• 제어로봇시스템학회:학술대회논문집
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• 2003.10a
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• pp.1216-1219
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• 2003

The position control is very important in semiconductor manufacturing devices, precision machining tools, precision measuring instruments, etc. The accuracy of measurement for the distance in these devices affect on the performance of the whole devices. Therefore, in those precision instruments, a sensing device that can measure the distance of movement with high-precision resolution is required. In this paper, a novel hybrid (digital and analog) type encoder is proposed. It is shown that from several experiments, a high-resolution angular position measurement device can be designed with a low cost incremental encoder and a DSP controller.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.159-160
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• 2013

• The Transactions of the Korean Institute of Power Electronics
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• v.8 no.6
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• pp.512-518
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• 2003

Position controls are very important in semiconductor manufacturing devices, machine tools Precision measuring instruments, etc. To measure the distance of movement of moving objects in minute units and the accuracy of measurement for the moving distance in these devices affect the performance of the whole devices. Therefore, in those Precision instruments, a sensing device that can measure the distance of movement with high-precision resolution is required. In this paper, a novel encoder of digital and analog hybrid type is proposed. It is shown that from this experiment a high-resolution angle measurement device can be designed by a low cost incremental encoder.

• Korean Journal of Remote Sensing
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• v.40 no.1
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• pp.103-114
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• 2024

The escalating demands for high-resolution satellite imagery necessitate the dissemination of geospatial data with superior accuracy.Achieving precise positioning is imperative for mitigating geometric distortions inherent in high-resolution satellite imagery. However, maintaining sub-pixel level accuracy poses significant challenges within the current technological landscape. This research introduces an approach wherein upsampling is employed on both the satellite image and ground control points (GCPs) chip, facilitating the establishment of a high-resolution satellite image precision sensor orientation. The ensuing analysis entails a comprehensive comparison of matching performance. To evaluate the proposed methodology, the Compact Advanced Satellite 500-1 (CAS500-1), boasting a resolution of 0.5 m, serves as the high-resolution satellite image. Correspondingly, GCP chips with resolutions of 0.25 m and 0.5 m are utilized for the South Korean and North Korean regions, respectively. Results from the experiment reveal that concurrent upsampling of satellite imagery and GCP chips enhances matching performance by up to 50% in comparison to the original resolution. Furthermore, the position error only improved with 2x upsampling. However,with 3x upsampling, the position error tended to increase. This study affirms that meticulous upsampling of high-resolution satellite imagery and GCP chips can yield sub-pixel-level positioning accuracy, thereby advancing the state-of-the-art in the field.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2007.11a
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• pp.289-290
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• 2007

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.847-848
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.06a
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• pp.501-502
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• 2009

• Proceedings of the KIEE Conference
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• 2003.07b
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• pp.1006-1008
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• 2003

Position controls are very important in semiconductor manufacturing devices, machine tools precision measuring instruments, etc. to measure the distance of movement of moving objects in minute units and the accuracy of measurement for the moving distance in these devices affect the performance of the whole devices. Therefore, in those precision instruments, a sensing device that can measure the distance of movement with high-precision resolution is required. In this paper, a novel encoder of digital and analog hybrid type is proposed. It is shown that from this experiment a high-resolution angle measurement device can be designed by a low cost incremental encoder.

• International Journal of Precision Engineering and Manufacturing
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• v.1 no.1
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• pp.49-55
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• 2000

The semiconductor industry relies on digital optical imaging for the overlay metrology of integrated circuit patterns. One critical performance demand in the particular application of digital imaging is placed on the edge resolution that is defined as the smallest detectable displacement of an edge from its image acquired in digital from. As the critical feature size of integrated circuit patterns reaches below 0.35 micrometers, the edge resolution is required to be less than 0.01 micrometers. This requirement is so stringent that fundamental behaviors of digital optical imaging need to be explored especially for the precision coordinate metrology. Our investigation reveals that the edge resolution shows quasi-random characteristics, not being simply deduced from relevant opto-electronic system parameters. Hence, a stochastic upper bound analysis is made to come up with the worst edge resolution that can statistically well predict actual indeterminate edge resolutions obtained with high magnification microscope objectives.

• International Journal of Precision Engineering and Manufacturing
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• v.9 no.3
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• pp.51-54
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• 2008

A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.