Journal of the Korean Society for Precision Engineering (한국정밀공학회지)

Korean Society for Precision Engineering (한국정밀공학회)
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Development of Ion Beam Monte Carlo Simulation and Analysis of Focused Ion Beam Processing

이온빔 몬테 카를로 시물레이션 프로그램 개발 및 집속 이온빔 공정 해석

  • Received : 2011.08.11
  • Accepted : 2011.12.17
  • Published : 2012.04.01
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Abstract

Two of fundamental approaches that can be used to understand ion-solid interaction are Monte Carlo (MC) and Molecular Dynamic (MD) simulations. For the simplicity of simulation Monte Carlo simulation method is widely preferred. In this paper, basic consideration and algorithm of Monte Carlo simulation will be presented as well as simulation results. Sputtering caused by incident ion beam will be discussed with distribution of sputtered particles and their energy distributions. Redeposition of sputtered particles that are experienced refraction at the substrate-vacuum interface additionally presented. In addition, reflection of incident ions with reflection coefficient will be presented together with spatial and energy distributions. This Monte Carlo simulation will be useful in simulating and describing ion beam related processes such as Ion beam induced deposition/etching process, local nano-scale distribution of focused ion beam implanted ions, and ion microscope imaging process etc.

Keywords

References

  1. Ivor, I. and Julius, J. M., "The Physics of Micro/Nano-fabrication," Plenum Press, 1992.
  2. Kaesmaier, R. and Loschner, H., "Ion Projection Lithography: Progress of European MEDEA & International Program," Microelectron. Eng., Vol. 53, No. 1, pp. 37-45, 2000. https://doi.org/10.1016/S0167-9317(00)00263-X
  3. Frey, L., Lehrer, C. and Ryssel, H., "Nanoscale Effects in Focused Ion Beam Processing," Appl. Phys. A, Vol. 76, No. 7, pp. 1017-1023, 2003. https://doi.org/10.1007/s00339-002-1943-1
  4. Kim, H. B. and Noh, S. L., "The Characteristics of focused ion beam utilized mold fabrication on the micro/nano scale," Journal of the Korean Society for Precision Engineering, Vol. 28, No. 8, pp. 966-974, 2011.
  5. Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Level set approach for the simulation of focused ion beam processing on the micro/nano scale," Nanotechnology, Vol. 18, No. 26, Paper No. 265307, 2007. https://doi.org/10.1088/0957-4484/18/26/265307
  6. Kim, H. B., Hobler, G., Steiger, A., Lugstein, A. and Bertagnolli, E., "Full three-dimensional simulation of focused ion beam micro/nanofabrication," Nanotechnology, Vol. 18, No. 24, Paper No. 245303, 2007. https://doi.org/10.1088/0957-4484/18/24/245303
  7. Smith, R., "Atom & ion collision in solids and at surfaces," Cambridge University Press, 1997.
  8. Eckstein, W., "Computer simulation of Ion-Solid Interactions," Springer-Verlag, 1991.
  9. Matsui, S., "Three-dimensional nanostructure fabrication by focused ion beam chemical vapour deposition," Springer Handbook of Nanotechnology, Part A, pp. 211-229, 2010.
  10. Young, R. J., Cleaver, J. R. A. and Ahmed, H., "Characteristics of gas-assisted focused ion beam etching," J. Vac. Sci. Technol. B, Vol. 11, No. 2, pp. 234-241, 1993. https://doi.org/10.1116/1.586708
  11. Vasile, M. J., Xie, J. and Nassar, R. J., "Depth control of focused ion-beam milling a numerical model of the sputtered process," J, Vac. Sci. Technol. B, Vol. 17, No. 6, pp. 3085-3090, 1999. https://doi.org/10.1116/1.590959
  12. Tseng, A. A., "Recent Developments in Micromilling using Focused Ion Beam Technology," J. Micromech. Microeng., Vol. 14, No. 4, pp. R15-R34, 2004. https://doi.org/10.1088/0960-1317/14/4/R01
  13. Patterson, N., Adams, D. P., Hodges, V. C., Vasile, M. J., Michael, J. R. and Kotula, P. G., "Controlled fabrication of nanopores using a direct focused ion beam approach with back face particle detection," Nanotechnology, Vol. 19, No. 23, Paper No. 235304, 2008. https://doi.org/10.1088/0957-4484/19/23/235304
  14. Fu, Y. and Bryan, N., "Fabrication of threedimensional microstructures by two-dimensional slice by slice approaching via focused ion beam milling," J. Vac. Sci. Technol. B, Vol. 22, No. 4, pp. 1672-1678, 2004. https://doi.org/10.1116/1.1761460
  15. Orloff, J., "Handbook of Charged Particle Optics," CRC Press, pp. 129-160, 2009.

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