• 한국진공학회지
• /
• 제10권2호
• /
• pp.194-200
• /
• 2001

13.56 MHz rf플라즈마를 이용하여 증착된 DLC(diamond-like carbon) 박막의 광학적 특성에 대해 조사하였다. $CH_4$가스를 원료가스로 하여 PECVD법에 의해 DLC 박막을 형성하였으며 이때 RF power, working pressure, 보조가스의 종류 및 양에 따른 투과도(transmittance)와 optical band gap의 변화를 관찰하였다. RF power가 증가하고 working pressure가 높을수록 optical band gap이 감소하는 결과를 얻을 수 있었고. FT-IR분석을 이용하여 탄소-수소 결합 양을 관찰함으로써 DLC 박막의 결합구조 변화를 증명할 수 있었다. 그리고 수소와 질소를 첨가한 경우 증착시 탄소-수소 결합을 끊는 역할을 하여 optical band gap이 감소하는 결과를 얻을 수 있었다.

• 한국응용과학기술학회지
• /
• 제21권1호
• /
• pp.45-50
• /
• 2004

The effects of reaction temperature and flow rate of reactants on the methane conversion, product selectivity, product ratio, and carbon deposition were investigated with 13wt% Ni/MgO catalyst. Reaction temperatures were changed from 600 to $850^{\circ}C$, and reactants flow rates were changed from 100 to 200 mL/mim. There were no significant changes in the methane conversion observed in the range of temperatures used. It is possibly stemmed from the nearly total exhaustion of oxygen introduced. The selectiveties of hydrogen and carbon monoxide did not largely depend on the reaction temperature. The selectivities of hydrogen and carbon monoxide were 96 and 90%, respectively. Carbon deposition observed was the smallest at $750^{\circ}C$ and the largest at $850^{\circ}C$. It is found that the proper reaction temperature is $750^{\circ}C$. The best reactant flow rate was 150 ml/min.

• Korean Chemical Engineering Research
• /
• 제59권2호
• /
• pp.232-238
• /
• 2021

The development of a low cost catalyst with high performance and small amount of carbon deposition on catalyst from toluene steam reforming were investigated by using coal ash as a support material. Ni-loaded coal ash catalyst showed similar catalytic activity for toluene steam reforming compared with the Ni/Al2O3. At 800 ℃, the toluene conversion was 77% for Ni/TAL, 68% for Ni/KPU and 78% for Ni/Al2O3. Ni/TAL showed similar toluene conversion to Ni/Al2O3. However, Ni/KPU produced higher hydrogen yield at relatively lower toluene conversion. Ni/KPU catalyst showed a remarkable ability of suppressing the carbon deposition. The difference in coke deposition and hydrogen yield is due to the composition of KPU ash (Ca and Fe) which increase coke resistance and water gas shift reaction. This study suggests that coal ash catalysts have great potential for the application in the steam reforming of biomass tar.

• Bulletin of the Korean Chemical Society
• /
• 제25권2호
• /
• pp.167-171
• /
• 2004

The electroless deposition of copper on the hydrogen-terminated Si(111) surface was investigated by means of attenuated total reflection Fourier transform infrared (ATR-FTIR) spectroscopy, scanning tunneling microscopy (STM), and energy-dispersive spectroscopy (EDS). The hydrogen-terminated Si(111) surface prepared was stable under air atmosphere for a day or more. It was found from ATR-FTIR that two bands centered at 2000 and 2260 $cm^{-1}$ appeared after the H-Si(111) surface was immersed in 40% $NH_4F$ solution containing 10 mM $Cu^{2+}$. On the other hand, STM image included the copper islands with a height of 5 nm and a diameter of 10-20 nm. The EDS data displayed the presence of copper, silicon and oxygen species. The results were rationalized in terms of the redox reaction of surface Si atoms and $Cu^{2+}$ ions in solutions, which are changed into $Si(OH)_x(F)_y$ containing $SiF_6^{2-}$ ions and neutral copper islands.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
• /
• pp.1033-1036
• /
• 2004

Si nanocrystallites thin films on p-type (100) Si substrate have been fabricated by pulsed laser deposition using a Nd:YAG laser. After deposition, samples were annealed at the temperatures of 400 to $800^{\circ}C$. Hydrogen passivation was then performed in the forming gas (95% $N_2$ + 5% $H_2$) for 1 hr. Strong violet-indigo photoluminescence has been observed at room temperature from nitrogen ambient-annealed Si nanocrystallites. The variation of photoluminescence (PL) Properties of Si nanocrystallites thin films has been investigated depending on annealing temperatures with hydrogen passivation. From the results of PL, Fourier transform infrared (FTIR), and high-resolution transmission electron microscopy (HRTEM) measurements, it is observed that the origin of violet-indigo PL from the nanocrystalline silicon in the silicon oxide film is related to the quantum size effect of Si nanocrystallites and oxygen vacancies in the SiOx(x : 1.6-1.8) matrix affects the emission intensity.

