• Title/Summary/Keyword: Hot Wall Method

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Process Design of the Hot Pipe Bending Process Using High Frequency Induction Heating (고주파 유도가열을 이용한 열간 파이프 벤딩 공정 설계)

  • Ryu, Gyeong-Hui;Lee, Dong-Ju;Kim, Dong-Jin;Kim, Byeong-Min;Kim, Gwang-Ho
    • Journal of the Korean Society for Precision Engineering
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    • v.18 no.9
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    • pp.110-121
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    • 2001
  • During hot pipe bending using induction heating, the wall of bending outside is thinned by tensile stress. In design requirement, the reduction of wall thickness is not allowed to exceed 12.5%. So in this study, two methods of bending, one is loading of reverse moment and the other is loading of temperature gradient, have been investigated to design pipe bending process that satisfy design requirements. For this purpose, finite element analysis with a bending radius 2Do(outer diameter of pipe) has been performed to calculate proper reverse moment and temperature gradient to be applied. Induction heating process has been analyzed to estimate influence of heating process parameters on heating characteristic by finite difference method. Then pipe bending experiments have been performed for verification of finite element and finite difference analysis results. Experimental results are in good agreement with the results of simulations.

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Growth and characterization of ZnIn$_2$S$_4$ single crystal thin film using Hot Wall Epitaxy method (Hot Wall Epitaxy (W)에 의한 ZnIn$_2$S$_4$ 단결정 박막 성장과 특성)

  • 윤석진;홍광준
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.266-272
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    • 2002
  • The stochiometric mixture of evaporating materials for the ZnIn$_2$S$_4$ single crystal thin film was prepared from horizontal furnace. To obtain the ZnIn$_2$S$_4$ single crystal thin film, ZnIn$_2$S$_4$ mixed crystal was deposited on throughly etched semi-insulating GaAs(100) in the Hot Wall Epitaxy(HWE) system. The source and substrate temperature were 610 $^{\circ}C$ and 450 $^{\circ}C$, respectively and the growth rate of the ZnIn$_2$S$_4$ single crystal thin film was about 0.5 $\mu\textrm{m}$/hr. The crystalline structure of ZnIn$_2$S$_4$ single crystal thin film was investigated by photo1uminescence and double crystal X-ray diffraction(DCXD) measurement. The carrier density and mobility of ZnIn$_2$S$_4$ single crystal thin film measured from Hall effect by van der Pauw method are 8.51${\times}$10$\^$17/ cm$\^$-3/, 291 $\textrm{cm}^2$/V$.$s at 293 $^{\circ}$K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the ZnIn$_2$S$_4$ single crystal thin film, we have found that the values of spin orbit splitting ΔSo and the crystal field splitting ΔCr were 0.0148 eV and 0.1678 eV at 10 $^{\circ}$K, respectively. From the photoluminescence measurement of ZnIn$_2$S$_4$ single crystal thin film, we observed free excition (E$\_$X/) typically observed only in high quality crystal and neutral donor bound exciton (D$^{\circ}$,X) having very strong peak intensity. The full width at half maximum and binding energy of neutral donor bound excition were 9 meV and 26 meV, respectively. The activation energy of impurity measured by Haynes rule was 130 meV.

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Growth and Characterization of CuGaTe$_2$ Sing1e Crystal Thin Films by Hot Wall Epitaxy (Hot Wall Epitaxy (HWE) 방법에 의한 CuGaTe$_2$ 단결정 박막 성장과 특성)

  • 유상하;홍광준
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.273-280
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    • 2002
  • The stochiometric mix of evaporating materials for the CuGaTe$_2$ single crystal thin films was prepared from horizontal furnance. For extrapolation method of X-ray diffraction patterns for the CuGaTe$_2$ polycrystal, it was found tetragonal structure whose lattice constant a$\_$0/ and c$\_$0/ were 6.025 ${\AA}$ and 11.931 ${\AA}$, respectively. To obtain the single crystal thin films, CuGaTe$_2$ mixed crystal was deposited on throughly etched semi-insulator GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperature were 670 $^{\circ}C$ and 410 $^{\circ}C$ respective1y, and the thickness of the single crystal thin films is 2.1 $\mu\textrm{m}$. The crystalline structure of single crystalthin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). Hall effect on this sample was measured by the method of van der Pauw and studied on carrier density and mobility dependence on temperature. The carrier density and mobility of CuGaTe$_2$ single crystal thin films deduced from Hall data are 8.72${\times}$10$\^$23/㎥, 3.42${\times}$10$\^$-2/㎡/V$.$s at 293K, respectively. From the photocurrent spectrum by illumination of perpendicular light on the c - axis of the CuGaTe$_2$ single crystal thin film, we have found that the values of spin orbit coupling Δs.o and the crystal field splitting Δcr were 0.0791 eV and 0/2463eV at 10K, respectively. From the PL spectra at 10K, the peaks corresponding to free bound excitons and D-A pair and a broad emission band due to SA is identified. The binding energy of the free excitons are determined to be 0.0470eV and the dissipation energy of the donor -bound exciton and acceptor-bound exciton to be 0.0490eV, 0.00558eV, respectively.

