• Title/Summary/Keyword: Indium-Tin Oxide

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Silver Nanowire Anode-Based, Large-Area Indium Tin Oxide-Free Organic Photovoltaic Cells Fabricated by the Knife Coating Method (나이프 코팅 기법으로 제작한 은 나노와이어 투명전극 기반의 대면적 ITO-Free 유기 태양전지)

  • Han, Kyuhyo;Kim, Gunwoo;Lee, Jaehak;Seok, Jaeyoung;Yang, Minyang
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.1
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    • pp.43-48
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    • 2015
  • Silver nanowire (AgNW) is a material that is increasingly being used for transparent electrodes, as a substitute for indium tin oxide (ITO), owing to its flexibility, high transmittance to sheet resistance ratio, and simple production process. This study involves manufacturing large-area organic photovoltaic cells (OPVs) deposited on AgNW electrodes. We compared the efficiency of OPVs with ITO and AgNW electrodes. The results verified that an OPV with an AgNW electrode performed better than that with an ITO electrode. Furthermore, by using the knife coating method, we successfully fabricated large-area OPVs without the loss of efficiency. Use of AgNW instead of ITO demonstrated that an OPV could be produced on various substrates by the solution process method, dropping the productions costs significantly. Additionally, by using the knife coating method, the process time and amount of wasted solution are reduced. This leads to an increase in the efficient fabrication of the OPV.

Indium Tin Oxide (ITO) Nano Thin Films Deposited by a Modulated Pulse Sputtering at Room Temperature (모듈레이티드 펄스 스퍼터링으로 상온 증착한 Indium-Tin-Oxide (ITO) 나노 박막)

  • You, Younggoon;Jeong, Jinyong;Joo, Junghoon
    • Journal of the Korean institute of surface engineering
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    • v.47 no.3
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    • pp.109-115
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    • 2014
  • High power impulse magnetron sputtering (HIPIMS), also known as the technology is called peak power density in a short period, you can get high, so high ionization sputtering rate can make. Higher ionization of sputtered species to a variety of coating materials conventional in the field of improving the characteristics and self-assisted ion thin film deposition process, which contributes to a superior being. HIPIMS at the same power, but the deposition speed is slow in comparison with DC disadvantages. Since recently as a replacement for HIPIMS modulated pulse power (MPP) has been developed. This ionization rate of the sputtered species can increase the deposition rate is lowered and at the same time to overcome the problems to be reported. The differences between the MPP and the HIPIMS is a simple single pulse with a HIPIMS whereas, MPP is 3 ms in pulse length is adjustable, with the full set of multi-pulses within the pulse period and the pulse is applied can be micro advantages. In this experiment, $In_2O_3$ : $SnO_2$ composition ratio of 9 : 1 wt% target was used, Ar : $O_2$ flow rate ratio is 4.8 to 13.0% of the rate of deposition was carried out at room temperature. Ar 40 sccm and the flow rate of $O_2$ and then fixed 2 ~ 6 sccm was compared against that. The thickness of the thin film deposition is fixed at 60 nm, when the partial pressure of oxygen at 9.1%, the specific resistance value of $4.565{\times}10^{-4}{\Omega}cm$, transmittance 86.6%, mobility $32.29cm^2/Vs$ to obtain the value.

Indium Tin Oxide Based Reflector for Vertical UV LEDs (자외선 수직형 LED 제작을 위한 Indium Tin Oxide 기반 반사전극)

  • Jung, Ki-Chang;Lee, Inwoo;Jeong, Tak;Baek, Jong Hyeob;Ha, Jun-Seok
    • Korean Journal of Materials Research
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    • v.23 no.3
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    • pp.194-198
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    • 2013
  • In this paper, we studied a p-type reflector based on indium tin oxide (ITO) for vertical-type ultraviolet light-emitting diodes (UV LEDs). We investigated the reflectance properties with different deposition methods. An ITO layer with a thickness of 50 nm was deposited by two different methods, sputtering and e-beam evaporation. From the measurement of the optical reflection, we obtained 70% reflectance at a wavelength of 382 nm by means of sputtering, while only 30% reflectance resulted when using the e-beam evaporation method. Also, the light output power of a $1mm{\times}1mm$ vertical chip created with the sputtering method recorded a twofold increase over a chip created with e-beam evaporation method. From the measurement of the root mean square (RMS), we obtained a RMS value 1.3 nm for the ITO layer using the sputtering method, while this value was 5.6 nm for the ITO layer when using the e-beam evaporation method. These decreases in the reflectance and light output power when using the e-beam evaporation method are thought to stem from the rough surface morphology of the ITO layer, which leads to diffused reflection and the absorption of light. However, the turn-on voltage and operation voltage of the two samples showed identical results of 2.42 V and 3.5 V, respectively. Given these results, we conclude that the two ITO layers created by different deposition methods showed no differences in the electric properties of the ohmic contact and series resistance.

