1 |
H. Okuyama, K. Nakano, T. Miyajima, K. Akimoto, 'Epitaxial growth of ZnMgSSe on GaAs substrate by molecular beam epitaxy', JPn. J. Appl. Phys., 30, (1991), pp.L1620-L1623
DOI
|
2 |
K. Ohmi, Y. Yamano, S. Lee, T. Ueda, S. Tanaka, H. Kobayashi, 'Growth and characterization of SrS/ZnS multilayered electroluminescent thin films grown by hot wall technique', J. Crystal Growth, 138, (1994), pp. 1061-1065
DOI
ScienceOn
|
3 |
C. Frey, D. Serafin, R. Boudreau,'High-brightness rf-sputtered ZnS:Mn films for TFEL displays', SID 88 Digest, (1988), pp.16-18
|
4 |
T. Suntola, 'Atomic layer epitaxy', Materials Science Report 4, (1989), pp.261-312
|
5 |
A. Lopez-Otero, 'Growth of PbTe films under near-equilibrium condition', J. Appl. Phys., 48, (1977), pp.446-448
DOI
|
6 |
D. Schikora, H.Sitter, J. Humenberger, K. Lischka, 'High quality CdTe epilayers on GaAs grown by hot-wall epitaxy', Appl. Phys. Lett., 48, (1986), pp. 1276-1278
DOI
|
7 |
허성곤, 'Hot Wall법에 의한 ZnS 박막의 제작과 특성에 관한 연구', 석사학위논문, (2000)
|
8 |
日本學術振興會薄膜제31委員會 編 '薄膜ハンいブック', オ-ム社, (1983), p918
|
9 |
J.I. Pankove, 'Optical process in semiconductors', Dover Pub., Inc., pp.34-60, 1971
|
10 |
The Electhcal Engineering Handbook, Ed.-in-chief R. C. Dorf, CRC Press, Inc., (1993) 2534
|
11 |
加藝說軌, 'X線回折分析', 內田老鶴圃, (1990), pp.246-251
|