• Proceedings of the PSK Conference
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• 2002.10a
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• pp.86-87
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• 2002

Recent technological innovations in the drug discovery process such as combinatorial synthesis and high throughput screening have led to the identification of an increasingly large number of compounds at the hits-to-leads stage. Therefore, rapid and precise pharmacokinetic/metabolic screening is essential to enhance the tractability of selected leads and to minimize the risk of failure in the later stages of drug development. (omitted)

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.1489-1492
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• 2005

Compared to other nano-patterning techniques, Nano imprint Lithography (NIL) has some advantages of high throughput and low process cost. To imprint low temperature and pressure, UV Nano imprint Lithography, which using the monomer based UV curable resin is suggested. Because fabrication of high fidelity pattern on topographical substrate is difficult, bi-layer Nano imprint lithography, which are consist of easily removable under-layer and imprinted pattern, is being used. If residual layer is not remained after imprinting, and under-layer is removed by oxygen RIE etching, we might be able to fabricate the bi-layer pattern for easy lift-off process.

• Journal of the Institute of Electronics and Information Engineers
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• v.51 no.6
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• pp.34-42
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• 2014

This paper presents a low-complexity and high-throughput symbol detector for two-spatial-stream multiple-input multiple-output systems based on the modified maximum-likelihood symbol detection algorithm. In the proposed symbol detector, the cost function is calculated incrementally employing a multi-cycle architecture so as to eliminate the complex multiplications for each symbol, and the slicing operations are performed hierarchically according to the range of constellation points by a pipelined architecture. The proposed architecture exhibits low hardware complexity while supporting complicated modulations such as 256 QAM. In addition, various modulations and antenna configurations are supported flexibly by reconfiguring the pipeline for the slicing operation. The proposed symbol detector is implemented with 38.7K logic gates in a $0.11-{\mu}m$ CMOS process and its throughput is 166 Mbps for $2{\times}$3 16-QAM and 80Mbps for $2{\times}3$ 64-QAM where the operating frequency is 478 MHz.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.06a
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• pp.633-636
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• 2005

Imprint lithography is a promising method for high-resolution and high-throughput lithography using low-cost equipment. As with other nanoimprint methods, ultraviolet-nanoimprint lithography (UV-NIL) resolution appears to be limited only by template resolution, and offers a significant cost of ownership reduction when compared to other next generation lithography (NGL) methods such as EUVL and 157 nm lithography. The purpose of this paper is to suggest optimum values of control parameters of Imprio 100 manufactured by Molecular Imprint, Inc., which is the first commercially available UV-NIL tool, for sound nanoimprint. UV-NIL experiments were performed on Imprio 100 to find dispensing recipe for avoiding air entrapment. Dispensing recipe related to residual layer thickness and uniformity was optimized and 40 nm thick residual layer was achieved.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.15 no.4
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• pp.321-332
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• 2017

In order to build a general model of a high-throughput uranium electrorefining process according to the electrode configuration, numerical analysis was conducted using the COMSOL Multiphysics V5.3 electrodeposition module with Ordinary Differential Equation (ODE) interfaces. The generated model was validated by comparing a current density-potential curve according to the distance between the anode and cathode and the electrode array, using a lab-scale (1kg U/day) multi-electrode electrorefiner made by the Korea Atomic Energy Research Institute (KAERI). The operating temperature was $500^{\circ}C$ and LiCl-KCl eutectic with 3.5wt% $UCl_3$ was used for molten salt. The efficiency of the uranium electrorefining apparatus was improved by lowering the cell potential as the distance between the electrodes decreased and the anode/cathode area ratio increased. This approach will be useful for constructing database for safety design of high throughput spent nuclear fuel electrorefiners.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.10
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• pp.1153-1158
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• 2011

Roll-to-roll process is an emerging mass production method for printed and flexible electronics such as touch screen panel, RFID tag, thin film solar cell, and flexible display due to its high throughput. High precision in printing and coating is required to apply functional materials onto substrate. For such reason, every part of the roll-to-roll equipment needs to be precisely fabricated and to retain its precision under regular operation. In this article, the precision of cantilever type idler roller and a novel method to mitigate its deflection under web tension loading are discussed and the method is verified using both the numerical and the experimental works. The proposed method improves the structural rigidity of cantilever type roller whose advantages, such as low capital cost and high web path configurability, are maintained.