The DC magnetron sputtering vacuum deposition of indium tin oxide thin film (ITO 박막의 DC 마그네트론 스퍼터링 진공 증착)

  • Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.14 no.4
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    • pp.935-938
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    • 2010
  • Indium-tin-oxide (ITO) films show a low electrical resistance and high transmittance in the visible range of an optical spectrum. The transparent electrodes have to get resistivity and sheet resistance less than $1{\times}10^{-3}{\Omega}/cm$ and $10^3{\Omega}/sq$ respectively and transmittance over 80% at wavelength of 380nm~780nm. This study establishes DC magnetron sputtering process condition on ITO thin film by measuring electrical and optical properties of the thin film. As results, we obtained $300\;{\mu}{\Omega}cm$ resistivity of ITO films with good transmittance (above 90 %) under 90:10 wt% composition rate of $In_2O_3:SnO_2$. Also, we understood that the ITO thin film by DC magnetron sputtering depends on the deposition condition, especially substrate temperature, and the composition rate of $In_2O_3:SnO_2$ that is one of the most critical parameters was successfully optimized for high qualified transparent electrodes.

Evaluation of Indium-Tin Oxide Thin Film Deposited by DC Magnetron Sputtering Method (DC 마그네트론 스퍼터링 법으로 증착한 Indium-Tin Oxide (ITO) 박막의 특성 평가)

  • Woo, Duck-Hyun;Kim, Dae-Hyun;Ryu, Sung-Lim;Kweon, Soon-Yong
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2008.06a
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    • pp.370-370
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    • 2008
  • ITO 박막은 현재 차세대 디스플레이인 LCD, PDP, ELD 등의 평판 디스플레이의 화소전극 및 공통전극으로 가장 많이 적용되고 있는 소재이며, 최근에는 태양전지의 투명전극으로 그 용도가 더욱 증가되고 있다. 이러한 소자들의 투명 전도막으로 사용되기 위해서는 가시광선 영역에서 80% 이상의 높은 투과도와 낮은 면 저항을 가져야 한다. 광 투과도와 면 저항은 ITO 박막의 증착조건에 따라 변하게 되는데 본 연구에서는 DC 마그네트론 스퍼터링법을 이용하여 Indium-Tin Oxide (ITO) 박막을 제작하고, 제작된 ITO 박막의 전기적 특성과 광학적 특성을 측정하여 공정조건에 따른 박막의 특성 변화를 평가하였다. 증착 조건은 주로 기판 온도와 증착 시간을 변화시켰다. 본 실험에서는 $In_2O_3$ : $SnO_2$의 조성비가 9:1 비율의 순도 99.99% ITO 타겟을 사용하였으며, coming 1737 glass를 30$\times$30 mm 크기로 가공하여 기판온도와 증착시간을 변화시키면서 ITO 박막을 제조하였다. 예비실험을 통해 인가전력 50W, 초기 진공 $2\times10^{-6}$ Torr, 작업 진공 $3.5\times10^{-2}$ Torr, 기판과 타겟 사이의 거리를 10 cm로 고정하였다. 기판 온도는 히터를 가열하지 않은 상온 ($25^{\circ}C$)에서 $400^{\circ}C$까지의 범위에서 변화시켰고, 증착시간은 5분에서 30분까지의 범위에서 변화시켰다. 증착된 박막의 면 저항 촉정을 위해 4 point probe를 사용하였고, 홀 (hall) 계수 측정기 (HMS-300)를 이용하여 홀 계수를 측정하였으며, 또한 박막의 두께는 $\alpha$-step을 사용하여 측정하였다. ITO 박막의 상분석을 위해 XRD를 사용 하였고, SEM을 이용하여 미세구조를 관찰하였다. 실험 결과로는 기판온도 $400^{\circ}C$, 증착시간 15분 이상에서는 면 저항이 모두 $8\Omega$/$\Box$이하로 낮게 나왔으며, 투과율 또한 모두 80% 이상의 높은 투과도를 보였다. 또한 ITO박막의 전기 전도도는 캐리어 농도와 이동도의 측정을 통해 두 가지 인자들에 의해 비례되는 것을 확인하였다.

