• 제목/요약/키워드: InGaAs/InAlAs

검색결과 721건 처리시간 0.032초

Effect of the Coating on the Structure and Optical Properties of GaN Nanowires

  • Lee, Jong-Soo;Sim, Sung-Kyu;Min, Byung-Don;Cho, Kyoung-Ah;Kim, Hyun-Suk;Kim, Sang-Sig
    • Transactions on Electrical and Electronic Materials
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    • 제5권3호
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    • pp.113-119
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    • 2004
  • Structural and optical properties of as-synthesized, Ga$_2$O$_3$-coated, and Al$_2$O$_3$-coated GaN nanowires are examined in this paper. GaN nanowires were synthesized by thermal evaporation of ball-milled GaN powders in an NH$_3$ atmosphere. The thermal annealing of the as-synthesized GaN nanowires in an argon atmosphere allows their surfaces to be oxidized, leading to the formation of 2nm-thick Ga$_2$O$_3$ layers. For the oxidized GaN nanowires, the distances between the neighboring lattice planes are shortened, and an excitonic emission band is remarkably enhanced in intensity, compared with the as-synthesized GaN nanowires. In addition, the as-synthesized GaN nanowires were coated cylindrically with Al$_2$O$_3$ by atomic layer deposition technique. Our study suggests that the Al$_2$O$_3$-coating passivates some of surface states in the GaN nanowires.

전기장과 자기장하의 GaAs/AlxGa1-xAs 다중 양자 우물 내 플라즈몬의 광학적 속성 (Optical Properties of Plasmons in a GaAs/AlxGa1-xAs Multiple Quantum Well Under Electric and Magnetic Fields)

  • 안형수;이상칠;김석환
    • 새물리
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    • 제68권11호
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    • pp.1183-1191
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    • 2018
  • $GaAs/Al_xGa_{1-x}As$ 다중 양자 우물들에 의한 초격자내 플라즈몬들이 다른 유전 계면과 반포물선 구속 퍼텐셜에 의한 거동을 초격자 축에 수직한 자기장과 평행한 전기장하에서 이전의 이론적 토대하에서 연구하였다. 막 위상 근사 방법을 사용하여 부 밴드 내와 부 밴드 사이의 전이가 고려된 밀도-밀도 상관함수로부터 표면과 벌크 상태의 분산 에너지를 전체 양자 우물의 평균 전기장, 자기장의 세기 및 조성비의 함수로 얻었다. 또한 여러 가지 평균 전기장, 자기장의 세기에 대한 라만 세기를 그들 상태에 대해 입사광의 에너지 함수로 얻었다.

Characteristics of InGaAs/GaAs/AlGaAs Double Barrier Quantum Well Infrared Photodetectors

  • 박민수;김호성;양현덕;송진동;김상혁;윤예슬;최원준
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.324-325
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    • 2014
  • Quantum wells infrared photodetectors (QWIPs) have been used to detect infrared radiations through the principle based on the localized stated in quantum wells (QWs) [1]. The mature III-V compound semiconductor technology used to fabricate these devices results in much lower costs, larger array sizes, higher pixel operability, and better uniformity than those achievable with competing technologies such as HgCdTe. Especially, GaAs/AlGaAs QWIPs have been extensively used for large focal plane arrays (FPAs) of infrared imaging system. However, the research efforts for increasing sensitivity and operating temperature of the QWIPs still have pursued. The modification of heterostructures [2] and the various fabrications for preventing polarization selection rule [3] were suggested. In order to enhance optical performances of the QWIPs, double barrier quantum well (DBQW) structures will be introduced as the absorption layers for the suggested QWIPs. The DBWQ structure is an adequate solution for photodetectors working in the mid-wavelength infrared (MWIR) region and broadens the responsivity spectrum [4]. In this study, InGaAs/GaAs/AlGaAs double barrier quantum well infrared photodetectors (DB-QWIPs) are successfully fabricated and characterized. The heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIPs are grown by molecular beam epitaxy (MBE) system. Photoluminescence (PL) spectroscopy is used to examine the heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIP. The mesa-type DB-QWIPs (Area : $2mm{\times}2mm$) are fabricated by conventional optical lithography and wet etching process and Ni/Ge/Au ohmic contacts were evaporated onto the top and bottom layers. The dark current are measured at different temperatures and the temperature and applied bias dependence of the intersubband photocurrents are studied by using Fourier transform infrared spectrometer (FTIR) system equipped with cryostat. The photovoltaic behavior of the DB-QWIPs can be observed up to 120 K due to the generated built-in electric field caused from the asymmetric heterostructures of the DB-QWIPs. The fabricated DB-QWIPs exhibit spectral photoresponses at wavelengths range from 3 to $7{\mu}m$. Grating structure formed on the window surface of the DB-QWIP will induce the enhancement of optical responses.

