• Transactions of the Society of Information Storage Systems
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• v.1 no.2
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• pp.143-149
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• 2005

In this paper we propose a novel volume hologram encryption system with binary amplitude masks rather than phase masks, in which volume holograms can be securely recorded against the attacks by a third party. In our system, the encryption is done by multiplexing two volume holograms in such a way that an original binary data page is first stored as a volume hologram by interference with a binary amplitude mask and then the complementary data page is stored as another volume hologram by interference with the complementary binary amplitude mask over the first hologram. The operation principle of our system is explained with the well-known theory of recording and reading a volume hologram in a photorefractive material and the experimental results are presented. Experimental data show that our encryption system is protected from blind decryptions by randomly-generated incorrect amplitude masks.

• Journal of the Optical Society of Korea
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• v.5 no.3
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• pp.99-109
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• 2001

This paper presents a phase-only modulation scheme for a three-dimensional (3-D) image matching system to improve optical efficiency of the system. The 3-D image matching system is based on the two mask heterodyne scanning. A hologram of the 3-D reference object is first created and then the phase of the hologram is extracted. The phase of the hologram is represented as one mask with the other mask being a plane wave. The superposition of each beam modulated by the two masks generated a scanning beam pattern. This beam pattern scans the 3-D target object to be recognized. The output of the scanning system gives out the correlation of the phase-only hologram of the reference object and the complex hologram of the target object. Since a hologram contains 3-D information of an object as a form of fringe pattern, the correlation of holograms matches whole 3-D aspect of the objects. Computer simulations are performed with additive gaussian noise and without noise for the complex hologram modulation scheme and the phase-only hologram modulation scheme. The computer simulation results show that the phase-only hologram modulation scheme improves the optical efficiency. Thus the system with the phase-only hologram modulation scheme is more robust than the system with the complex hologram modulation scheme.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.33 no.8
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• pp.793-798
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• 2009

In this paper, the simulation and optimization of SRH (Surface Relief Hologram) masks for printing LCD gate patterns using TIR (Total Internal Reflection) holographic lithography was investigated. A simulation and optimization algorithm based on SDTA (Scalar Diffraction Theory Analysis) method was developed. The accuracy of the algorithm was compared to that of the RCWA (Rigorous Coupled Wave Analysis) method for estimating the Fresnel diffraction pattern of Cr amplitude masks for the given system geometry. In addition, the results from the optimization algorithm were validated experimentally. It was found that one to the most important conditions for the fabrication of SRH masks is to avoid nonlinear shape distortions of the resulting grating. These distortions can be avoided by designing SRH masks with recorded gratings having small aspect ratios of width versus depth. The optimum gap size between the Cr and SRH masks was found using the optimization algorithm. A printed LCD gate pattern with a minimum line width of $1.5{\mu}m$ exposed using the optimized SRH mask was experimentally demonstrated.

• Korean Journal of Optics and Photonics
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• v.20 no.3
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• pp.175-181
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• 2009

Holographic lithography is one of the potential technologies for next generation lithography which can print large areas (6") as well as very fine patterns ($0.35{\mu}m$). Usually, photolithography has been developed with two target purposes. One was for LCD applications which require large areas (over 6") and micro pattern (over $1.5{\mu}m$) exposure. The other was for semiconductor applications which require small areas (1.5") and nano pattern (under $0.2{\mu}m$) exposure. However, holographic lithography can print fine patterns from $0.35{\mu}m$ to $1.5{\mu}m$ keeping the exposure area inside 6". This is one of the great advantages in order to realize high speed fine pattern photolithography. How? It is because holographic lithography is taking holographic optics instead of projection optics. A hologram mask is the key component of holographic optics, which can perform the same function as projection optics. In this paper, Surface-Relief TIR Hologram Mask technology is introduced, and enables more robust hologram masks than those previously reported that were formed in photopolymer recording materials. We describe the important parameters in the fabrication process and their optimization, and we evaluate the patterns printed from the surface-relief TIR hologram masks.

