Browse > Article

Development of an In-process Confocal Positioning System for Nanostereolithography Using Evanescent Light  

Kajihara, Yusuke (Department of Precision Engineering, School of Engineering, The University of Tokyo)
Takeuchi, Toru (Department of Precision Engineering, School of Engineering, The University of Tokyo)
Takahashi, Satoru (Department of Precision Engineering, School of Engineering, The University of Tokyo)
Takamasu, Kiyoshi (Department of Precision Engineering, School of Engineering, The University of Tokyo)
Publication Information
International Journal of Precision Engineering and Manufacturing / v.9, no.3, 2008 , pp. 51-54 More about this Journal
Abstract
A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.
Keywords
In-process and on-line metrology; Evanescent light; Nanostereolithography; Optical system; Confocal system;
Citations & Related Records
Times Cited By KSCI : 2  (Citation Analysis)
Times Cited By Web Of Science : 2  (Related Records In Web of Science)
Times Cited By SCOPUS : 2
연도 인용수 순위
1 Sim, J.-H., Lee, E.-D. and Kweon, H.-J., "Effect of the Laser Beam Size on the Cure Properties of a Photopolymer in Stereolithography," International Journal of Precision Engineering and Manufacturing, Vol. 8, No. 4, pp. 50-55, 2007   과학기술학회마을
2 Ko, S-L., "Measurement and Effective Deburring for the Micro Burrs in Piercing Operation," International Journal of Precision Engineering and Manufacturing, Vol. 1, No. 1, pp. 152-159, 2000
3 Wilson, T., "Confocal Microscopy," Academic Press, p. 4, 1990
4 Yoo, H., Lee S., Kang, D., Kim, T., Gweon, D., Lee, S. and Kim, K., "Confocal Microscopy: a High-Resolution Nondestructive Surface Profiler," International Journal of Precision Engineering and Manufacturing, Vol. 7, No. 4, pp. 3-7, 2006   과학기술학회마을
5 Varadan, V. K., Ziang, Z. and Varadan, V. V., "Microstereolithography," Wiley, p. 87, 2001
6 Kawata, S., Arimoto, R. and Nakamura, O., "Three-dimensional optical-transfer-function analysis for a laser-scan fluorescence microscope with an extended detector," Journal of the Optical Society of America A, Vol. 8, No. 1, pp. 171-175, 1991   DOI
7 Kajihara, Y., Takeuchi, T., Takahashi, S. and Takamasu, K., "Development of a nano-stereolithography system using evanescent light for submicron fabrication," Proc. American Society for Precision Engineering Annual Meeting, Vol. 39, No. 1, pp. 111-114, 2006
8 Minsky, M., "Microscopy Apparatus," US Patent, No.3013467, 1961
9 Jacobs, P. F. "Rapid Prototyping & Manufacturing," Society of Manufacturing Engineers, p. 18, 1992
10 Kajihara, Y., Inazuki, Y., Takahashi, S. and Takamasu, K., "Study of nano-stereolithography using evanescent light," Proc. American Society for Precision Engineering Annual Meeting, Vol. 34, No. 1, pp. 149-152, 2004
11 Dixon, A. E., Damaskinos, S. and Atkinson, M. R., "A scanning confocal microscope for transmission and reflection imaging," Nature, Vol. 351, Issue 6327, pp. 551-553, 1991   DOI   ScienceOn
12 Fornel, F. de., "Evanescent waves from Newtonian optics to atomic optics," Springer, p. 8, 2001
13 Sun, C., Fang, N., Wu, D. M. and Zhang, X., "Projection micro-stereolithography using digital micro-mirror dynamic mask," Sensors and Actuators A, Vol. 121, Issue 1, pp. 113-120, 2005   DOI   ScienceOn
14 Miyoshi, T., "Novel Microstereolithography using LCD Live-motion Mask,"Proc. International Conference on Model Transformation, pp. 53-58, 2004
15 Born, M. and Wolf, E, "Principle of Optics," Pergamon Press, p. 395, 1980