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Growth of HgCdTe thin film by the hot-wall epitaxy method (Hot-wall epitaxy 방법에 의한 HgCdTe 박막 성장)

  • 최규상;정태수
    • Journal of the Korean Vacuum Society
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    • v.9 no.4
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    • pp.406-410
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    • 2000
  • Using the hot-wall epitaxy method, we grew a $Hg_{1-x}Cd_xTe$ (MCT) thin film in-situ after growing (111) CdTe of 9 $mu \textrm{m}$ as a buffer layer. The value of FWHM of double crystal x-ray diffraction rocking curve was 125 arcsec and the surface morphology was clean with a small roughness of 10 nm. From measuring the photocurrent of the grown MCT thin film, the maximum peak wavelength and the cut-off wavelength were 1.1050 $\mu\textrm{m}$ (1.1220 eV) and 1.2632 $\mu\textrm{m}$ (0.9815 eV), respectively. This peak wavelength corresponds to the peak of the band gap due to the intrinsic transition of the photoconductor. Therefore, the MCT thin film could be used as the photoconducting detector sensing a near-IR wavelength band from 1.0 to 1.6 $\mu\textrm{m}$.

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Growth and Characterization of ZnS Thin Films by Hot Wall Method (Hot Wall법에 의한 ZnS 박막의 제작과 특성)

  • Lee, Sang-Tae
    • Journal of Navigation and Port Research
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    • v.26 no.1
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    • pp.120-126
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    • 2002
  • ZnS thin films were prepared on glass substrate at various deposition conditions by a HW apparatus and were systematically investigated the growth characteristics, in terms of deposition edges by a double beam spectro- photometer, and structural analysis by a x-ray diffraction rates were increased with incresing the cell temperature and vapor pressure of sulfur, but were decreased with increasing substrate temperature. The optical characteristics of thin films depends on the deposition rates. The band gap energies of 3.46∼3.52eV measured at room temperature are smaller than the theoretical value of 3.54eV, indicating that impurities exist in the crystal. All ZnS thin films are oriented in the (III) principal direction of a zincblende structure. By introducing the S vapor, optical and crystalline properties have been improved.

Non-uniform wall temperature effect of the flow and heat transfer of a hot circular air jet impinging on a circular cylinder (비균일 벽면 온도가 원형 실린더에 충돌하는 고온 제트 유동 및 열전달에 미치는 영향)

  • Hong, Gi-Hyeok;Gang, Sin-Hyeong
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.21 no.7
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    • pp.882-890
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    • 1997
  • A buoyant jet flow impinging on a circular cylinder is investigated including heat conduction through the cylinder. Temperature and flow fields are obtained by an iterative method, and the effects of the non-uniform wall temperature on the flow and heat transfer are analyzed. Effects of three-dimensionality and the traversing of the jet are also included. Nusselt number over the cylinder surface for the conjugate case is relatively small as compared with the constant wall temperature case due to the small temperature gradient. As the conductivity of the cylinder becomes lower, Nusselt number decreases due to the reduced temperature gradient. Increasing jet traversing speed causes the surface temperature of the cylinder to decrease, which increases local Nusselt number over the surface.