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몬테칼로 알고리즘을 이용한 MODFET소자의 전달특성분석;채널길이에 따른 특성분석 (Analysis of MODFET Transport using Monte-Carlo Algorithm ` Gate Length Dependent Characteristics)

  • Hak Kee Jung
    • 전자공학회논문지A
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    • 제30A권4호
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    • pp.40-50
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    • 1993
  • In this paper, MODFET devices with various gate length are simulated using the Monte-Carlo method. The number of superparticle is 5000 and the Poisson equation is solved to obtain field distribution. The structure of MODFET is n-AlGaAs/i-AlGaAs/iGaAs and doping concentration of n-AlGaAs layer is 1${\times}10^{17}/cm^{3}$ and the thickness is 500.angs., and the thickness of i-AlGaAs is 50$\AA$. The devices with gate length 0.2$\mu$m, 0.5$\mu$m, 1.0$\mu$m respctively are simulated and the current-voltage curves and transport characteristics of that devices are obtained. Occupancy of each subband and electron energy distribution and conduction energy band in channel have been analyzed to obtain transport characteristics, and particles transposed from source to drain have been analyzed to current-voltage curves. Current level is highest for the device of Lg=0.2$\mu$m and transconductance of this device is 310mS/mm.

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2차원 양자 역학적 해석에 의한 고속 통신용 $Al_{x}Gal{-x}As/Ga_{x}In1$_{-x}$As/GaAs HEMT 소자의 전자 농도 및 전위분포 계산 (Calculation of Electron concentration and Electrostatic potential profile for $Al_{x}Gal{-x}As/Ga_{x}In1$_{-x}$As/GaAs HEMT device by 2-Dimensional Quantum Mechanical analysis))

  • 송영진;황호정
    • 전자공학회논문지A
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    • 제30A권3호
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    • pp.76-87
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    • 1993
  • We present a self-consistent, 2-dimensional solution of the Poisson and Sch rodinger equation based on the finite difference method with a nonuniform mesh size for a AlGaAs/GaInAs/GaAs HEMT devide. During the interative self-consistent calculation, however, we calculate Schrodinger equation only a some region of device, not a fully region in order to save the moemory and the speed-up of computation, and then use the approximated data for the other region using by a interpolation method with a given values. Also we adopt the proper matrix transformation method that allows preservation of the symmetric, form of the discretized Schrodinger equation, even with the use of a nonumiform mesh size, therefor, can reduce the computation time. We calculate the wavefunction, eigenstates and the electron concentration uat channel layer nder the thermal equilibrium and the biased conditions, respectively. Also,these parameters are used to solve 2-dimensional tdistribution of potential in he entire region of device. It is proved that the method is very efficient in finding eigenstages extending over relatively large spatial area without loss of accuracy. So, it can be used rather easily in any sarbitrary modulation doped utucture.

