• Title/Summary/Keyword: ICP/OES

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Assessment of Ion Leaching and Recycling Potential of Steel Slag Mixed with Clay (점토와 혼합된 제강슬래그의 이온 용출 및 재활용 가능성 평가)

  • Hyeongjoo Kim;Hyeonki Lee;Taegew Ham;Sohee Jeong;Hyeongsoo Kim
    • Journal of the Korean GEO-environmental Society
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    • v.25 no.5
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    • pp.39-47
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    • 2024
  • In this study, the environmental implications of electric arc furnace steel slag, commonly used in road construction and soil reinforcement, were examined. Experiments were conducted to assess the leaching of heavy metals based on particle size and to investigate ion leaching from specimens with varying mixtures of steel slag and clay. The official waste test revealed no detectable heavy metals in the sample items. However, when subjected to leaching experiments and analyzed using ICP-OES, certain heavy metals were found. The reaction of steel slag with water, facilitated by free CaO within the slag, was identified as the cause of leaching. Results showed that aluminum, exhibiting the highest leaching rate, displayed an inverse relationship with particle size. In mixed soil containing steel slag and clay, higher steel slag content resulted in increased aluminum leaching. Nonetheless, the quantity of leached aluminum was notably lower in mixed soil compared to pure steel slag. Furthermore, leaching of other heavy metals remained within acceptable limits. These findings suggest that recycling mixed soil of steel slag and clay for road construction or soil stabilization presents reduced environmental risks compared to using steel slag alone. Utilizing such mixtures could offer an environmentally sustainable and safe alternative.

Study on the Surface Morphology and Control of Impurity by Organic Additive for Tin electro-refining (주석 전해정련에서 유기첨가제에 따른 표면형상 및 전해불순물 제어에 관한 연구)

  • Park, Sung Cheol;Son, Seong Ho;Kim, Yong Hwan;Han, Chul Woong;Lee, Ki-Woong
    • Resources Recycling
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    • v.25 no.4
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    • pp.49-53
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    • 2016
  • The electro-refining process was performed to purify the casted tin crude metal from waste tin in methanesulfonic acid. The surface morphologies of electrodeposited tin on cathode were observed, the dendrite and delamination were inhibited by glycol group of organic additive. The impurity concentrations of tin crude metal and deposited metal were analyzed using ICP-OES. Quantitative analysis on casted tin crude metal showed that it consists of tin with 97.280 wt.% and several impurity metals of Ag, Cu, Pb, Ni, and etc. After tin electro-refining, the purity of tin increased up to 99.956 wt.%. Reduction current by cyclic voltammetry seems to be closely related to behavior of impurity in tin electro-refining.

Etching Property of the TaN Thin Film using an Inductively Coupled Plasma (유도결합플라즈마를 이용한 TaN 박막의 식각 특성)

  • Um, Doo-Seung;Woo, Jong-Chang;Kim, Dong-Pyo;Kim, Chang-Il
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.104-104
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    • 2009
  • Critical dimensions has rapidly shrunk to increase the degree of integration and to reduce the power consumption. However, it is accompanied with several problems like direct tunneling through the gate insulator layer and the low conductivity characteristic of poly-silicon. To cover these faults, the study of new materials is urgently needed. Recently, high dielectric materials like $Al_2O_3$, $ZrO_2$ and $HfO_2$ are being studied for equivalent oxide thickness (EOT). However, poly-silicon gate is not compatible with high-k materials for gate-insulator. To integrate high-k gate dielectric materials in nano-scale devices, metal gate electrodes are expected to be used in the future. Currently, metal gate electrode materials like TiN, TaN, and WN are being widely studied for next-generation nano-scale devices. The TaN gate electrode for metal/high-k gate stack is compatible with high-k materials. According to this trend, the study about dry etching technology of the TaN film is needed. In this study, we investigated the etch mechanism of the TaN thin film in an inductively coupled plasma (ICP) system with $O_2/BCl_3/Ar$ gas chemistry. The etch rates and selectivities of TaN thin films were investigated in terms of the gas mixing ratio, the RF power, the DC-bias voltage, and the process pressure. The characteristics of the plasma were estimated using optical emission spectroscopy (OES). The surface reactions after etching were investigated using X-ray photoelectron spectroscopy (XPS) and auger electron spectroscopy (AES).