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Electrical and Mechanical Properties of Indium-tin-oxide Films Deposited on Polymer Substrate Using Organic Buffer Layer

  • Han, Jeong-In;Lee, Chan-Jae;Rark, Sung-Kyu;Kim, Won-Keun;Kwak, Min-GI
    • Journal of Information Display
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    • v.2 no.2
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    • pp.52-60
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    • 2001
  • The electrical and mechanical properties in indium-tin-oxide films deposited on polymer substrate were examined. The materials of substrates were polyethersulfone (PES) which have gas barrier layer and anti-glare coating for plastic-based devices. The experiments were performed by rf-magnetron sputtering using a special instrument and buffer layers. Therefore, we obtained a very flat polymer substrate deposited ITO film and investigated the effects of buffer layers, and the instrument. Moreover, the influences of an oxygen partial pressure and post-deposition annealing in ITO films deposited on polymer substrates were clarified. X-ray diffraction observation, measurement of electrical property, and optical microscope observation were performed for the investigation of micro-structure and electro-mechanical properties, and they indicated that as-deposited ITO thin films are amorphous and become quasi-crystalline after adjusting oxygen partial pressure and thermal annealing above $180^{\circ}C$. As a result, we obtained 20-25 ${\Omega}/sq$ of ITO films with good transmittance (above 80 %) of oxygen contents with under 0.2 % and vacuum annealing. Furthermore, using organic buffer layer, we obtained ITO films which have a rather high electrical resistance (40-45 ${\Omega}/sq$) but have improved optical (more than 85 %) and mechanical characteristics compared to the counterparts. Consequently, a prototype reflective color plastic film LCD was fabricated using the PES polymer substrates to confirm whether the ITO films could be realized in accordance with our experimental results.

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Parametric Studies of Pulsed Laser Deposition of Indium Tin Oxide and Ultra-thin Diamond-like Carbon for Organic Light-emitting Devices

  • Tou, Teck-Yong;Yong, Thian-Khok;Yap, Seong-Shan;Yang, Ren-Bin;Siew, Wee-Ong;Yow, Ho-Kwang
    • Journal of the Optical Society of Korea
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    • v.13 no.1
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    • pp.65-74
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    • 2009
  • Device quality indium tin oxide (ITO) films are deposited on glass substrates and ultra-thin diamond-like carbon films are deposited as a buffer layer on ITO by a pulsed Nd:YAG laser at 355 nm and 532 nm wavelength. ITO films deposited at room temperature are largely amorphous although their optical transmittances in the visible range are > 90%. The resistivity of their amorphous ITO films is too high to enable an efficient organic light-emitting device (OLED), in contrast to that deposited by a KrF laser. Substrate heating at $200^{\circ}C$ with laser wavelength of 355 nm, the ITO film resistivity decreases by almost an order of magnitude to $2{\times}10^{-4}\;{\Omega}\;cm$ while its optical transmittance is maintained at > 90%. The thermally induced crystallization of ITO has a preferred <111> directional orientation texture which largely accounts for the lowering of film resistivity. The background gas and deposition distance, that between the ITO target and the glass substrate, influence the thin-film microstructures. The optical and electrical properties are compared to published results using other nanosecond lasers and other fluence, as well as the use of ultra fast lasers. Molecularly doped, single-layer OLEDs of ITO/(PVK+TPD+$Alq_3$)/Al which are fabricated using pulsed-laser deposited ITO samples are compared to those fabricated using the commercial ITO. Effects such as surface texture and roughness of ITO and the insertion of DLC as a buffer layer into ITO/DLC/(PVK+TPD+$Alq_3$)/Al devices are investigated. The effects of DLC-on-ITO on OLED improvement such as better turn-on voltage and brightness are explained by a possible reduction of energy barrier to the hole injection from ITO into the light-emitting layer.

