• 제목/요약/키워드: Ion beam exposure

검색결과 104건 처리시간 0.031초

이온빔 처리를 통한 은나노와이어 전극의 전기적 특성과 안정성 향상 (Improvement of Electrical Property and Stability of Silver Nanowire Transparent Electrode Via Ion-beam Treatment)

  • 정성훈;이승훈;김도근
    • 한국표면공학회지
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    • 제50권6호
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    • pp.455-459
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    • 2017
  • The development of flexible transparent electrode has been paid attention for flexible electronics. In this study, we have developed transparent electrode based on silver nanowires with improved electrical property and stability through ion-beam treatment. The energetic particles of ion-beam could sinter junctions of each silver nanowires and etch out polyvinylpyrollidone(PVP) coated on silver nanowires. The sheet resistance of silver nanowire transparent electrode was reduced by 74%, and the resistance uniformity was increased about 3 times after exposure of ion beam. Moreover, the stability at $85^{\circ}C$ of temperature and 85% of relative humidity could be also improved.

Statistical Modeling of Pretilt Angle Control using Ion-beam Alignment on Nitrogen Doped Diamond-like Carbon Thin Film

  • Kang, Hee-Jin;Lee, Jung-Hwan;Han, Jung-Min;Yun, Il-Gu;Seo, Dae-Shik
    • Transactions on Electrical and Electronic Materials
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    • 제7권6호
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    • pp.297-300
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    • 2006
  • The response surface modeling of the pretilt angle control using ion-beam (IB) alignment on nitrogen doped diamond-like carbon (NDLC) thin film layer is investigated. This modeling is used to analyze the variation of the pretilt angle under various process conditions. IB exposure angle and IB exposure time are considered as input factors. The analysis of variance technique is settled to analyze the statistical significance, and effect plots are also investigated to examine the relationships between the process parameters and the response. The model can allow us to reliably predict the pretilt angle with respect to the varying process conditions.

Evolution the surface morphology and mechanical properties of Polyimide induced by Ion Beam Irradiation

  • Ahmed, Sk. Faruque;Nho, Gun-Ho;Moon, Myoung-Woon;Han, Jun-Hyun;Lee, Kwang-Ryeol
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2009년도 제38회 동계학술대회 초록집
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    • pp.98-98
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    • 2010
  • Ion beam irradiation has been extensively used for surface modification of polymers, glassy metals and amorphous and crystalline materials at micron and submicron scales. The surface structures created by exposure to an ion beam range from dots, steps and one-dimensional straight wrinkles to highly complex hierarchical undulations and ripples. In general, the morphology of these nanoscale features can be selected by controlling the ion beam parameters (e.g. fluence and acceleration voltage), making ion beam irradiation a promising method for the surface engineering of materials. In the work, we presented that ion beam irradiation results in creation of a peculiar nanoscale dimple-like structure on the surface of polyimide - a common polymer in electronics, large scale structures, automobile industry, and biomedical applications. The role of broad Ar ion beam on the morphology of the structural features was investigated and insights into the mechanisms of formation of these nanoscale features were provided. Moreover, a systematic experimental study was performed to quantify the role of ion beam treatment time, and thus the morphology, on the coefficient of friction of polyimide surfaces covered by nanostructure using a tribo-experiment. Nano-indentation experiment were performed on the ion beam treated surfaces which shows that the hardness as well as the elastic modulus of the polyimide surface increased with increase of Ar ion beam treatment time. The increased of hardness of polyimide have been explained in terms of surface structure as well as morphology changes induced by Ar ion beam treatment.

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집속 이온빔 리소그라피의 몬데칼로 전산 모사 (Monte-Carlo Simulation of Focused ton Beam Lithography)

  • 이현용;정홍배
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1993년도 추계학술대회 논문집
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    • pp.134-136
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    • 1993
  • Microelectronic fabrication technology .is based on the use of lithsgraphy to create small linewidths and patterns that make up ULSI. In previous papers, we discussed the theoretically calculated values such as ion range, ion concentration,ion transmission coefficient and the defocused ion beam-induced characteristics in a-Se$_{75}$Ge$_{25}$. In this paper, the typical Monte Carlo (MC) simulation results and p개cedures for the focused ion beam lithography were presented. The interaction and scattering of ions with the resist depend on the beam energy, impact parameter arid resist parameters. For ion exposure simulations, the quantity of interest is the spatial distribution of energy deposited by ions in the resist due to interaction phenomena with resist ions.s.s.

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무기막에서의 수형배향된 액정의 특성에 대한 연구 (Inorganic Thin film for Horizontal Aligned Liquid Crystal with Non-rubbing Technologies)

  • 최대섭;신호철
    • 한국위성정보통신학회논문지
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    • 제10권2호
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    • pp.75-79
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    • 2015
  • 본 연구에서는 폴리이미드 박막위에서의 수직 및 수평배향에서 혼합액정의 배향 특성에 대해서 연구하였다. 혼합액정은 러빙을 이용하여 배향처리하였으며, 러빙에 사용된 폴리이미드 박막은 알킬기를 Side Chain으로 가진 수직배향용 배향막과 그렇지 배향막으로 나누어서 프리틸트각 특성을 측정하였다. 실험결과 혼합액정을 사용하여 양호한 배향상태를 얻을 수 있었으며, 고온에서의 열 안정성에서도 우수한 특성을 보이는 것을 알 수 있었다. 또한 프리틸트각의 발생 원리를 이해하기 위해서 접촉각 측정을 실시하였으며, 이 둘이 밀접한 상관관계를 갖고 있음을 알 수 있었다

