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http://dx.doi.org/10.4313/JKEM.2011.24.4.276

Etching Characteristics of Ba2Ti9O20(BTO) Thin Films in Inductively Coupled an Ar/Cl2 Plasma  

Kim, Young-Keun (Department of Control and Instrumentation Engineering, Korea University)
Kwon, Kwang-Ho (Department of Control and Instrumentation Engineering, Korea University)
Lee, Hyun-Woo (Division of Electronic, Computer, and Communication Engineering, Hanseo University)
Publication Information
Journal of the Korean Institute of Electrical and Electronic Material Engineers / v.24, no.4, 2011 , pp. 276-279 More about this Journal
Abstract
This work, the etching characteristics of $Ba_2Ti_9O_{20}$(BTO) thin films were investigated using an inductively coupled plasma (ICP) of $Ar/Cl_2$ gas mixture. The etch rate of BTO thin films as well as the $BTO/SiO_2$ and BTO/PR etch selectivity were measured as functions of $Ar/Cl_2$ mixing ratio (0~100% Ar) at a constants gas pressure (6 mTorr), total gas flow rate (50 sccm), input power (700 W) and bias power (200 W). The etch rate of BTO thin films decreased with increasing Ar fraction. To analyze the etching mechanism an optical emission spectroscopy (OES), double Langmuir probe(DLP) and surface analysis using X-ray photoelectron spectroscopy (XPS) were carried out.
Keywords
$Ba_2Ti_9O_{20}$(BTO); Etch; OES; ICP; XPS;
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1 Auciello, J. F. Scott and R. Ramesh, Physics Today, 51, 22 (1998).
2 A. Werbowy, P. Firek, J. Chojnowski, A. Olszyna, J. Szmidt, and N. Kwietniewski, Phys. Stat. Sol.,. 4, 1578 (2007).   DOI
3 A. Efremov, N. K. Min, S. Kim and M. Kim, S. Nahmd, and K. H. Kwon, Microelectronic. Eng. 85, 1584 (2008).   DOI
4 M. Kim, N. K. Min, S. J. Yun, H. W. Lee, Efremov A and Kwon K. H, Microelectron. Eng. 85, 348 (2008).   DOI
5 Y. H. Ham, A. Efremov, N. K. Min, H. W. Lee, S. J. Yun, and K. H. Kwon, J. Appl. Phys. 48, 08HD04 (2009).   DOI
6 S. W. Na, M. H. Shin, Y. M. Chung, J. G. Han, S. H. Jeung, J. H. Boo and N. E. Lee, Microelectronic. Eng. 83, 328 (2006).   DOI
7 R. David and Lide, CRC Handbook of Chemistry and Physics. (CRC Press LLC, Washington, DC, (1998) p. 4.
8 N. Catalin and M. Cernea, J. Optoelectron Adv M., 8, 1879 (2006).
9 L. Liao, J. Bai, Y. C Lin, Y. Qu, Y. Huang, and X. Duan, Adv. Mater. 22, 1941 (2010).   DOI   ScienceOn
10 K. H. Kim, B. Damon, Lehn, P. V. Rao, and R. G. Gordon, Apl. Phys. Lett. 89, 133512 (2006).   DOI
11 M. C. Blanco-Lopez, B. Rand, and F. L. Riley, J. Eur. Ceram. Soc. 17, 281 (1997).   DOI
12 S. Kumar, V. S. Raju and T. R. N. Kutty, Mater. Sci. Eng. B. 142, 78 (2007).   DOI