• Title/Summary/Keyword: ICP-OES

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Tyrosinase Activated Inhibition Effect & Analysis of Pine-Needles Extract (솔잎 추출물의 티로시나아제 활성억제 효과 및 분석)

  • Sung, Ki-Chun;Kim, Ki-Jun
    • Journal of the Korean Applied Science and Technology
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    • v.22 no.1
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    • pp.71-76
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    • 2005
  • We extracted pine-needles using ethanol as solvent, and we obtained the refined oil component from pine-needles extract. Also we tested the tyrosinase activated inhibition effect with melanin experiment and analysed with ICP/OES and UV/VIS. Accordingly we obtained the next conclusion from the result of this experiment. From the first result of this experiment, we could know that the degree of recovery of refined oil component from pine-needles extract appeared in about 8.0%. From the second result of this experiment, we could know that the tyrosinase activated inhibition rate increased more and more in case of increasing concentration of pine-needles, green-tea, vitamine-C. Also we could know that vitarnine-C influences to tyrosinase activated inhibition contained in pine-needles. From the third result of this experiment, we could know that inorganic materials of Ca, Mg, V, Mn, etc contained in pine-needles detected with ICP/OES analysis, and the absorbance of pine-needles extract appeared very high in UV/VIS analysis.

A Study on the Pharmaceutical & Chemical Characteristics and Analysis of Natural Curcumin Extract (천연 강황 추출물의 약리, 화학적 특성 및 분석)

  • Sung, Ki-Chun
    • Journal of the Korean Applied Science and Technology
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    • v.28 no.4
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    • pp.393-401
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    • 2011
  • Natural Curcumin belongs to Zingiber Officinale Roscoe was known to possess natural odor, natural taste, natural color, and other pharmaceutical & chemical characteristics. Natural Curcumin extract was made to use ethanol as a solvent was to show a yellow color having state of solid powder and an active component. Natural Curcumin extract tested pharmaceutical & chemical experiment to dilute in curcumin 1%-water solution. Curcumin extract tested antimicrobial experiment using microbe, and tested dye experiment using fiber. Some conclusions in the result of characteristics experiment was obtained as follow. The result of antimicrobial experiment showed that the growth of staphylococcus aureus (ATCC-001) and aspergillus niger (ATCC-002) as microbes decreased according to passage of time. This phenomenon could know that Curcumin compoment showed influence to antimicrobial effect. Also, the result of dye experiment showed that cotton and sick with fiber dyeing dyed in direction of dark yellow color. This phenomenon could know that Curcumin extract showed influence to dyeing effect in observation of optical electron microscope(OEM.) The result of instrument analysis ascertained inorganic components of K(53.300ppm), Na(1.150ppm), Ca(0.711ppm), Ti(0.351ppm), Li(0.256ppm), Cu(0.233ppm) etcs from Curcumin component with ICP/OES, and ascertained organic components of propanoic acid(1.859), benzene(10.814), phenol(14.194) etcs from Curcumin component with GC/MSD.

Etching Characteristics of GST Thin Films using Inductively Coupled Plasma of Cl2-Ar Gas Mixtures (Cl2-Ar 혼합가스를 이용한 GST 박막의 유도결합 플라즈마 식각)

  • Min, Nam-Ki;Kim, Man-Su;Dmitriy, Shutov;Kim, Sung-Ihl;Kwon, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.10
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    • pp.846-851
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    • 2007
  • In this work, the etching characteristics of $Ge_2Sb_2Te_5(GST)$ thin films were investigated using an inductively coupled plasma (ICP) of $Cl_2/Ar$ gas mixture. To analyze the etching mechanism, an optical emission spectroscopy (OES) and surface analysis using X-ray photoelectron spectroscopy (XPS) were carried out. The etch rate of the GST films decreased with decreasing Ar fraction. At the same time, high selective etch rate over $SiO_2$ films was obtained and the selectivity over photoresist films decreased with increasing the he fraction. From XPS results, we found that Te halides were formed at the etching surface and Te halides limited the etch rate of the GST films.