Electro-optical properties of organic EL device (유기 EL 소자의 전기-광학적 특성)

  • Kim, Min-Soo;Park, Lee-Soon;Park, Se-Kwang
    • Journal of Sensor Science and Technology
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    • v.6 no.4
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    • pp.252-257
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    • 1997
  • Organic EL devices, which have the sing3e-layer structure of ITO(indium-tin-oxide) /PPV(poly(p-phenylene vinylene))/cathode and the double-layer structure of ITO/PVK (poly(N- vinylcarbazole)) /PPV/cathode, were fabricated and their electro-optical properties were investigated. Experimental results, in single-layer structure, shown that the increment of temperature for thermal conversion of PPV film from $140^{\circ}C$ to $260^{\circ}C$ decreases the maximum luminance from $118.8\;cd/m^{2}$(20V) to $21.14\;cd/m^{2}$(28V) and shift the maximum peak of EL spectrum from 500nm to 580nm. The lower the work function of cathode is, the more the luminance and injection current of device. In double-layer structure, as the concentration of PVK solution decreases from 0.5 wt% to 0.05 wt%, the luminance of device increases from $70.71\;cd/m^{2}$(32V) to $152.7\;cd/m^{2}$(26V).

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Characteristics of Indium Tin Oxide Films Grown on PET Substrate Grown by Using Roll-to-Roll (R2R) Sputtering System (롤투롤 스퍼터 시스템을 이용하여 PET 기판위에 성막 시킨 ITO 박막의 특성 연구)

  • Cho, Sung-Woo;Choi, Kwang-Hyuk;Bae, Jung-Hyeok;Moon, Jong-Min;Jeong, Jin-A;Jeong, Soon-Wook;Park, No-Jin;Kim, Han-Ki
    • Korean Journal of Materials Research
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    • v.18 no.1
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    • pp.32-37
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    • 2008
  • The electrical, optical, structural and surface properties of an indium tin oxide (ITO) film grown on a flexible PET substrate using a specially designed roll-to-roll (R2R) sputtering system as a function of the DC power, $Ar/O_2$ flow ratio, and rolling speed is reported. It was observed that both the electrical and optical properties of the ITO film on the PET substrate were critically dependent on the $Ar/O_2$ flow ratio. In addition, x-ray diffraction examination results showed that the structure of the ITO film on the PET substrate was an amorphous structure regardless of the DC power and the $Ar/O_2$ flow ratio due to a low substrate temperature, which was maintained constant by a main cooling drum. Under optimized conditions, ITO film with resistivity of $6.44{\times}10^{-4}{\Omega}-cm$ and transparency of 86% were obtained, even when prepared at room temperature. Furthermore, bending test results exhibited that R2R-grown ITO film had good flexibility which would be applicable to flexible displays and solar cells.

pH Sensor Application of Printed Indium-Tin-Oxide Nanoparticle Films (Indium-Tin-Oxide 나노입자 인쇄박막의 pH sensor 응용에 대한 연구)

  • Lee, Changhan;Noh, Jaeha;An, Sangsu;Lee, Sangtae;Seo, Dongmin;Lee, Moonjin;Chang, Jiho
    • Journal of Sensor Science and Technology
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    • v.31 no.2
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    • pp.85-89
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    • 2022
  • We investigated a pH sensor using an Indium tin oxide (ITO) nanoparticle (NP) film printed on a flexible substrate. First, the printing precision and mechanical stability of the ITO-printed film were investigated. In particular, the factors that influence the crystallinity of ITO films were studied using X-ray diffraction pattern analysis. The response of the ITO pH sensor was calibrated using a series of standard pH solutions (pH 3-11). The pH values of various specimens were measured using an ITO pH sensor, and the results were compared with those of various pH measurement methods. As a result of the experiment, the maximum error was approximately ± 0.04 pH (0.4 %) at pH 9, which indicated that the ITO pH sensor is highly suitable for pH measurement. Finally, we used the ITO pH sensor to the measure of general specimens such as solvents and beverages and compared the results in comparison with those obtained from several conventional methods.