• Transactions on Electrical and Electronic Materials
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• 제9권6호
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• pp.223-226
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• 2008

$Ge_1Se_1Te_2$ chalcogenide amorphous materials was prepared by the conventional melt-quenching method. Samples were processed bye-beam evaporator systems and RF-sputtering systems. Phase change characteristics were analyzed by measuring glassification temperature, crystallization temperature and density of bulk material. The thermal characteristics were measured at the temperature between 300 K and 700 K, and the electrical characteristics were studied within the range from 0 V to 3 V. The obtained results agree with the electrothermal model for Phase-Change Random Access Memory.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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• pp.268-271
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• 2004

The phase transition from amorphous to crystalline states, and vice versa, of $Ge_2Sb_2Te_5$ films by applying electrical pulses have been studied. This material can be used as nonvolatile memory. The reversible phase transition between the amorphous and crystalline states, which is accompanied by a considerable change in electrical resistivity, is exploited as means to store bits of information. The nonvolatile memory cells are composed of a simple sandwich (metal/chalcogenide/metal). It was formed that the threshold voltage depends on thickness, electrode distance, annealing time and temperature, respectively.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 추계학술대회 논문집 Vol.18
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• pp.80-81
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• 2005

Chalcogenide phase change memory has high performance to be next generation memory, because it is a nonvolatile memory processing high programming speed, low programming voltage, high sensing margin, low consumption and long cycle duration. We have developed a sample of PRAM with thermal protected layer. We have investigated the phase transition behaviors in function of process factor including thermal protect layer. As a result, we have observed that set voltage and duration of protect layer are more improved than no protect layer.

• 정보저장시스템학회논문집
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• 제2권3호
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• pp.196-200
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• 2006

We are developing a phase change etching technology using an inorganic photoresist of GeSbTe film which is the recording material of the phase change disc. A selective etching phenomenon between amorphous and crystalline states can be utilized with an alkaline etchant. Phase-change pits could be formed using this technique, in which the etching selectivity is strongly dependent on the concentration of the etchant. The degree of etching was investigated by the transmittance between crystalline and amorphous films after the wet-etching. The pits patterned on the disc could be observed by AFM after wet-etching.

• 한국재료학회지
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• 제27권2호
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• pp.89-93
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• 2017

A thin film thermoelectric generator that consisted of 5 p/n pairs was fabricated with $1{\mu}m$-thick n-type $In_3Sb_1Te_2$ and p-type $Ge_2Sb_2Te_5$ deposited via radio frequency magnetron sputtering. First, $1{\mu}m$-thick GST and IST thin films were deposited at $250^{\circ}C$ and room temperature, respectively, via radio-frequency sputtering; these films were annealed from 250 to $450^{\circ}C$ via rapid thermal annealing. The optimal power factor was found at an annealing temperature of $400^{\circ}C$ for 10 min. To demonstrate thermoelectric generation, we measured the output voltage and estimated the maximum power of the n-IST/p-GST generator by imposing a temperature difference between the hot and cold junctions. The maximum output voltage and the estimated maximum power of the $1{\mu}m$-thick n-IST/p-GST TE generators are approximately 17.1 mV and 5.1 nW at ${\Delta}T=12K$, respectively.

• Journal of Astronomy and Space Sciences
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• 제33권4호
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• pp.319-321
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• 2016

Reviewing the two MeV-GeV investigations in the field of the HESS J1745-303 performed using Fermi Large Area Telescope data, we confirmed that the emission peak comfortably coincides with 'Region A' in the TeV regime, which is the brightest part of this feature. The MeV-TeV spectrum can be precisely described by a single power-law. Also, recent investigation has shown that the MeV-GeV feature is elongated from 'Region A' toward the north-west, which is similar to the case of largescale atomic/molecular gas distribution.

