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http://dx.doi.org/10.7736/KSPE.2012.29.4.479

Development of Ion Beam Monte Carlo Simulation and Analysis of Focused Ion Beam Processing  

Kim, Heung-Bae (SEC Co., LTD.)
Publication Information
Journal of the Korean Society for Precision Engineering / v.29, no.4, 2012 , pp. 479-486 More about this Journal
Abstract
Two of fundamental approaches that can be used to understand ion-solid interaction are Monte Carlo (MC) and Molecular Dynamic (MD) simulations. For the simplicity of simulation Monte Carlo simulation method is widely preferred. In this paper, basic consideration and algorithm of Monte Carlo simulation will be presented as well as simulation results. Sputtering caused by incident ion beam will be discussed with distribution of sputtered particles and their energy distributions. Redeposition of sputtered particles that are experienced refraction at the substrate-vacuum interface additionally presented. In addition, reflection of incident ions with reflection coefficient will be presented together with spatial and energy distributions. This Monte Carlo simulation will be useful in simulating and describing ion beam related processes such as Ion beam induced deposition/etching process, local nano-scale distribution of focused ion beam implanted ions, and ion microscope imaging process etc.
Keywords
Focused Ion Beam; Microfabrication; Redeposition; Monte Carlo Simulation;
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Times Cited By KSCI : 1  (Citation Analysis)
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1 Fu, Y. and Bryan, N., "Fabrication of threedimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling," J. Vac. Sci. Technol. B, Vol. 22, No. 4, pp. 1672-1678, 2004.   DOI
2 Orloff, J., "Handbook of Charged Particle Optics," CRC Press, pp. 129-160, 2009.
3 Ivor, I. and Julius, J. M., "The Physics of Micro/Nano-fabrication," Plenum Press, 1992.
4 Kaesmaier, R. and Loschner, H., "Ion Projection Lithography: Progress of European MEDEA & International Program," Microelectron. Eng., Vol. 53, No. 1, pp. 37-45, 2000.   DOI
5 Frey, L., Lehrer, C. and Ryssel, H., "Nanoscale Effects in Focused Ion Beam Processing," Appl. Phys. A, Vol. 76, No. 7, pp. 1017-1023, 2003.   DOI
6 Kim, H. B. and Noh, S. L., "The Characteristics of focused ion beam utilized mold fabrication on the micro/nano scale," Journal of the Korean Society for Precision Engineering, Vol. 28, No. 8, pp. 966-974, 2011.   과학기술학회마을
7 Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Level set approach for the simulation of focused ion beam processing on the micro/nano scale," Nanotechnology, Vol. 18, No. 26, Paper No. 265307, 2007.   DOI
8 Eckstein, W., "Computer simulation of Ion-Solid Interactions," Springer-Verlag, 1991.
9 Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Full three-dimensional simulation of focused ion beam micro/nanofabrication," Nanotechnology, Vol. 18, No. 24, Paper No. 245303, 2007.   DOI
10 Smith, R., "Atom & ion collision in solids and at surfaces," Cambridge University Press, 1997.
11 Matsui, S., "Three-dimensional nanostructure fabrication by focused ion beam chemical vapour deposition," Springer Handbook of Nanotechnology, Part A, pp. 211-229, 2010.
12 Young, R. J., Cleaver, J. R. A. and Ahmed, H., "Characteristics of gas-assisted focused ion beam etching," J. Vac. Sci. Technol. B, Vol. 11, No. 2, pp. 234-241, 1993.   DOI
13 Vasile, M. J., Xie, J. and Nassar, R. J., "Depth control of focused ion-beam milling a numerical model of the sputtered process," J, Vac. Sci. Technol. B, Vol. 17, No. 6, pp. 3085-3090, 1999.   DOI
14 Tseng, A. A., "Recent Developments in Micromilling using Focused Ion Beam Technology," J. Micromech. Microeng., Vol. 14, No. 4, pp. R15-R34, 2004.   DOI   ScienceOn
15 Patterson, N., Adams, D. P., Hodges, V. C., Vasile, M. J., Michael, J. R. and Kotula, P. G., "Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection," Nanotechnology, Vol. 19, No. 23, Paper No. 235304, 2008.   DOI