• The Korean Journal of Ceramics
• /
• v.3 no.2
• /
• pp.139-143
• /
• 1997

The photoluminescence characteristics of the zinc gallate have been investigated as a function of the composition and the firing atmosphere. Two distinct emission bands were observed whose peaks are 360 nm and 430 nm respectively. These emission bands are considered to be from two different emission centers. For $ZnO/Ga_2O_3$=49.3/50.7 or higher, 430 nm band is predominant and for $ZnO/Ga_2O_3$=49.2/50.8 or lower, 360nm band becomes predominant, whereas 430 nm band is almost completely suppressed. The shift of emission peak is though to be due to the change of the cation distribution with the zinc content in the spinel zinc gallate. Also, the emission centers responsible for the 360nm band are considered to be more efficient energy absorbers than the ones for the 430 nm band. Highly efficient green emitting phosphor was obtained by activating Zn-deficient zinc gallate with manganeses.

• Bulletin of the Korean Chemical Society
• /
• v.33 no.8
• /
• pp.2523-2528
• /
• 2012

Green phosphors $(Zn_{1-a-b}M_aM^{\prime}_b)_xGa_yS_{x+3y/2}:Eu^{2+}$ (M, M' = alkali earth ions) with x = 2 and y = 2-5 were prepared, starting from ZnO, MgO, $SrCO_3$, $Ga_2O_3$, $Eu_2O_3$, and S with a flux $NH_4F$ using a conventional solidstate reaction. A phosphor with the composition of $(Zn_{0.6}Sr_{0.3}Mg_{0.1})_2Ga_2S_5:Eu^{2+}$ produced the strongest luminescence at a 460-nm excitation. The observed XRD patterns indicated that the optimized phosphor consisted of two components: zinc thiogallate and zinc sulfide. The characteristic green luminescence of the $ZnS:Eu^{2+}$ component on excitation at 460 nm was attributed to the donor-acceptor ($D_{ZnGa_2S_4}-A_{ZnS}$) recombination in the hybrid boundary. The optimized green phosphor converted 17.9% of the absorbed blue light into luminescence. For the fabrication of light-emitting diode (LED), the optimized phosphor was coated with MgO using magnesium nitrate to overcome their weakness against moisture. The MgO-coated green phosphor was fabricated with a blue GaN LED, and the chromaticity index of the phosphor-cast LED (pc-LED) was investigated as a function of the wt % of the optimized phosphor. White LEDs were fabricated by pasting the optimized green (G) and the red (R) phosphors, and the commercial yellow (Y) phosphor on the blue chips. The three-band pc-WLED resulted in improved color rendering index (CRI) and corrected color temperature (CCT), compared with those of the two-band pc-WLED.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.30 no.12
• /
• pp.794-799
• /
• 2017

Ga-doped ZnO (GZO) films were deposited by an RF magnetron sputtering method on glass substrates using ZnO as a target containing 5 wt% $Ga_2O_3$ powder (for Ga doping). The structural, electrical, and optical properties of the GZO thin films were investigated as a function of the substrate temperatures. The deposition rate decreased with increasing substrate temperatures from room temperature to $350^{\circ}C$. The films showed typical orientation with the c-axis vertical to the glass substrates and the grain size increased up to a substrate temperature of $300^{\circ}C$ but decreased beyond $350^{\circ}C$. The resistivity of GZO thin films deposited at the substrate temperature of $300^{\circ}C$ was $7{\times}10^{-4}{\Omega}cm$, and it showed a dependence on the carrier concentration and mobility. The optical transmittances of the films with thickness of $3,000{\AA}$ were above 80% in the visible region, regardless of the substrate temperatures.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.02a
• /
• pp.134-134
• /
• 2010