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Etching Mechanism of $YMnO_3$ Thin Films in High Density $CF_4$/Ar Plasma ($CF_4$/Ar 가스 플라즈마를 이용한 $YMnO_3$ 박막의 식각 반응연구)

  • 김동표;김창일;이철인
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.14 no.12
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    • pp.959-964
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    • 2001
  • We investigated the etching characteristics of YMnO$_3$ thin films in high-density plasma etching system. In this study, YMnO$_3$ thin films were etched with CF$_4$/Ar gas chemistries in inductively coupled plasma(ICP). Etch rates of YMnO$_3$ increased up to 20% CF$_4$ in CF$_4$/(CF$_4$+Ar), but decreased with furthermore increasing CF$_4$ in CF$_4$/(CF$_4$+Ar). In optical emission spectroscopy (OES) analysis, F radical and Ar* ions in plasma at various gas chemistries decreased with increasing CF$_4$ content. Chemical states of YMnO$_3$ films exposed in plasma were investigated with x-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). There is a chemical reaction between metal (Y, Mn) and F and metal-fluorides were removed effectively by Ar ion sputtering. YF$_{x}$, MnF$_{x}$ such as YF, YF$_2$, YF$_3$ and MnF$_3$ were detected using SIMS analysis. The etch slope is about 65$^{\circ}$ and cleasn surface. surface of the etched YMnO$_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS) and secondary ion mass spectrometry (SIMS). The etch profile was also investigated by scanning electron microscopy (SEM).EM).

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A Study on the Decontamination Performance of Cesium by Soil Washing Process With Flocculating Agent (응집제를 적용한 토양세척 공정에서의 세슘 제염 성능 평가 연구)

  • Song, Jong Soon;Kim, Sun Il
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.16 no.1
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    • pp.41-47
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    • 2018
  • Radioactive substances, especially $^{137}Cs$ discharged in the course of Nuclear Power Plant Accident or maintenance of power plants, cause contamination of the soil. For habitation of residents and reuse of industrial land, it is inevitably necessary to decontaminate the soil. This study examines a soil washing process that has actually been used for washing of radioactive-contaminated soil. The soil washing process uses a washing agent to weaken surface tension of the soil and cesium, separating cesium from the soil. In this study, in order to raise the efficiency of the process, a flocculating agent was added to the washing water to remove fine soil and cesium. The cesium concentrations before and after applying the flocculating agent to cesium solution were measured through ICP-OES. When using 0.1 g of J-AF flocculating agent in the experiment, the maximum Cs removal performance was approximately 88%; the minimum value was 67%. Species combinations between cesium and soil were predicted using Visual MINTEQ Code; the ability to reuse the washing water or not, and the removal rate of the fine soil, determined via measurement of the turbidity after applying the flocculating agent, were determined.

Synthesis of β-SiC Powder using a Recycled Graphite Block as a Source (그라파이트 블록을 원료로써 재활용한 β-SiC 분말 합성)

  • Nguyen, Minh Dat;Bang, Jung Won;Kim, Soo-Ryoung;Kim, Younghee;Jung, Eunjin;Hwang, Kyu Hong;Kwon, Woo-Teck
    • Resources Recycling
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    • v.26 no.1
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    • pp.16-21
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    • 2017
  • This paper relates to the synthesis of a source powder for SiC crystal growth. ${\beta}-SiC$ powders are synthesized at high temperatures (>$1400^{\circ}C$) by a reaction between silicon powder and carbon powder. The reaction is carried out in a graphite crucible operating in a vacuum ambient (or Ar gas) over a period of time sufficient to cause the Si+C mixture to react and form poly-crystalline SiC powder. End-product characterizations are pursued with X-ray diffraction analysis, SEM/EDS, particle size analyzer and ICP-OES. The purity of the end-product was analyzed with the Korean Standard KS L 1612.

Content of plasticizers and heavy metals in the selling PVC wallpapers (시판 PVC 벽지 중 가소제 및 중금속 함량)

