• Applied Science and Convergence Technology
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• 제23권6호
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• pp.357-365
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• 2014

A non-invasive method for ion energy distribution measurement at a RF biased surface is proposed for monitoring the property of ion bombardments in capacitively coupled plasma sources. To obtain the ion energy distribution, the measured electrode voltage is analyzed based on the circuit model which is developed with the linearized sheath capacitance on the assumption that the RF driven sheath behaves like a simple diode for a bias power whose frequency is much lower than the ion plasma frequency. The method is verified by comparing the ion energy distribution function obtained from the proposed model with the experimental result taken from the ion energy analyzer in a dual cathode capacitively coupled plasma source driven by a 100 MHz source power and a 400 kHz bias power.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.368-368
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• 2008

Ion implantation has been widely developed during the past decades to become a standard industrial tool. To comply with the growing needs in ion implantation, innovative technology for the control of ion beam parameters is required. Beam current, beam profile, ion fractions are of great interest when uniformity of the implant is an issue. Especially, it is important to measure the spatial distribution of beam power and also the energy distribution of accelerated ions. This energy distribution is influenced by the proportion of mass for ion in the plasma generator(ion source) and by charge exchange and dissociation within the accelerator structure and also by possible collective effects in the neutralizer which may affect the energy and divergence of ions. Hydrogen atom has been the object of a good study to investigate the energy distribution. Hydrogen ion sources typically produce multi-momentum beams consisting of atomic ion ($H^+$) and molecular ion ($H_2^+$ and $H_3^+$). In the beam injector, the molecular ions pass through a charge-exchanges gas cell and break up into atomic with one-half (from $H_2^+$) or one-third (from $H_3^+$) according to their accelerated energy. Burrell et al. have observed the Doppler shifted lines from incident $H^+$, $H_2^+$, and $H_3^+$ using a Doppler shift spectroscopy. Several authors have measured the proportion of mass for hydrogen ion and deuterium using an ion source equipped with a magnetic dipole filter. We developed an ion implanter with 50-KeV and 20-mA ion source and 100-keV accelerator tube, aiming at commercial uses. In order to measure the proportion of mass for ions, we designed a filter system which can be used to measure the ion fraction in any type of ion source. The hydrogen and helium ion species compositions are used a filter system with the two magnets configurations.

• 전자공학회논문지D
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• 제35D권3호
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• pp.18-27
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• 1998

Molecular dynamicsinvestigations of ion implantation considering point defect generation were performed with ion energies in the range of ~1keV, Simulation starts perfect diamond cubic lattice site. Stillinger-Weber potential and ZBL potential were used to calculate forces between atoms. We have simulated slowing-down of ion velocity, ion trajectory and coupled-coing between ion and silicon. We also discussed distribution of point defect using rdial distribution function. We found that interstitial produced by ion bombardment mainly formed interstitial cluster.

• E2M - 전기 전자와 첨단 소재
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• 제8권3호
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• pp.332-339
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• 1995

In this paper, it was investigated the guided field intensity distribution of the channel in the silver & potassium ion-exchange glass-waveguide. The guided field intensity distribution analysis of ion-exchange glass-waveguide was based on the combination of the WKB dispersion relationship method with a Gaussian distribution function of refractive index profile and the Field Shadow method to the modeling of the channel waveguide. As the results of the channel waveguide modeling, it was represented 2-dimensional and 3-dimensional field distribution of ion-exchange glass waveguide.

• 대한화학회지
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• 제37권9호
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• pp.820-825
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• 1993

새로운 HDBPDA 이온교환체, {(4,5) : (13,14)-dibenzo-6,9,12-trioxa-3,15,21-triazabicyclo[15.3.l]heneicosa-(1,17,19)(18,20,21) triene ion exchanger: HDBPDA ion exchanger}의 이온교환용량은 3.8 meq/g이었다. 그리고 이 이온교환체에 대한 알칼리 및 알칼리토금속 이온들의 분포계수를 물과, 여러 농도의 염산용액중에서 측정하였다. 금속이온들의 분포계수는 염산농도의 영향을 거의 받지 않았으나, 대체적으로 염산의 농도가 감소할수록 점진적으로 약간 증가하는 경향을 보였다. 그리고 물속에서의 분포계수가 가장 컸다. HDBPDA 이온교환체를 사용하여 알칼리 및 알칼리토금속 이온들을 컬럼이온교환크로마토그래피로 분리하였으며, 이때 용리액으로 물을 사용하였다. 또한 알칼리 및 알칼리토금속 이온들의 분포계수는 그들 이온들의 이온반경이 증가함에 따라 증가하였다.