Ga-In-Zn-O 물질은 비정질상태에서 높은 전하 운동성을 가지고 있으며 차세대 투명전극 thin film transistor 대안 소재로 각광받고 있다. 그런데 이 물질은 ion sputtering에 따라 전기적인 특성에 큰 변화가 관찰되고 있으며, 이는 표면에서의 화학적 상태가 전기적 특성을 좌우할 것이라는 것을 의미한다. 또한 보다 안정적이고 신뢰적인 소자를 구현하기 위해서는 ion sputtering에 의한 표면에서의 화학적 특성 변화를 이해하는 것이 매우 중요하다는 것을 의미한다. 본 연구에서는 $Ga_2O_3:In_2O_3$:ZnO의 비율이 각각 1:1:1, 2:2:1, 3:2:1 그리고 4:2:1인 시료를 $Ne^+$이온을 이용하여 sputtering하면서 표면에 민감한 분광분석 기법인 x-ray photoelectron spectroscopy와 x-ray absorption spectroscopy를 이용하여 분광정보의 변화들을 연구하였다. 실험에 의하면, Ga 3d의 양에 비해서 In 4d, Zn 3d의 양은 sputtering 시간에 따라서 각 각 양이 줄어들었으며, 전체적으로 보다 산화가가 높은 경향을 보였으며, valence band maximum 근처에 subgap state를 형성하는 것을 관찰하였다. 또한 sputtering을 계속하는 경우 In 3d, In 4d, 및 Fermi energy 근처에 metallic state가 형성되는 것을 관찰하였다. 이러한 subgap state와 metallic state의 관측은 각기 sputtering에 따라서, 아직 명확하지는 않지만, surface state의 형성 및/혹은 oxygen interstitial의 형성 그리고 metallic In의 형성 및/혹은 oxygen defect의 형성이 이루어지는 것을 의미한다.

• Journal of the Korean institute of surface engineering
• /
• v.42 no.3
• /
• pp.122-127
• /
• 2009

Ga/Al doped ZnO (GAZO) thin films were prepared on non-alkali glass substrate by co-sputtering system using two DC cathodes equipped with AZO ($Al_2O_3$:2.0 wt%) target and GZO ($Ga_2O_3$:6.65 wt%) target. This study examined the influence of Al/Ga concentration and substrate temperature on the electrical, structural and optical properties of GAZO films. The lowest resistivity $1.95{\times}10^{-3}{\Omega}cm$ was obtained at room temperature. With increasing substrate temperature, resistivity of GAZO film decreased to a minimum value of $7.47{\times}10^{-4}{\Omega}cm$ at below $300^{\circ}C$. Furthermore, when 0.05% $H_2$ gas was introduced, resistivity of GAZO film decreased to $6.69{\times}10^{-4}{\Omega}cm$. All the films had a preferred orientation along the (002) direction, indicating that the deposited films have hexagonal wurtzite structure formed by the textured growth along the c-axis. The average transmittance of the films was more than 85% in the visible light range.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2008.11a
• /
• pp.146-147
• /
• 2008

In this paper we report upon an investigation into the effect of sputter RF power on the electrical properties of Gallium doped zinc oxide (ZnO:Ga) film. Structural, electrical and optical properties of the ZnO:Ga films were investigation in terms of the sputtering power. Working pressure fixed in 5 mtorr and RF powers the variable did with 50~100 W. The result, We were able to without substrate temperature obtain resistivity of $9.3\times10^{-4}{\Omega}cm$ and optical transmittance of 90%.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
• /
• v.23 no.4
• /
• pp.293-297
• /
• 2010

We have studied the optical and electrical properties of a-IGZO thin films on the n-type semiconductor fabricated by RF magnetron sputtering method. The ceramic target was used in which $In_2O_3$, $Ga_2O_3$ and ZnO powder were mixed with 1:1:2 mol% ratio and furnished. The RF power was set at 25 W, 50 W, 75 W and 100 W as a variable process condition. The transmittance of the films in the visible range was above 80%, and it was 92% in the case of 25 W power. AFM analysis showed that the roughness increased as increasing RF power, and XRD showed amorphous structure of the films without any peak. The films are electrically characterized by high mobility above 10 $cm^2/V{\cdot}s$ at low RF power, high carrier concentration and low resistivity. It is required to study further finding the optimal process condition such as lowering the RF power, prolonging the deposition ratio and qualification analysis.

