• 제목/요약/키워드: InGaN quantum well

검색결과 129건 처리시간 0.025초

InGaN계 다중양자우물구조를 병렬 집적화한 백색광소자의 특성 연구 (White Light Emitting Diode with the Parallel Integration of InGaN-based Multi-quantum Well Structures)

  • 김근주;이기형
    • 반도체디스플레이기술학회지
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    • 제3권4호
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    • pp.39-43
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    • 2004
  • The parallel multi-quantum well structures of blue and amber lights were designed and grown in metal-organic chemical vapor deposition by utilizing integration process on epitaxial layers. Samples were deposited for 5 periods-InGaN multi-quantum well layers for blue light emission and partially etched in order to regrow the 3 periods-InGaN multi-quantum wells for amber light. The blue and amber photoluminescence spectra were observed at the peak wavelengths of 475 and 580 nm, respectively. The chromatic coordinates of the white emitting diode were 0.31 and 0.34.

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InGaN/GaN Micro-LED구조를 위한 그래핀 양자점 기반의 산화막 기판 특성 (Characteristics of Graphene Quantum Dot-Based Oxide Substrate for InGaN/GaN Micro-LED Structure)

  • 황성원
    • 반도체디스플레이기술학회지
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    • 제20권3호
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    • pp.167-171
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    • 2021
  • The core-shell InGaN/GaN Multi Quantum Well-Nanowires (MQW-NWs) that were selectively grown on oxide templates with perfectly circular hole patterns were highly crystalline and were shaped as high-aspect-ratio pyramids with semi-polar facets, indicating hexagonal symmetry. The formation of the InGaN active layer was characterized at its various locations for two types of the substrates, one containing defect-free MQW-NWs with GQDs and the other containing MQW-NWs with defects by using HRTEM. The TEM of the defect-free NW showed a typical diode behavior, much larger than that of the NW with defects, resulting in stronger EL from the former device, which holds promise for the realization of high-performance nonpolar core-shell InGaN/GaN MQW-NW substrates. These results suggest that well-defined nonpolar InGaN/GaN MQW-NWs can be utilized for the realization of high-performance LEDs.

GaN LED에서 tunneling과 piezoelectric potential에 의한 carrier lifetime 연구 (Carrier lifetime study in GaN-based LEDs: the influence of tunneling and piezoelectric potential)

  • 조영달;오은순;김대식
    • 한국광학회:학술대회논문집
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    • 한국광학회 2001년도 제12회 정기총회 및 01년도 동계학술발표회
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    • pp.48-49
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    • 2001
  • GaN는 wurzite structure를 갖는 wide bandgap III-V족 반도체로서, 청색 반도체 laser diode (LD), light emitting diode (LED)등으로 응용되는 물질이다. InGaN quantum well은 GaN계의 청색 LD, LED 구조에서 활성층으로 사용되기 때문에 이에 대한 광학적 연구가 활발하다. InGaN는 GaN위에 성장하면 strain에 의해 piezoelectric 효과가 크게 나타나는 것으로 알려져 있다. 이러한 piezoelectric potential에 의해 외부에서 voltage가 가해지지 않은 상황에서도 InGaN quantum well내의 electron, hole의 wave function이 비대칭 potential의 영향을 받게된다. (중략)

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In0.27Ga0.73N/GaN 다중 양자우물 구조에 대한 광전기적 특성 (Optoelectronics Properties of In0.27Ga0.73N/GaN Multi-Quantum-Well Structure)

  • 박헌보;배인호;김기홍
    • 한국재료학회지
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    • 제17권9호
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    • pp.489-492
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    • 2007
  • Temperature and injection current dependence of elctroluminescence(EL) spectral intensity of the $In_{0.27}Ga_{0.73}N/GaN$ multi-quantum-well(MQW) have been studied over a wide temperature and as a function of injection current level. EL peaks also show significant broadening into higher photon energy region with the increase of injection current. This is explained by the band-filling effect. When temperature is slightly increased to 300 from 15 K, the EL emission peak showed red-blue-red shift. It can be explained by the carrier localization by potential fluctuation of multiple quantum well and band-gap shrinkage as temperature increase. It is found that a temperature-dependent variation pattern of the EL efficiency under very low and high injection currents show a drastic difference. This unique EL efficiency variation pattern with temperature and current is explained field effects due to the driving forward bias in presence of internal(piezo and spontaneous polarization) fields.