Liquid Crystal Alignment on the SiC Thin Film by the Ion Beam Exposure Method

  • Park, Chang-Joon;Hwang, Jeoung-Yeon;Kang, Hyung-Ku;Kim, Young-Hwan;Seo, Dae-Shik;Ahn, Han-Jin;Kim, Kyung-Chan;Kim, Jong-Bok;Baik, Hong-Koo
    • Transactions on Electrical and Electronic Materials
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    • 제6권1호
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    • pp.22-24
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    • 2005
  • We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability makes SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by ion beam exposure on the SiC thin film surface was achieved. The about $87{\circ}$ of stable pretilt angle was achieved at the range from $30{\circ}$ to $45{\circ}$ of incident angle. The good LC alignment is maintained by the ion beam alignment method on the SiC thin film surface at high annealing temperatures up to $300{\circ}C$.

SiC 박막에 이온빔 배향을 이용한 틸트 발생에 관한 연구 (Liquid Crystal Alignment on the SiC Thin Film by the Ion Beam Exposure Method)

  • 강형구;강희진;황정연;이휘원;배유한;문현찬;김영환;서대식;임성훈;장진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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    • pp.489-490
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    • 2005
  • We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of the SiC (Silicon Carbide) thin film. The SiC thin film exhibits good chemical and thermal stability. The good thermal and chemical stability makes SiC an attractive candidate for electronic applications. A vertical alignment of nematic liquid crystal by ion beam exposure on the SiC thin film surface was achieved. The about $87^{\circ}$ of stable pretilt angle was achieved at the range from $30^{\circ}$ to $45^{\circ}$ of incident angle. The good LC alignment is main-tained by the ion beam alignment method on the SiC thin film surface at high annealing temperatures up to 300.

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저 에너지 이온빔 조사에 따른 비정질 $Se_{75}Ge_{25}$ 박막의 광학적 특성 (The optical characteristics of amorphous $Se_{75}Ge_{25}$ thin film by the low-energy lon beam exposure)

  • 이현용;오연한;정홍배
    • E2M - 전기 전자와 첨단 소재
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    • 제7권2호
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    • pp.100-106
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    • 1994
  • A bilayer film consisting of a layer of a-Se$_{75}$ Ge$_{25}$ with a surface layer of silver -100[.angs.] thick and a monolayer film of a-Se$_{75}$ Ge$_{25}$ are irradiated with 9[keV] Ga$^{+}$ ion beam. The Ga$^{+}$ ion (10$^{16}$ [ions/cm$^{2}$] exposed a-Se$_{75}$ Ge$_{25}$ and Ag/a-Se$_{75}$ Ge$_{25}$ thin films show an increase in optical absorption, and the absorption edge on irradiation with shifts toward longer wavelength. The shift toward longer wavelength called a "darkening effect" is observed also in film exposure to optical radiation(4.5*10$^{20}$ [photons/cm$^{2}$]). The 0.3[eV] edge shift for ion irradiation films is about twice to that obtained on irradiation with photons. These large changes are primarily due to structural changes, which lead to high etch selectivity and high sensitivity.

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이온빔을 이용한 미생물의 균주 개량 (Strain Improvement Based on Ion Beam-Induced Mutagenesis)

  • 정해영;김계령
    • 한국미생물·생명공학회지
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    • 제38권3호
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    • pp.235-243
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    • 2010
  • For decades, traditional mutation breeding technologies using spontaneous mutation, chemicals, or conventional radiation sources have contributed greatly to the improvement of crops and microorganisms of agricultural and industrial importance. However, new mutagens that can generate more diverse mutation spectra with minimal damage to the original organism are always in need. In this regard, ion beam irradiation, including proton-, helium-, and heavier-charged particle irradiation, is considered to be superior to traditional radiation mutagenesis. In particular, it has been suggested that ion beams predominantly produce strand breaks that often lead to mutations, which is not a situation frequently observed in mutagenesis induced by gamma-ray exposure. In this review, we briefly describe the general principles and history of particle accelerators, and then introduce their successful application in ion beam technology for the improvement of crops and microbes. In particular, a 100-MeV proton beam accelerator currently under construction by the Proton Engineering Frontier Project (PEFP) is discussed. The PEFP accelerator will hopefully prompt the utilization of ion beam technology for strain improvement, as well as for use in nuclear physics, medical science, biology, space technology, radiation technology and basic sciences.

유기절연막으로의 경사진 이온빔조사가 유기막 표면에서의 편광발생과 액정배향에 미치는 영향에 관한 연구 (Study of Liquid Crystal Alignment and Polarization-dependence on organic surface with slanted ion beam irradiation)

  • 한정민;최대섭;황종선
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2010년도 춘계학술대회 논문집
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    • pp.15-16
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    • 2010
  • We used Brewster's Law to examine the mechanism of liquid crystal (LC) alignment on an organic insulation layer when subjected to ion-beam irradiation. Brewster's Law implies that the maximum rate polarized rayon a slanted insulation layers on the substrate and it illustrates the dependence of polarization and themechanical structure on the ion beam irradiation process. The pretilt angle of nematic LCs on the organic insulation surface was about $1.13^{\circ}$ for an ion beam exposure of $45^{\circ}$ for 1 minute at 1800eV. This shows the dependence of LC alignment on the polarization ratio in a slanted organic insulation layer. We also discussed the electro-optical characteristic of twisted nematic (TN) LCD using ion beam irradiation on organic overcoat layer.

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