• Current Photovoltaic Research
• /
• v.3 no.2
• /
• pp.54-60
• /
• 2015

ZnSnO thin films were deposited by atomic layer deposition (ALD) process using diethyl zinc ($Zn(C_2H_5)_2$) and tetrakis (dimethylamino) tin ($Sn(C_2H_6N)_4$) as metal precursors and water vapor as a reactant. ALD process has several advantages over other deposition methods such as precise thickness control, good conformality, and good uniformity for large area. The composition of ZnSnO thin films was controlled by varying the ratio of ZnO and $SnO_2$ ALD cycles. The ALD ZnSnO film was an amorphous state. The band gap of ZnSnO thin films increased as the Sn content increased. The CIGS solar cell using ZnSnO buffer layer showed about 18% energy conversion efficiency. With such a high efficiency with the ALD ZnSnO buffer and no light soaking effect, AlD ZnSnO buffer mighty be a good candidate to replace Zn(S,O) buffer in CIGSsolar cells.

• Korean Journal of Materials Research
• /
• v.19 no.8
• /
• pp.443-446
• /
• 2009

This study develops a highly transparent ohmic contact scheme using indium oxide doped ZnO (IZO) as a current spreading layer for p-GaN in order to increase the optical output power of nitride-based lightemitting diodes (LEDs). IZO based contact layers of IZO, Ni/IZO, and NiO/IZO were prepared by e-beam evaporation, followed by a post-deposition annealing. The transmittances of the IZO based contact layers were in excess of 80% throughout the visible region of the spectrum. Specific contact resistances of $3.4\times10^{-4}$, $1.2\times10^{-4}$, $9.2\times0^{-5}$, and $3.6\times10^{-5}{\Omega}{\cdot}cm^2$ for IZO, Ni/Au, Ni/IZO, and NiO/IZO, respectively were obtained. The forward voltage and the optical output power of GaN LED with a NiO/IZO ohmic contact was 0.15 V lower and was increased by 38.9%, respectively, at a forward current of 20 mA compared to that of a standard GaN LED with an Ni/Au ohmic contact due to its high transparency, low contact resistance, and uniform current spreading.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2011.02a
• /
• pp.74-74
• /
• 2011

최근 새로운 형태의 디스플레이에 관한 관심이 집중되고 있다. 이들 중 특히 투명 산화물 반도체는 기존의 실리콘 기반의 반도체에 비해 가시광 영역에서 높은 투과도를 보이며, 또한 기존의 비정질 실리콘 소자에 비해서 10 cm2/Vs이상의 높은 전하 이동도 값을 가진다. 본 연구에서는 투명 산화물 반도체 소재 중 InGaZnO4를 사용하여 펄스 레이저 방법으로 Al2O3 (0001)기판 위에 비정질 상태인 a-InGaZnO4 박막을 성장 시켰다. 박막의 증착 온도를 변화(RT, $50^{\circ}C$, $150^{\circ}C$, $250^{\circ}C$, $450^{\circ}C$, $550^{\circ}C$)시켜 성장된 박막의 구조적, 화학적, 전기적 그리고 광학적 특성을 조사하였다. 증착 온도가 $450{\sim}550^{\circ}C$ 사이에서 박막의 상태가 비정질(amorphous)에서 polycrystalline으로 성장되는 것을 X-Ray Diffraction과 Field Emission-Scanning Electron Microscope를 이용하여 확인하였고 이는 InGaZnO4 박막의 결정화 온도가 $450^{\circ}C$ 이상임을 알 수 있었다. X-ray Photoelectron Spectroscopy를 통해서 target 물질과 성장된 박막의 조성 및 화학적 상태를 고찰한 결과, 박막의 결정성 변화가 화학적 상태 변화와는 무관하다는 사실을 알 수 있었다. 온도 의존 비저항 측정을 통해 박막이 반도체 성향을 가지는 것을 확인 하였다. 또한 Hall 측정 결과 증착 온도가 올라 갈수록 전하 밀도는 증가 하지만, 전하 이동도는 다결정 박막($550^{\circ}C$)에서 급격히 감소하고, 이로 인해 비저항 값이 크게 증가함을 알 수 있었다. 이는 다결정 박막 내 존재하는 grain boundary들이 이동도 값에 영향을 준다는 것으로 추측할 수 있다. Ultra violet-Visible-Near Infrared 측정을 통해 가시광 영역에서 80%이상의 투과율을 나타내며 증착 온도가 증가함에 따라 에너지 밴드갭(Eg)이 커지는 것을 확인 할 수 있는데 이는 Hall 측정 결과에서 확인한 전하 밀도의 증가로 인해 에너지 밴드갭이 커지는 Burstein-Moss 효과로 설명할 수 있다.