Analysis of micromineral contents of school meals

  • Shin, Dongsoon
    • Nutrition Research and Practice
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    • v.8 no.4
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    • pp.439-444
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    • 2014
  • BACKGROUND/OBJECTIVES: Korean ordinary diets are referred to be good for human health in worldwide. However it is uncertain whether they provide microminerals enough for growth and health of teenagers. A main purpose of this study was to identify micromineral contents in school meals. MATERIALS/METHODS: The fifty cuisines were collected from elementary schools and middle schools in Gyeongnam area. The contents of Fe, Zn, Cu and Mn among microminerals were analyzed by using ICP-OES method. Data were expressed as mean, standard deviation and range value and linear regression analysis performed. RESULTS: Fe level of Pangibuseotpaprika-salad was the highest among side-dishes (average $346.6{\mu}g$) and Zn level of Sullung-tang was highest among soups (average $229.1{\mu}g$). Cu level of Buchu-kimchi was the highest among kimchies (average $217.5{\mu}g$) and Mn level of Gumeunkongyangnyum-gui was highest among side-dishes (average $198.4{\mu}g$). Generally cooked-rices as main dish had relative smaller amounts of microminerals than the other cuisines. The results showed that the ratio of Cu : Fe : Zn was approximately 12 : 4 : 1 and the relationship between Fe versus Zn or Fe versus Cu was significantly positive. CONCLUSION: Comparing to Korean Dietary Recommended Intakes (KDRI) level, school meals provided not sufficient amount (<25% DRI) of Fe, Zn or Mn, while they did excessive amount (>125% DRI) of Cu.

The Patterning of Polyimide Thin Films for the Additive $CF_4$ gas ($CF_4$ 첨가에 따른 polyimide 박막의 패터닝 연구)

  • Kang, Pil-Seung;Kim, Chang-Il;Kim, Sang-Gi
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.11b
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    • pp.209-212
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    • 2001
  • Polyimide(PI) films have been considered as the interlayer dielectric materials due to low dielectric constant, low water absorption, high gap-fill and planarization capability. The PI mm Was etched with using inductively coupled plasma (ICP). The etching characteristics such as etch rate and selectivity were evaluated to gas mixing ratio. High etch rate was $8300{\AA}/min$ and vertical profile was approximately acquired $90^{\circ}$ at $CF_{4}/(CF_{4}+O_{2})$ of 0.2. The selectivies of polyimide to PR and $SiO_{2}$ were 1.2, 5.9, respectively. The etching profiles of PI films with an aluminum pattern were measured by a scanning electron microscope (SEM). The chemical states on the PI film surface were investigated by x-ray photoelectron spectroscopy (XPS). Radical densities of oxygen and fluorine in different gas mixing ratio of $O_{2}/CF_{4}$ were investigated by optical emission spectrometer (OES).

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Surface Reaction of Ru Thin Films Etched in CF 4/O2 Gas Chemistry (CF4/O2 Gas Chemistry에 의해 식각된 Ru 박막의 표면 반응)

  • 임규태;김동표;김경태;김창일;최장현;송준태
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.12
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    • pp.1016-1020
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    • 2002
  • Ru thin films were etched using CF/$_4$O$_2$ plasma in an ICP (inductively coupled plasma etching) system. The maximum etch rate of Ru thin films was 168 nm/min at a CF$_4$/O$_2$ gas mixing ratio of 10 %. The selectivity of SiO$_2$ over Ru was 1.3. From the OES (optical emission spectroscopy) analysis, the optical emission intensity of the O radical had a maximum value at 10% CF$_4$ gas concentration and drcrease with further addition of CF4 gas, but etch slope was enhanced. From XPS (x-ray photoelectron spectroscopy) analysis, the surface of the etched Ru thin film in CF$_4$/O$_2$ chemistry shows Ru-F bonds by the chemical reaction of Ru and F. RuF$_{x}$ compounds were suggested as a surface passivation layer that reduces the chemical reactions between Ru and O radicals. From a FE-SEM (field emission scanning electron microscope) micrograph, we had an almost perpendicular taper angle of 89$^{\circ}$.>.

Etching Characteristics of Ba2Ti9O20(BTO) Thin Films in Inductively Coupled an Ar/Cl2 Plasma (Ar/Cl2 혼합가스를 이용한 Ba2Ti9O20(BTO) 박막의 유도결합 플라즈마 식각)

  • Kim, Young-Keun;Kwon, Kwang-Ho;Lee, Hyun-Woo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.4
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    • pp.276-279
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    • 2011
  • This work, the etching characteristics of $Ba_2Ti_9O_{20}$(BTO) thin films were investigated using an inductively coupled plasma (ICP) of $Ar/Cl_2$ gas mixture. The etch rate of BTO thin films as well as the $BTO/SiO_2$ and BTO/PR etch selectivity were measured as functions of $Ar/Cl_2$ mixing ratio (0~100% Ar) at a constants gas pressure (6 mTorr), total gas flow rate (50 sccm), input power (700 W) and bias power (200 W). The etch rate of BTO thin films decreased with increasing Ar fraction. To analyze the etching mechanism an optical emission spectroscopy (OES), double Langmuir probe(DLP) and surface analysis using X-ray photoelectron spectroscopy (XPS) were carried out.