  • Lee, Cheol-Won;Jung, Tak-Kyo;Kim, Man-Goo
    • Analytical Science and Technology
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    • v.21 no.2
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    • pp.135-142
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    • 2008
  • Plasticizer and heavy metals in domestic PVC wallpaper manufactured in Korea after 2005 were analyzed to identify the contained quantity in comparison with the 2002 manufactured PVC wallpapers. Plasticizer of wallpapers was analyzed by the method KSM1991 which uses soxhlet extraction with n-hexane and GC/FID. Heavy metals were pre-treated with 0.07 mol/L hydrochloric acid (HCl) and analyzed by ICP/OES according to the EN 71-part 3 method. DEHP, DINP, DEP, acetyl tributyl citrate were identified from wallpaper. Contents of DEHP, DINP were 0.2~11.3%, 17.9~27.8% respectively in 6 wallpapers, DEP and acetyl tributyl citrate were 1.5%, 8.9% respectively in one wallpaper. Plasticizers have changed from DEHP that has possibility of hazards to DINP, DEP and acetyl tributyl citrate as compared with 2002. Heavy metals were detected under guide line from all of the wallpapers except fire-retardant wallpaper contain antimony. While PVC wallpaper was improved by use of various plasticizer, functional wallpapers such as fire-resistant wallpaper contain high antimony in this study.

The Analysis of Inorganic Compounds and Water Solubles Ions in Paper Mill Sludges from NewsPaper and Printed Paper (신문용지 및 인쇄용지 슬러지의 무기성분 및 수용성 이온 분석)

  • Yoon, Su Young;Kim, Un-Jung;Kim, Mi-Seon;Kim, Mun-Sung;Park, Jong-Moon;Shin, Soo-Jeong
    • Journal of Korea Technical Association of The Pulp and Paper Industry
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    • v.46 no.2
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    • pp.30-34
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    • 2014
  • To apply paper mill sludges to soil as fertilizer, paper mill sludges were investigated to predict suitability and maleficence for soil. Newspaper and Printed Paper sludge were analyzed by IC (Ion Chromatography) and ICP-OES (Induced Coupled Plasma Optical Emission Spectrometer). As a results, harmful materials in two types of sludges were below standard by notified Ministy of Environment (ME). Also ionic substances causing the water pollution in sludges were less than the standard value by notified ME. Thus sludges from newspaper and printed paper is presumed that there are no water pollution and soil contamination.

A Study on the Pharmacetical Characteristics & Analysis of Glycyrrhizin Extract (감초 추출물의 약리적 특성 및 분석)

  • Sung, Ki-Chun
    • Journal of the Korean Applied Science and Technology
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    • v.23 no.3
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    • pp.215-222
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    • 2006
  • From experiment results on pharmacetical characteristics and analysis of Glycyrrhizin extract, some conclusions are obtained as follows. From results on extract experiment of Glycyrrhizin, it appeared about 8%-extraction ratio as semi-solid state, and after dried in freezing from Glycyrrhizin extract of semi-solid state, it obtained about 70%-Glycyrrhizin extract as solid state of yellow gold color. From results on antimicrobial experiment of Glycyrrhizin extract, number of S-typhimurium and Fungus in microbe decreased more and more according to time passage. This phenomenon shows that Glycyrrhizin extract keeps antimicrobial effect. From results on antioxidation experiment of Glycyrrhizin extract, DPPH scavenging activity of free radical shows that Glycyrrhizin extract appears more remarkable reduction ability than reference samples. This phenomenon means that antioxidation of Glycyrrhizin extract appears higher than Vitamin-C and BHA. From results on instrument analysis, the fatty and aromatic components of 2-pentanone, cyclohexasiloxane, tetrasiloxane, benzoquinoline-2-carboxylic acid etcs from Glycyrrhizin extract was detected with GC/MS and inorganic components of Ca, Mg, Ti, Zn, Fe etcs from Glycyrrhizin extract was detected with ICP/OES.

Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma (BCl3/Ar 플라즈마에 Cl2 가스 첨가에 따른 TiN 박막의 식각 특성)

  • Um, Doo-Seung;Woo, Jong-Chang;Kim, Dong-Pyo;Kim, Chang-Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.12
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    • pp.1051-1056
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    • 2008
  • In this study, the investigations of the TiN etching characteristics were carried out with addition of $Cl_2$ gas in an inductively coupled $BCl_3$-base plasma system. Dry etching of the TiN was studied by varying the etching parameters including $Cl_2$ gas addition ratio, RF power, DC-bias voltage and pressure. The etch rate of TiN thin film was maximum when the $Cl_2$ gas addition flow was 2 sccm with fixed other conditions. As the RF power DC-bias voltage were increased, the etch rate of TiN thin film showed increasing tendency. $BCl_3/Cl_2$/Ar plasmas were characterized by optical emission spectroscopy (OES) analysis. The chemical reaction on the surface of the etched TiN films was investigated with X-ray photoelectron spectroscopy (XPS).