• 한국결정성장학회지
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• 제9권1호
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• pp.126-131
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• 1999

Hot-wall epitaxy법으로 $Cd_{1-x}Mn_xTe$박막을 GaAs (100) 기판위에 성장시켰다. XRD 측정으로부터 CdTe/GaAs(100) 박막은 기판과 같은 (100)면의 단결정 박막으로, $Cd_{1-x}Mn_xTe$박막은 Mn의 조성비 x가 증가함에따라 다결정 박막으로 성장되었으며, 박막의 격자상수는 x의 증가에 따라 덩어리 결정의 경우와 비슷한 기울기로 감소함을 확인하였다. x의 변화에 대한 $Cd_{1-x}Mn_xTe$ 박막의 PL 측정으로부터 받개와 퍼텐셜 요동에 의하여 포획된 엑시톤의 재결합 피크인 $L_1$과 $L_2$를 관측하였으며, $L_1$피크는 x=0.09 시료에서만 관측되었고 x값이 증가하면 사라졌다. x $\ge$0.2의 경우에는 $L_2$피크가 강하게 나타나고 x$\ge$ 0.4에서는 $Mn^{2+}$이온의 intra 천이에 의한 2.0eV 근처의 피크가 강하게 나타났다. x>0.4에서 $Mn^{2+}$이온에 의한 2.0eV 피크는 pinning이 일어나 변화가 거의 없이 일정하였다.

• Transactions on Electrical and Electronic Materials
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• 제5권5호
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• pp.185-188
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• 2004

Phase transitions from the amorphous to crystalline states, and vice versa, of GST(GeSbTe) and AST(AsSbTe) thin films by applying electrical pulses have been studied. These materials can be used as nonvolatile memory devices. The thickness of ternary chalcogenide thin films is approximately 100 nm. Upper and lower electrodes were made of AI. I-V characteristics after impressing the variable pulses to GST and AST films. Tc(crystallization temperature) of AST system is lower than that of the GST system, so that the current pulse width of crystallization process can be decreased.

• ETRI Journal
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• 제23권4호
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• pp.151-157
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• 2001

Spectroscopic and thermal analysis indicates that tellurite glasses doped with $B_2O_3$ and $GeO_2$ are promising candidate host materials for wide-band erbium doped fiber amplifier (EDFA) with a high 980 nm pump efficiency. In this study, we measured the thermal stabilities and the emission cross-sections for $Er^{3+}:^{4}I_{13/2}\;{\to}\;^{4}I_{15/2}$ transition in this tellurite glass system. We also determined the Judd-Ofelt parameters and calculated the radiative transition rates and the multiphonon relaxation rates in this glass system. The 15 mol% substitution of $B_2O_3$ for $TeO_2$ in the $Er^{3+}-doped\;75TeO_2-20ZnO-5K_2O$ glass raised the multiphonon relaxation rate for $^4I_{11/2}\;{\to}\;^4I_{13/2}$ transition from 4960 $s^{-1}$ to 24700 $s^{-1}$, but shortened the lifetime of the $^4I_{13/2}$ level by 14 % and reduced the emission cross-section for the $^4I_{13/2}\;{\to}\;^4I_{15/2}$ transition by 11%. The 15 mol% $GeO_2$ substitution in the same glass system also reduced the emission cross-section but increased the lifetime by 7%. However, the multiphonon relaxation rate for $^4I_{11/2}{\to}^4I_{13/2}$ transition was raised merely by 1000 $s^{-1}$. Therefore, a mixed substitution of $B_2O_3$ and $GeO_2$ for $TeO_2$ was concluded to be suitable for the 980 nm pump efficiency and the fluorescence efficiency of $^4I_{13/2}{\to}^4I_{15/2}$ transition in $Er^{3+}-doped$ tellurite glasses.

• 반도체디스플레이기술학회지
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• 제18권4호
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• pp.35-39
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• 2019

Effect of Ge₂Sb₂Te₅ (GST) chalcogen composition on plasma induced damage was investigated by using Ar ions and F radicals. Experiments were carried out with three different modes; the physical etching, the chemical etching, and the ion-enhanced chemical etching mode. For the physical etching by Ar ions, the sputtering yield was obtained according to ion bombarding energy and there was no change in GST composition ratio. In the plasma mode, the lowest etch rate was measured at the same applied power and there was also no plasma induced damage. In the ion-enhanced chemical etching conditions irradiated with high energy ions and F halogen radicals, the GST composition ratio was changed according to the density of F radicals, resulting in higher roughness of the etched surface. The change of GST composition ratio in halogen plasma is caused by the volatility difference of GST-halogen compounds with high energy ions over than the activation energy of surface reactions.