A Study of Al2O3 Thin Films Etching Characteristics Using Inductively Coupled BCl3/Ar Plasma (유도결합형 BCl3/Ar 플라즈마를 이용한 Al2O3 박막의 식각 특성)

  • Kim, Young-Keun;Kwon, Kwang-Ho
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.24 no.6
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    • pp.445-448
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    • 2011
  • In this study, the etching characteristics of $Al_2O_3$ thin films were investigated using an ICP (inductively coupled plasma) of $BCl_3$/Ar gas mixture. The etch rate of $Al_2O_3$ thin films as well as the $SiO_2/Al_2O_3$ etch selectivity were measured as functions of $BCl_3$/Ar mixing ratio (0~100% Ar) at a constant gas pressure (10 mTorr), total gas flow rate (40 sccm), input power (800 W) and bias power (100 W). The behavior of the $Al_2O_3$ etch rate was shown to be quite typical for ion-assisted etch processes with a dominant chemical etch pathway. To analyze the etching mechanism using DLP (double langmuir probe), OES (optical emission spectroscopy) and surface analysis using XPS (x-ray photoelectron spectroscopy) were carried out.

A Study on Nitrogen Doping of Graphene Based on Optical Diagnosis of Horizontal Inductively Coupled Plasma (수평형 유도결합 플라즈마를 이용한 그래핀의 질소 도핑에 대한 연구)

  • Jo, Sung-Il;Jeong, Goo-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.54 no.6
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    • pp.348-356
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    • 2021
  • In this study, optical diagnosis of plasma was performed for nitrogen doping in graphene using a horizontal inductively coupled plasma (ICP) system. Graphene was prepared by mechanical exfoliation and the ICP system using nitrogen gas was ignited for plasma-induced and defect-suppressed nitrogen doping. In order to derive the optimum condition for the doping, plasma power, working pressure, and treatment time were changed. Optical emission spectroscopy (OES) was used as plasma diagnosis method. The Boltzmann plot method was adopted to estimate the electron excitation temperature using obtained OES spectra. Ar ion peaks were interpreted as a reference peak. As a result, the change in the concentration of nitrogen active species and electron excitation temperature depending on process parameters were confirmed. Doping characteristics of graphene were quantitatively evaluated by comparison of intensity ratio of graphite (G)-band to 2-D band, peak position, and shape of G-band in Raman profiles. X-ray photoelectron spectroscopy also revealed the nitrogen doping in graphene.

A Study to Recover Si from End-of-Life Solar Cells using Ultrasonic Cleaning Method (초음파 세척법을 이용한 사용 후 태양광 셀로부터 Si 회수 연구)

  • Lee, Dong-Hun;Go, Min-Seok;Wang, Jei-Pil
    • Resources Recycling
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    • v.30 no.5
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    • pp.38-48
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    • 2021
  • In this study, we determine the optimal process conditions for selectively recovering Si from a solar cell surface by removal of impurities (Al, Zn, Ag, etc.). To selectively recover Si from solar cells, leaching is performed using HCl solution and an ultrasonic cleaner. After leaching, the solar cells are washed using distilled water and dried in an oven. Decompression filtration is performed on the HCl solution, and ICP-OES (Inductively Coupled Plasma Optical Emission spectroscopy) full scan analysis is performed on the filtered solution. Furthermore, XRD (X-ray powder diffraction), XRF (X-ray fluorescence), and ICP-OES are performed on the dried solar cells after crushing, and the purity and recovery rate of Si are obtained. In this experiment, the concentration of acid solution, reaction temperature, reaction time, and ultrasonic intensity are considered as variables. The results show that the optimal process conditions for the selective recovery of Si from the solar cells are as follows: the concentration of acid solution = 3 M HCl, reaction temperature = 60℃, reaction time = 120 min, and ultrasonic intensity = 150 W. Further, the Si purity and recovery rate are 99.85 and 99.24%, respectively.