• Progress in Superconductivity and Cryogenics
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• v.25 no.4
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• pp.24-27
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• 2023

Until now, many research activities have been conducted to commercialize high-temperature superconducting (HTS) wires for electric applications. Most of all researchers have focused on enhancing the piece length, critical current density, mechanical strength, and throughput of HTS wires. Recently, HTS magnet for generating high magnetic field shows degraded performance due to the deformation of HTS wire by high electro-magnetic force. The deformation can be derived from widthwise thickness non-uniformity of HTS wire mainly caused by wet processes such as electro-polishing of metal substrate and electro-plating of copper. Gradient sputtering process is designed to improve the thickness uniformity of HTS wire along the width direction. Copper stabilizing layer is deposited on HTS wire covered with specially designed mask. In order to evaluate the thickness uniformity of HTS wire after gradient sputtering process, the thickness distribution across the width is measured by using the optical microscope. The results show that the gradient deposition process is an effective method for improving the thickness uniformity of HTS wire.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07b
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• pp.1123-1126
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• 2005

For creation of low temperature polycrystallinesilicon (LTPS) the line beam excimer laser annealing (ELA) is a well known and established technique in mass production. With introduction of Sequential Lateral Solidification (SLS) some aspects such as crystalline quality, throughput and flexibility regarding the substrate size could be improved, but for OLED manufacturing still further process development is necessary. This paper discusses line beam ELA and SLS techniques that might enable process engineers to make polycrystalline-silicon (poly-Si) films with a high degree of uniformity and quality as required for system on glass (SOG) and active matrix organic light emitting displays (AMOLED). Equipment requirements are discussed and compared to previous standards. SEM images of process examples are shown in order to demonstrate the viability.

• Journal of Environmental Science International
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• v.31 no.12
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• pp.1051-1059
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• 2022

This study investigated microbial communities and their diversity in a full-scale mesophilic anaerobic digester treating sewage sludge. Influent sewage sludge and anaerobic digester samples collected from a wastewater treatment plant in Busan were analyzed using high-throughput sequencing. It was found that the microbial community structure and diversity in the anaerobic digester could be affected by inoculation effect with influent sewage sludge. Nevertheless, distinct microbial communities were identified as the dominant microbial communities in the anaerobic digester. Twelve genera were identified as abundant bacterial communities, which included several groups of syntrophic bacteria communities, such as Candidatus Cloacimonas, Cloacimonadaceae W5, Smithella, which are (potential) syntrophic-propionate-oxidizing bacteria and Mesotoga and Thermovigra, which are (potential) syntrophic-acetate-oxidizing bacteria. Lentimicrobium, the most abundant genus in the anaerobic digester, may contribute to the decomposition of carbohydrates and the production of volatile fatty acids during the anaerobic digestion of sewage sludge. Of the methanogens identified, Methanollinea, Candidatus Methanofastidiosum, Methanospirillum, and Methanoculleus were the dominant hydrogenotrophic methanogens, and Methanosaeta was the dominant aceticlastic methanogens. The findings may be used as a reference for developing microbial indicators to evaluate the process stability and process efficiency of the anaerobic digestion of sewage sludge.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.18 no.2
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• pp.329-334
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• 2014

This paper proposes the hardware architecture of high performance multi-mode 2D forward transform for HEVC which has same number of cycles for processing any type of four TUs and yield high throughput. In order to make the original image which has high pixel and high resolution into highly compressed image effectively, the transform technique of HEVC supports 4 kinds of pixel units, TUs and it finds the optimal mode after performs each transform computation. As the proposed transform engine uses the common computation operator which is produced by analyzing the relationship among transform matrix coefficients, it can process every 4 kinds of TU mode matrix operation with 35cycles equally. The proposed transform block was designed by Verilog HDL and synthesized by using TSMC 0.18um CMOS processing technology. From the results of logic synthesis, the maximum operating frequency was 400MHz and total gate count was 214k gates which has the throughput of 10-Gpels/cycle with the $4k(3840{\times}2160)@30fps$ image.