Etch Characteristics of TiN Thin Film with Addition Cl2 Gas in BCl3/Ar Plasma |
Um, Doo-Seung
(중앙대학교 전자전기공학부)
Woo, Jong-Chang (중앙대학교 전자전기공학부) Kim, Dong-Pyo (중앙대학교 전자전기공학부) Kim, Chang-Il (중앙대학교 전자전기공학부) |
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