Nanopatterned Surface Effect on the Epitaxial growth of InGaN/GaN Multi-quantum Well Light Emitting Diode Structure

  • Kim, Keun-Joo
    • Transactions on Electrical and Electronic Materials
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    • 제10권2호
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    • pp.40-43
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    • 2009
  • The authors fabricated a nanopatterned surface on a GaN thin film deposited on a sapphire substrate and used that as an epitaxial wafer on which to grow an InGaN/GaN multi-quantum well structure with metal-organic chemical vapor deposition. The deposited GaN epitaxial surface has a two-dimensional photonic crystal structure with a hexagonal lattice of 230 nm. The grown structure on the nano-surface shows a Raman shift of the transverse optical phonon mode to $569.5\;cm^{-1}$, which implies a compressive stress of 0.5 GPa. However, the regrown thin film without the nano-surface shows a free standing mode of $567.6\;cm^{-1}$, implying no stress. The nanohole surface better preserves the strain energy for pseudo-morphic crystal growth than does a flat plane.

계단형 양자우물 구조가 적용된 센서 광원 용 발광다이오드 소자 (Light Emitting Diode with Multi-step Quantum Well Structure for Sensing Applications)

  • 박성민;이승주;우자정;김유경;장수환
    • 센서학회지
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    • 제32권6호
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    • pp.441-446
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    • 2023
  • Electrical and optical characteristics of the GaN-based light-emitting diode (LED) with the improved multi-quantum well (MQW) structure have been studied for light source in bio-sensing systems. Novel GaN/In0.1GaN/In0.2GaN/In0.1GaN/GaN and Al0.1GaN/GaN/In0.2GaN/GaN/Al0.1GaN (MQW) structures were suggested, and their radiative recombination rate, light output power, electroluminescence, and external quantum efficiency were compared with those of the conventional GaN/In0.2GaN/GaN MQW structure using device simulation. The LED with the GaN/In0.1GaN/In0.2GaN/In0.1GaN/GaN MQW structure showed an excellent recombination rate of 5.57 × 1028 cm-3·s-1 that was more than one order improvement over that of the conventional LED. In addition, the efficiency droop was relieved by the suggested stepped MQW structure.

InGaN/GaN 다중 양자우물 구조에서의 In 응집 현상의 연구 (The Study of In Clustering Effects in InGaN/GaN Multiple Quantum Well Structure)

  • 조형균;이정용;김치선;양계모
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2001년도 하계학술대회 논문집
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    • pp.636-639
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    • 2001
  • InGaN/GaN multiple quantum wells (MQWs) grown with various growth interruptions between the InGaN well and GaN barrier by metal-organic chemical vapor deposition were investigated using photoluminescence, high-resolution transmission electron microscopy, and energy filtered transmission electron microscopy (EFTEM). The luminescence intensity of the MQWs with growth interruptions is abruptly reduced compared to that of the MQW without growth interruption. Also, as the interruption time increases the peak emission shows a continuous blue shift. Evidence of indium clustering is directly observed both by using an indium ratio map of the MQWs and from indium composition measurements along an InGaN well using EFTEM. The higher intensity and lower energy emission of light from the MQW grown without interruption showing indium clustering is believed to be caused by the recombination of excitons localized in indium clustering regions and the increased indium composition in these recombination centers.