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AlGaN/GaN-on-Si 전력스위칭소자의 자체발열 현상에 관한 연구 (Study on Self-Heating Effects in AlGaN/GaN-on-Si Power Transistors)

  • 김신영;차호영
    • 전자공학회논문지
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    • 제50권2호
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    • pp.91-97
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    • 2013
  • 높은 전류밀도를 갖는 AlGaN/GaN 전력소자는 소자 동작 시에 발생하는 자체발열 현상으로 인해 소자의 전류-전압특성이 저하된다. 특히 열전도도가 낮은 Si 기판을 사용할 경우 더욱 심각한 문제를 발생시킨다. 본 논문에서는 Si기판에 성장한 AlGaN/GaN-on-Si 웨이퍼를 사용하여 전력소자를 제작하였으며, 채널 폭과 Si기판의 두께에 따른 자체 발열 현상을 측정과 시뮬레이션을 통하여 분석하였다. 그리고 이를 기반으로 다채널을 갖는 대면적 전력소자 설계에서 최대전류를 얻기 위하여 열방출을 효과적으로 할 수 있는 구조를 제안하였다. 비아홀과 공통전극을 사용하고 Si 기판을 100 ${\mu}m$로 얇게 하였을 때 래핑을 하지 않은 소자 대비 약 75%의 온 상태 전류증가와 68% 이상의 채널온도 감소가 기대된다.

InP 기판에 성장한 자발형성 InAs/InAl(Ga)As 양자점의 구조 및 광학적 특성 (Structural and Optical Properties of Self-assembled InAs/InAl(Ga)Ae Quantum Dots on InP)

  • 김진수;이진홍;홍성의;곽호상;최병석;오대곤
    • 한국진공학회지
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    • 제15권2호
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    • pp.194-200
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    • 2006
  • 분자선증착기 (Molecular beam epitaxy. MBE)를 이용하여 InP (001) 기판에 자발형성 (Self-assembled) InAs/InAlAs, InAs/InAlGaAs 양자점 (quantum dots, QDs)을 형성하고 구조 및 광학적 특성을 원자력간현미경(Atomic force microscopy, AFM), 투과전자현미경 (Transmission electron microscopy, TEM), 상온 포토루미네슨스 (Photoluminescence, PL) 실험을 통하여 분석하였다. AFM 측정을 통해 표면 형태를 분석한 결과 InAs 양자구조는 기저물질의 표면상태에 따라 양자대쉬, 비대칭적인 형태를 갖는 양자점, 대칭적인 형태를 갖는 양자점과 같이 다양하게 성장되었다. InAlGaAs 물질을 장벽층으로 하는 InAs 양자점의 평균크기는 폭이 대략 23 nm, 높이가 약 2 nm 이었다. 성장조건을 다양하게 변화시켜 광통신시스템에 중요한 파장중의 하나인 $1.55{\mu}m$ 발광파장을 갖는 InAs 양자점을 형성하였다.

$Al_{0.3}Ga_{0.7}As/GaAs$ 다층구조의 레이저 직접 건식에칭 (Laser Direct Ory Etching for $Al_{0.3}Ga_{0.7}As/GaAs$ Multi-layer Structures)

  • 박세기;이천;김성일;김은규;민석기
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1980-1981
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    • 1996
  • Laser direct dry etching is a new technique in semiconductor processing which has a lot of advantage, including decrease of etching-induced damage, maskless, photoresistiess, and high selectivity. This study presents characteristics of a laser direct dry etching for $Al_{0.3}Ga_{0.7}As/GaAs$ multi-layer structures for the first time. In this study, we were able to obtain the unusual aching profiles. The cross sectional analysis of etched groove was peformed for reaction characteristics and their applications.

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MBE에 의해 성장된 Heteroface AlGaAs/GaAs 태양전지 (Heteroface AlGaAs/GaAs Solar Cells grown by MBE)

  • 장호성;임성규
    • 대한전자공학회논문지
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    • 제27권1호
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    • pp.46-50
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    • 1990
  • Heteroface AlGaAs/GaAs drift solar cells with an active area conversion efficiency of 15.9% under one sun and AM 1.5 condition have been grown by molecular beam epitaxy(MBE). These drift solar cells have graded doping profiles in the base and emitter regions. The cells have a short circuit current density (Jsc) of 19.00 mA/cm\ulcorner an open circuit voltage(Voc) of 0.93 V, and f fill factor(FF) of 0.78, respectively. Conventional solar cells with fixed doping profiles were also grown by MBE for comparison with the drift solar cells. Even though the fabrication cost of MBE grown solar cell is higher, the expected highest conversion efficiency of the single or multiple cells could compensate for the increased cost, particularly in case of space applications.

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