• 한국표면공학회지
• /
• 제53권3호
• /
• pp.109-115
• /
• 2020

In this study, polycrystalline diamond was synthesized by chemical vapor deposition (CVD). Diamond films were deposited on a-plane sapphire substrates while changing the concentration of methane for hydrogen (CH₄/H₂), and the concentrations of methane were 0.25, 0.5, 1, 2, 3 and 4 vol%, respectively. Crystallinity and nucleation density according to changes in methane concentration were investigated. At this time, the discharge power, vacuum pressure, and deposition time were kept constant. In order to deposit polycrystalline diamond, the sapphire substrate was etched with sulfuric acid and hydrogen peroxide (ratio 3:7), and the sapphire surface was polished for 30 minutes with 100 nm-sized nanodiamond particles. The deposited diamond thin film was analyzed by a scanning electron microscope (SEM), a Raman spectra, Atomic force microscope (AFM) and an X-ray diffractometer (XRD). By controlling the ratio of methane to hydrogen and performing appropriate pre-treatment conditions, a polycrystalline diamond thin film having excellent crystallinity and nucleation density was obtained.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1994년도 하계학술대회 논문집 C
• /
• pp.1493-1495
• /
• 1994

Study on the effect of hydrogen flow rate and $CH_4$ concentration in deposition of the diamond thin films by MWPECVD diamond thin films were deposited on Si substrate from $CH_4-H_2-O_2$ system by MWPE CVD, and identified by SEM, XRD and Raman spectroscopy. The flow rate of hydrogen didn't affect the surface morphology and crystallity of diamond thin films, but did slightly affect growth rate. When the concentration of oxygen was fixed at 40%, the growth rate and crystallity of diamond thin films were gradually improved according to increasment of concentration of $CH_4$ but growth rate of the thin films showed peak at 7% and the crystallity showed peak at 6%.

• Korean Membrane Journal
• /
• 제3권1호
• /
• pp.69-74
• /
• 2001

Films of TiO$_2$/SiO$_2$ were deposited on the inner surface of the porous glass support tubes by decomposition of tetraisopropyl titanate (TIPT) and tetraethyl orthosilicate (TEOS) at atmospheric pressure. Dense and hydrogen -permselective membranes were formed at 400-600$\^{C}$. The permeation rates of H$_2$ through the membrane at 600$\^{C}$ were 0.2-0.4 ㎤(STP)/min-㎠ atm and H$_2$:N$_2$permeation ratios were above 1000. The permeation properties of the membranes were investigated at various deposition temperatures and TIPT/TEOS concentrations. Decomposition of TIPT alone at temperatures above 400$\^{C}$ produced porous crystalline TiO$_2$ films and they were not H7-selective. Decomposition of TEOS produced H$_2$-permeable SiO$_2$ films at 400-600$\^{C}$ but film deposition rate was very low. Addition of TIFT to the TEOS stream significantly accelerated the deposition rate and produced highly H$_2$-selective films. Increasing the TIPT/TEOS concentration ratio increased the deposition rate. The TiO$_2$/SiO$_2$ membranes formed at 600 $\^{C}$ have the permeation properties comparable to those of SiO$_2$ membranes produced from TEOS.

• 대한전기학회:학술대회논문집
• /
• 대한전기학회 1996년도 하계학술대회 논문집 C
• /
• pp.1532-1535
• /
• 1996

Diamond-like carbon (DLC) films have been prepared by a widely-used plasma CVD with an rf (13.56MHz) plasma of $CH_4$ gas. The hydrogen incorporated in DLC films plays an important role of determining the film properties, but its exact role has not been clear. In this study, the effect of hydrogen on the film properties of DLC has been examined by adding the hydrogen gas to the $CH_4$ gas during deposition and by exposing the prepared film to the hydrogen plasma. As the content of additive hydrogen gas increases, the density and hardness of the film increase, but the growth rate decreases. The FT-IR spectroscopy results show that the number of C-H bonds decreases with increasing the hydrogen gas. Also, the variation in the position of "G" and "D" peaks due to additive hydrogen, which has been measured by the Raman spectroscopy, indicates of $sp^3$ fraction.

• 한국재료학회지
• /
• 제12권4호
• /
• pp.235-239
• /
• 2002

In this study mesh-type PECVD system was suggested to minimize the hydrogen concentration. The main structural difference between the triode system and a conventional system is that, a third electrode, a mesh, is inserted between the powered and the ground electrode. We investigated several conditions to compare with conventional PECVD. The main effect of mesh was to minimize the substrate damage by ion bombardment and to enhance the surface reaction to induce hydrogen desorption. It was also found that hydrogen concentration decreased but deposition rate increased as increasing applied bias. Applied DC-bia s enhanced sputtering process. Intense ion bombardment causes the weakly bonded hydrogen or hydrogen-containing species to leave the growing film and increased adatom mobility. Furthermore, addition of hydrogen gas enhance the surface diffusion of adatom.