International Journal of Precision Engineering and Manufacturing

Korean Society for Precision Engineering (한국정밀공학회)
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Development of an In-process Confocal Positioning System for Nanostereolithography Using Evanescent Light

  • Kajihara, Yusuke (Department of Precision Engineering, School of Engineering, The University of Tokyo) ;
  • Takeuchi, Toru (Department of Precision Engineering, School of Engineering, The University of Tokyo) ;
  • Takahashi, Satoru (Department of Precision Engineering, School of Engineering, The University of Tokyo) ;
  • Takamasu, Kiyoshi (Department of Precision Engineering, School of Engineering, The University of Tokyo)
  • Published : 2008.07.01
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Abstract

A novel stereolithography method using evanescent light has been proposed as a means to realize 100-nanometer resolution. An in-process measurement system with high accuracy has been introduced to the nanostereolithography apparatus. Specifically, an optical microscopic system was developed to monitor the exposure process and a confocal positioning system was established to improve the longitudinal positioning accuracy in the layer-by-layer process. A high-power objective lens, a tube lens, and a charge coupled device (CCD) were included in the optical microscopic system, whereas a laser, a high-power objective lens, a piezoelectric (PZT) stage, a condenser lens, a pinhole, and a photomultiplier (PMT) made up the confocal microscopic system. Two verification experiments were conducted, and the results indicated that the optical microscopic system had a horizontal resolution of 200 nm and that the confocal positioning system provided a depth resolution of 30.8 nm. These results indicate that nanostereolithography can be successfully performed with this system.

Keywords

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