• 반도체디스플레이기술학회지
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• 제13권3호
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• pp.39-43
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• 2014

The effect of electrode charging on the ion energy distribution (IED) was investigated in the dual-frequency capacitively coupled plasma source which was powered of 100 MHz RF at the top electrode and 400 kHz bias on the bottom electrode. The charging property was analyzed with the distortion of the measured current and voltage waveforms. The capacitance and the resistance of electrode sheath can change the property of ion and electron charging on the electrode so it is sensitive to the plasma density which is controlled by the main power. The ion energy distribution was estimated by equivalent circuit model, being compared with the measured distribution obtained from the ion energy analyzer. Results show that the low frequency bias power changes effectively the low energy population of ion in the energy distribution.

• 한국진공학회지
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• 제9권3호
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• pp.207-215
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• 2000

진공증착 및 이온플레이팅 방법을 이용하여 냉간 압연된 강판상에 알루미늄피막을 형성시킨 후, 증발율 및 증기분포 변화를 측정하고 각 증착방법에서의 증발율에 따른 증기분포 변화를 비교 및 검토하였다. 본 실험에서의 이온플레이팅은 증발원 근처에 이온화 전극을 설치하는 방법으로 고전류 아크방전을 유도하여 $10^{-4}$ Torr 이하에서도 기존의 이온플레이팅에 비해 높은 이온화율을 얻을 수 있는 아크방전 유도형 이온플레이팅(Arc-induced ion Plating; AIIP) 방법을 이용하였다. 전자빔을 이용하면서 알루미나 크루시블을 사용하여 알루미늄을 증발시킬 경우 분당 2.0 $\mu\textrm{m}$이상의 높은 증발율을 얻을 수 있었으며, 이온플레이팅의 경우 이온화된 증기의 상호작용에 따른 산란 효과로 증발율이 다소 낮아짐을 알 수 있었다. $cos^{n/\phi}$로 이루어지는 증기분포의 결정인자(n)의 값이 진공증착의 경우는 1에 근접하는 것으로 나타났고 AIIP의 경우는 2 또는 그보다 더 큰 값으로 이루어지는 것을 확인하였다. 이로부터 이온플레이팅의 경우 이온화율 또는 기판 바이어스 전압의 효과가 다른 조건에 비해 증기분포에 더 크게 영향을 미치는 것을 확인할 수 있었다.

• 한국정밀공학회지
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• 제29권4호
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• pp.479-486
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• 2012

Two of fundamental approaches that can be used to understand ion-solid interaction are Monte Carlo (MC) and Molecular Dynamic (MD) simulations. For the simplicity of simulation Monte Carlo simulation method is widely preferred. In this paper, basic consideration and algorithm of Monte Carlo simulation will be presented as well as simulation results. Sputtering caused by incident ion beam will be discussed with distribution of sputtered particles and their energy distributions. Redeposition of sputtered particles that are experienced refraction at the substrate-vacuum interface additionally presented. In addition, reflection of incident ions with reflection coefficient will be presented together with spatial and energy distributions. This Monte Carlo simulation will be useful in simulating and describing ion beam related processes such as Ion beam induced deposition/etching process, local nano-scale distribution of focused ion beam implanted ions, and ion microscope imaging process etc.

• 한국콘크리트학회:학술대회논문집
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• 한국콘크리트학회 2001년도 가을 학술발표회 논문집
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• pp.1041-1044
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• 2001

This study was performed to evaluate the effect of non-uniform corrosion distribution on the analysis of concrete cover failure. A series of experiments have been undertaken to measure the corrosion rate of reinforcement according to the concentration of chloride ion so as to suggest a relationship between the reinforcement corrosion rate and chloride ion density. The corrosion induced pressure depending on the density of chloride ion has been derived. And nonlinear analysis assuming nonlinear corrosion distribution for cover cracking was achieved and compared with other experimental results to verify the accuracy of the model. Analysis was also performed for various parameters to compare their effects.

• Computers and Concrete
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• 제4권2호
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• pp.157-166
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• 2007

The paper considers a theoretical model to study sulfate ion diffusion in saturated porous media - cement based mineral composites, accounting for simultaneous effects, such as filling micro-capillaries (pores) with ions and chemical products and liquid push out of them. Pore volume change and its effect on the distribution of ion concentration within the specimen are investigated. Relations for the distribution of the capillary relative radius and volume within the composite under consideration are found. The numerical algorithm used is further completed to consider capillary size change and the effects accompanying sulfate ion diffusion. Ion distribution within the cross section and volume of specimens fabricated from mineral composites is numerically studied, accounting for the change of material capillary size and volume. Characteristic cases of 2D and 3D diffusion are analyzed. The results found can be used to both assess the sulfate corrosion in saturated systems and predict changes occurring in the pore structure of the composite as a result of sulfate ion diffusion.