficients of alkali and alkaline earth metal ions, but generally, the distribution coefficient was slightly increased with decrease of concentration of hydrochloric acid. The distribution coefficients of metal ions in water are larger than those of various hydrochloric acid concentrations. Also, alkali and alkaline earth metal ions are separated by column ion exchange chromatography using HDBPDA ion exchange with water as eluent. The distribution coefficents of alkali and alkaline earth metal ions were increased with increase of ionic radii of metal ions.

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Electrode Charging Effect on Ion Energy Distribution of Dual-Frequency Driven Capacitively Coupled Plasma Etcher (이중 주파수 전원의 용량성 결합 플라즈마 식각장비에서 전극하전에 의한 입사이온 에너지분포 변화연구)

  • Choi, Myung-Sun;Jang, Yunchang;Lee, Seok-Hwan;Kim, Gon-Ho
    • Journal of the Semiconductor & Display Technology
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    • v.13 no.3
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    • pp.39-43
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    • 2014
  • The effect of electrode charging on the ion energy distribution (IED) was investigated in the dual-frequency capacitively coupled plasma source which was powered of 100 MHz RF at the top electrode and 400 kHz bias on the bottom electrode. The charging property was analyzed with the distortion of the measured current and voltage waveforms. The capacitance and the resistance of electrode sheath can change the property of ion and electron charging on the electrode so it is sensitive to the plasma density which is controlled by the main power. The ion energy distribution was estimated by equivalent circuit model, being compared with the measured distribution obtained from the ion energy analyzer. Results show that the low frequency bias power changes effectively the low energy population of ion in the energy distribution.

Study on the deposition rate and vapor distribution of Al films prepared by vacuum evaporation and arc-induced ion plating (증착방법에 따른 Al 피막의 증착율 및 증기분포에 관한 연구)

  • 정재인;정우철;손영호;이득진;박성렬
    • Journal of the Korean Vacuum Society
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    • v.9 no.3
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    • pp.207-215
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    • 2000
  • Al films on cold-rolled steel sheet have been prepared by vacuum evaporation and arc-induced ion plating, respectively, and the evaporation rate and vapor distribution (thickness distribution over the substrate) have been investigated according to deposition conditions. The arc-induced ion plating (AIIP) method have been employed, which makes use of arc-like discharge current induced by ionization electrode located near the evaporation source. The AIIP takes advantage of high ionization rate compared with conventional ion plating, and can be carried out at low pressure of less than $10^{-4}$ torr. Very high evaporation rate of more than 2.0 mu\textrm{m}$/min could be achieved for Al evaporation using alumina liner by electron beam evaporation. The geometry factor n for the $cos^{n/\phi}$ vapor distribution, which affects the thickness distribution of films at the substrate turned out to be around 1 for vacuum evaporation, while it features around 2 or higher for ion plating. For the ion plated films, it has been found that the ionization condition and substrate bias are the main parameters to affect the thickness distribution of the films.

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Development of Ion Beam Monte Carlo Simulation and Analysis of Focused Ion Beam Processing (이온빔 몬테 카를로 시물레이션 프로그램 개발 및 집속 이온빔 공정 해석)

  • Kim, Heung-Bae
    • Journal of the Korean Society for Precision Engineering
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    • v.29 no.4
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    • pp.479-486
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    • 2012
  • Two of fundamental approaches that can be used to understand ion-solid interaction are Monte Carlo (MC) and Molecular Dynamic (MD) simulations. For the simplicity of simulation Monte Carlo simulation method is widely preferred. In this paper, basic consideration and algorithm of Monte Carlo simulation will be presented as well as simulation results. Sputtering caused by incident ion beam will be discussed with distribution of sputtered particles and their energy distributions. Redeposition of sputtered particles that are experienced refraction at the substrate-vacuum interface additionally presented. In addition, reflection of incident ions with reflection coefficient will be presented together with spatial and energy distributions. This Monte Carlo simulation will be useful in simulating and describing ion beam related processes such as Ion beam induced deposition/etching process, local nano-scale distribution of focused ion beam implanted ions, and ion microscope imaging process etc.

Fracture Analysis Considering the Non-uniform Corrosion Distribution (비선형 부식분포를 고려한 철근덮개 파괴해석)

  • 오병환;장봉석
    • Proceedings of the Korea Concrete Institute Conference
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    • 2001.11a
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    • pp.1041-1044
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    • 2001
  • This study was performed to evaluate the effect of non-uniform corrosion distribution on the analysis of concrete cover failure. A series of experiments have been undertaken to measure the corrosion rate of reinforcement according to the concentration of chloride ion so as to suggest a relationship between the reinforcement corrosion rate and chloride ion density. The corrosion induced pressure depending on the density of chloride ion has been derived. And nonlinear analysis assuming nonlinear corrosion distribution for cover cracking was achieved and compared with other experimental results to verify the accuracy of the model. Analysis was also performed for various parameters to compare their effects.

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Modeling of sulfate ionic diffusion in porous cement based composites: effect of capillary size change

  • Gospodinov, Peter N.
    • Computers and Concrete
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    • v.4 no.2
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    • pp.157-166
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    • 2007
  • The paper considers a theoretical model to study sulfate ion diffusion in saturated porous media - cement based mineral composites, accounting for simultaneous effects, such as filling micro-capillaries (pores) with ions and chemical products and liquid push out of them. Pore volume change and its effect on the distribution of ion concentration within the specimen are investigated. Relations for the distribution of the capillary relative radius and volume within the composite under consideration are found. The numerical algorithm used is further completed to consider capillary size change and the effects accompanying sulfate ion diffusion. Ion distribution within the cross section and volume of specimens fabricated from mineral composites is numerically studied, accounting for the change of material capillary size and volume. Characteristic cases of 2D and 3D diffusion are analyzed. The results found can be used to both assess the sulfate corrosion in saturated systems and predict changes occurring in the pore structure of the composite as a result of sulfate ion diffusion.