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Study of Localized Surface Plasmon Polariton Effect on Radiative Decay Rate of InGaN/GaN Pyramid Structures

  • Gong, Su-Hyun;Ko, Young-Ho;Kim, Je-Hyung;Jin, Li-Hua;Kim, Joo-Sung;Kim, Taek;Cho, Yong-Hoon
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.184-184
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    • 2012
  • Recently, InGaN/GaN multi-quantum well grown on GaN pyramid structures have attracted much attention due to their hybrid characteristics of quantum well, quantum wire, and quantum dot. This gives us broad band emission which will be useful for phosphor-free white light emitting diode. On the other hand, by using quantum dot emission on top of the pyramid, site selective single photon source could be realized. However, these structures still have several limitations for the single photon source. For instance, the quantum efficiency of quantum dot emission should be improved further. As detection systems have limited numerical aperture, collection efficiency is also important issue. It has been known that micro-cavities can be utilized to modify the radiative decay rate and to control the radiation pattern of quantum dot. Researchers have also been interested in nano-cavities using localized surface plasmon. Although the plasmonic cavities have small quality factor due to high loss of metal, it could have small mode volume because plasmonic wavelength is much smaller than the wavelength in the dielectric cavities. In this work, we used localized surface plasmon to improve efficiency of InGaN qunatum dot as a single photon emitter. We could easily get the localized surface plasmon mode after deposit the metal thin film because lnGaN/GaN multi quantum well has the pyramidal geometry. With numerical simulation (i.e., Finite Difference Time Domain method), we observed highly enhanced decay rate and modified radiation pattern. To confirm these localized surface plasmon effect experimentally, we deposited metal thin films on InGaN/GaN pyramid structures using e-beam deposition. Then, photoluminescence and time-resolved photoluminescence were carried out to measure the improvement of radiative decay rate (Purcell factor). By carrying out cathodoluminescence (CL) experiments, spatial-resolved CL images could also be obtained. As we mentioned before, collection efficiency is also important issue to make an efficient single photon emitter. To confirm the radiation pattern of quantum dot, Fourier optics system was used to capture the angular property of emission. We believe that highly focused localized surface plasmon around site-selective InGaN quantum dot could be a feasible single photon emitter.

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초격자 Buffer를 사용한 InGaN/GaN 양자우물에서 Piezoelectric 효과의 측정과 Strain 감소에 대한 연구 (Measurement of Piezoelectric Effect and Reduction of Strain in InGaN/GaN Quantum Well with Superlattice Buffer)

  • 공경식;안주인;이석주
    • 한국전기전자재료학회논문지
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    • 제21권6호
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    • pp.503-508
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    • 2008
  • In order to reduce the piezoelectric field originated from the well layer which resides in InGaN/GaN light emitting diode, InGaN/GaN superlattice buffer layers were grown at the bottom and the top of the active layer. Measuring the photoluminescence spectra with different reverse bias voltages clearly revealed the condition of the flat band under which the transition energy is maximized and the linewidth is minimized. Accordingly, the piezoelectric field of $In_{0.15}Ga_{0.85}N$ in our sample was estimated as -1.08 MV/cm. It is less than half the value reported in the previous studies, and it is evidenced that the strain has reduced due to the superlattice buffer layers.

다양한 반도체-유전체 덮개층 조합을 이용한 InGaAs/InGaAsP 양자우물의 무질서화 (Dielectric cap quantum well disordering for band gap tuning of InGaAs/InGaAsP quantum well structure using various combinations of semiconductor-dielectric capping layers)

  • 조재원;이희택;최원준;우덕하;김선호;강광남
    • 한국진공학회지
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    • 제11권4호
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    • pp.207-211
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    • 2002
  • 반도체-유전체 덮개층의 다양한 조합이 I $n_{0.53}$G $a_{0.47}$As/InGaAsP(Q1.25) 양자우물 무질서화에 미치는 영향을 PL(Photoluminescence)을 이용하여 조사하였다. 청색 편이에 대한 문턱 온도는 약 $750^{\circ}C$ 였으며 전반적으로 온도가 올라감에 따라 청색 편이도 점차 증가하였으나 $SiO_2$의 경우에는 온도가 올라감에 따라 포화되는 경향을 보였다. $SiN_{x}$$SiO_2$보다 더 큰 청색 편이를 야기하였는데 이것은 $SiN_{x}$의 낮은 성장 온도와 관계가 있는 것으로 생각된다. $SiN_{x}$의 경우 P의 확산이, 그리고 $SiO_2$의 경우 Ga의 확산이 청색 편이에 중요한 역할을 하는 것으로 여겨진다.겨진다.