Finite Element Analysis of Natural Convection of Fluids with Low Prandtl Number in a Square Enclosure (유한요소법을 이용한 정방형 밀폐용기내의 플란틀수가 낮은 유체의 자연대류에 관한 연구)

  • 김무현;이진호;강신형;손영석
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.12 no.3
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    • pp.541-550
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    • 1988
  • Natural convection in a square enclosure was investigated numerically for low prandtl number fluids using Finite Element Method. In case of Ra=10$^{4}$, 10$^{5}$ and 10$^{6}$ the temperature gradient decreases gradually at the lower end of the hot wall(or at the upper end of the cold wall) as prandtl number decreases in the range of 0.01 .leq. Pr .leq. 10. Maximum heat transfer occurs at a somewhat higher point from the lower end of hot wall(or at somewhat lower point from the upper end of the cold wall) and it draws near to the lower end of the hot wall(or draws near to the upper end of the cold wall) with increasing prandtl number. The flow in the enclosure appears as an Unicell Pattern for Ra .leq. 10$^{4}$ and secondarily flows(or tertiary flows) appears in the core region for Ra .geq. 10$^{5}$ . The line joining the center of secondary cells skewes in a clockwise direction as the Prandtl number decreases.

Annealing effects of AgInS$_2$/GaAs Epilayer grown by Hot Wall Epitaxy

  • K. J. Hong;Park, C.S.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.07a
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    • pp.823-827
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    • 2001
  • The AgInS$_2$epilayers with chalcopyrite structure grown by using a hot-wall epitaxy (HWE) method have been confirmed to be a high quality crystal. From the optical absorption measurement, the temperature dependence of the energy band gap on the AgInS$_2$/GaAs was derived as the Varshni's relation of Eg(T)=2.1365 eV-(9.89${\times}$10$\^$-3/ eV)T$^2$/(2930+T). After the as-grown AgInS$_2$/GaAs was annealed in Ag-,S-, and In-atmosphere, the origin of point defects of the AgInS$_2$/GaAs has been investigated by using the photoluminescence (PL) at 10 K. The native defects of V$\_$Ag/, V$\_$s/, Ag$\_$int/, and S$\_$int/ obtained from PL measurement were classified to donors or acceptors type. And, we concluded that the heat-treatment in the S-atmosphere converted the AgInS$_2$/GaAs to optical p-type. Also, we confirmed that the In in the AgInS$_2$/GaAs did net from the native defects because the In in AgInS$_2$did exist as the form of stable bonds.

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Properties of Photoluminescience for AgInS2/GaAs Epilayer Grown by Hot Wall Epitaxy

  • Lee, Sang-Youl;Hong, Kwang-Joon
    • Transactions on Electrical and Electronic Materials
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    • v.5 no.2
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    • pp.50-54
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    • 2004
  • The AgInS$_2$epilayers with chalcopyrite structure grown by using a hot-wall epitaxy (HWE) method have been confirmed to be a high quality crystal. From the optical absorption measurement, the temperature dependence of the energy band gap on the AgInS$_2$/GaAs was derived as the Varshni's relation of E$\_$g/(T) = 2.1365 eV - (9.89${\times}$10$\^$-3/ eV/K) T$^2$/(2930+T eV). After the as-grown AgInS$_2$/GaAs was annealed in Ag-, S-. and In-atmosphere, the origin of point defects of the AgInS$_2$/GaAs has been investigated by using the photoluminescence (PL) at 10 K. The native defects of $V_{Ag}$, $V_s$, $Ag_{int}$, and $S_{int}$ obtained from PL measurement were classified to donors or accepters type. And, we concluded that the heat-treatment in the S- atmosphere converted the AgInS$_2$/GaAs to optical p-type. Also, we confirmed that the In in the AgInS$_2$/GaAs did not form the native defects because the In in AgInS$_2$did exist as the form of stable bonds.

Growth and temperature dependence of energy band gap for $CuAISe_2$ Single Crystal Thin Film by Hot Wall Epitaxy (Hot Wall Epitaxy(HWE)법에 의한 $CuAlSe_2$ 단결정 박막의 성장과 에너지 밴드갭의 온도 의존성)

  • Yun, Seok-Jin;Hong, Kwang-Joon
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.121-122
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    • 2007
  • Single crystal $CuAlSe_2$ layers were grown on thoroughly etched sem-insulating GaAs(l00) substrate at $410^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $CuAlSe_2$ source at $680^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $CuAlSe_2$ thin films measured with Hall effect by van der Pauw method are $9.24{\times}l0^{16}\;cm^{-3}$ and $295\;cm^2/V{\cdot}s$ at 293K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;=\;2.8382\;eV\;-\;(8.68\;{\times}\;10^{-4}\;eV/K)T^2/(T\;+\;155\;K)$.

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