• Korean Journal of Optics and Photonics
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• v.18 no.5
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• pp.303-308
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• 2007

We report here on the application of a digital holographic microscope as a metrology tool for the inspection and the micro-topography reconstruction of different micro-structures of phase shift photo-mask (PSM). The lithography by phase shift photo-mask uses the interference and the pattern of the PSM is not imaged by general optical microscope. The technique allows us to obtain digitally a high-fidelity surface topography description of the phase shift photo-mask with only one hologram image acquisition, allowing us to have relatively simple and compact set-ups able to give quantitative information of PSM.

• Proceedings of the IEEK Conference
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• 1999.06a
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• pp.958-961
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• 1999

A new image encoding and identification scheme is proposed for security verification by using CGH(computer generated hologram), random phase mask, and correlation technique. The encrypted image, which is attached to the security product, is made by multiplying QPH(quadratic phase hologram) using SA(simulated annealing) algorithm with a random phase function. The random phase function plays a role of key when the encrypted image is decrypted. The encrypted image could be optically recovered by 2-f system and automatically verified for personal identification. Simulation results show the proposed method cand be used for the reconstruction and the recognition of the encrypted. Image.

• Journal of Korea Society of Industrial Information Systems
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• v.22 no.4
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• pp.1-9
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• 2017

In this Paper, Double Encryption Technology Based on Phase-Shifting Digital Holography and Digital Watermarking is Proposed. For the Purpose, we First Set a Logo Image to be used for Digital Watermark and Design a Binary Phase Computer Generated Hologram for this Logo Image using an Iterative Algorithm. And Random Generated Binary Phase Mask to be set as a Watermark and Key Image is Obtained through XOR Operation between Binary Phase CGH and Random Binary Phase Mask. Object Image is Phase Modulated to be a Constant Amplitude and Multiplied with Binary Phase Mask to Generate Object Wave. This Object Wave can be said to be a First Encrypted Image Having a Pattern Similar to the Noise Including the Watermark Information. Finally, we Interfere the First Encrypted Image with Reference Wave using 2-step PSDH and get a Good Visible Interference Pattern to be Called Second Encrypted Image. The Decryption Process is Proceeded with Fresnel Transform and Inverse Process of First Encryption Process After Appropriate Arithmetic Operation with Two Encrypted Images. The Proposed Encryption and Decryption Process is Confirmed through the Computer Simulations.

• Transactions of the Society of Information Storage Systems
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• v.7 no.1
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• pp.42-46
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• 2011

Holographic Data Storage System (HDSS), one of the next generation data storage devices, is a 2-dimensional page oriented memory system using volume hologram. HDSS has many noise sources such as crosstalk, scattering and inter pixel interference, etc. The noise source is changing intensity of the light used for carrying the data signal in HDSS. The inter pixel interference results in decrease of Signal to Noise Ratio and increase of Bit Error Rate. In order to improve these problems, this paper proposes to compensate the inter pixel interference with simple interference mask.

• Korean Journal of Optics and Photonics
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• v.20 no.1
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• pp.23-28
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• 2009

In this study, we propose an image stitching method for large-area holographic photo lithography. In this method, a hologram medium become a hologram mask for lithography. And the mask has information for stitched images. These images are recorded by signal images which are controlled with DMD (digital micro-mirror device), and serial hologram recording is achieved with a motorized linear stage. Using this method, fringe seams appear on the stitching area. To remove these fringe seams, double exposure holographic lithography is tried. Each stitched image is recorded and reconstructed with a different reference beam. The experiments confirm that fringe seams are removed.

• Journal of the Optical Society of Korea
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• v.4 no.1
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• pp.19-22
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• 2000

A new image encoding and identification scheme is proposed for security verification by us-ing a CGH(computer generated hologram), random phase mask, and a correlation technique. The encrypted image, which is attached to the security product, is made by multiplying a QP- CGH(quadratic phase CGI) with a random phase function. The random phase function plays a key role when the encrypted image is decrypted. The encrypted image can be optically recovered by a 2-f imaging system and automatically verified for personal identification by a 4-f correlation system. Simulation results show the proposed method can be used for both the reconstruction of an original image and the recognition of an encrypted image.