• Proceedings of the Materials Research Society of Korea Conference
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• 1993.11a
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• pp.73-73
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• 1993

• Proceedings of the Korean Vacuum Society Conference
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• 2008.08a
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• pp.50-50
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• 2008

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.1 no.1
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• pp.51-59
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• 1991

Early stage of GaAs nucleation on Si substrate was theoretically studied by computer simulation. Compared to the constant ledge interaction energy in conventional nucleation theory, functional behavior of ledge-ledge interaction resulted in small size clusters depending on the cluster size and shape. Among various kinds of clusters, the multilayer pyramidal shape GaAs cluster requires smallest excess free energy due to the formation of Ga(111) facet planes. There this result suggests that the defects involved in GaAs/Si are originated from the early stage nucleation.

• The Korean Journal of Ceramics
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• v.2 no.4
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• pp.197-202
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• 1996

The highly oriented diamond particles were deposited on the mirror-polished (100) silicon substrates in the bell-jar type microwave plasma deposition system using a three-step process consisting if carburization, bias-enhanced nucleation and growth. By adjusting the geometry of the substrate and substrate holder, very dense disc-shaped plasma was formed over the substrate when the bias voltage was below -200V. Almsot perfectly oriented diamond films were obtained only in this dense disc-shaped plasma. From the results of the optical emission spectra of the dense disc-shaped plasma, it was found that the concentrations of atomic hydrogen and hydrocarbon radical were increased with negative bias voltage. It was also found that the highly oriented diamonds were deposited in the region, where the intensity ratios of carbonaceous species to atomic hydrogen are saturated.

• Korean Journal of Materials Research
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• v.14 no.10
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• pp.707-712
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• 2004

$BiFeO_3$ films grown on (111) $SrTiO_3$ substrate have a rhombohedral structure, identical to that of single crystals. On the other hand, films grown on (110) or (001) $SrTiO_3$ substrate are monoclinically distorted from the rhombohedral structure due to the epitaxial constraint. The easy axis of spontaneous polarization is close to [111] for the variously oriented films. Dramatically enhanced polarization and magnetization have been found for hetero-epitaxially grown $BiFeO_3$ thin films comparing to that of $BiFeO_3$ crystals. The results are explained in terms of an epitaxially-induced transition between cycloidal and homogeneous spin states, via magneto-electric interactions.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.186-186
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• 2011

[100] 방향으로 4$^{\circ}$ 기울어진 Si(001)-2${\times}$1(vicinal surface)을 초고진공하(UHV)에서 청결하게 하고 열처리하면 rebonded-atom을 가진 DB double step과 이 step에 나란한 아홉 개의 dimer를 가진 평균 폭이 4.0 nm인 single-domain의 (001)-2${\times}$1 테라스의 면으로 재구조된다 [그림 a]. 본 연구에서는 이 표면 위에 Sb을 상온에서 증착하여 덮고 후열처리하면(2 ML, 500$^{\circ}C$ 10 분), Sb-dimer가 Si 표면을 한 층 덮고 (001) 테라스의 Sb-dimer 방향이 DA double-step과 수직을 이루는 1${\times}$2 구조를 이룬다는 사실을 STM으로 확인하였다 [그림 b]. 이러한 Sb-passivation의 효과는 표면 Si-dimer의 부분적으로 채워진 dangling-bond를 Sb-dimer의 완전히 채워진 고립쌍(lone-pair)으로 바꿈으로써 표면 자유 에너지를 줄이고, 나아가 계면 Si 층은 bulk에 유사하게 되는 데에 있다. 이 passivation 된 표면은 Ge/Si 등의 heteroepitaxy에 사용할 수 있고, 특히 single-domain을 유지하며 step 방향에 대해 평행인 dimer-row로 이루어져 있어서 원자나 전자의 이동에 비등방적 효과를 증가시킬 것이 예측된다.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.28A no.5
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• pp.380-386
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• 1991

Hydrogen plasma-assisted epitaxial(PAE) growth of GaAs/Si and GaAs/Ge/Si with Ge buffer layer has been investigated. By means of photoluminescence, Nomarski microscopu, and $\alpha$-step, it could be known that GaAs on Si with Ge buffer layer has better crystalline quality than GaAs on Si without Ge buffer layer. The stoichiometry of GaAs layer on Si was confirmed by the depth profile of Auger electron spectroscope (AES). Also the native oxide(SiO$_2$) layer on Si substrate was plama-etched and the removal of the oxide layer was confirmed by AES. Photoluminescence peak wavelength of GaAs/Ge/Si with Ge buffer of 1\ulcorner thickness and GaAs growth rate of 160$\AA$/min was 8700$\AA$and FWHM was 12$\AA$.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.11 no.6
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• pp.105-110
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• 2002

ZnTe epilayers have been successfully grown on (100) CaAs substrate by hot wall epitaxy (HWE) with Zn reservoir. Optimum growth condition has been determined by a four-crystal rocking curve (FCRC). It was found that Zn partial pressure from h reservoir has a strong influence on the quality of grown films. Under the determined optimum growth condition, ZnTe epitaxial films with thickness of 0.72~24.8${\mu}m$ were grown for studying the effect of the thickness on crystalline quality. The FCRC results indicated that the quality of ZnTe films becomes higher rapidly with increase of thickness up to 6${\mu}{\textrm}{m}$. The best value of the FWHM of the few crystal rocking curve, 66 arcsec, was obtained on the film with $12{\mu}m$ in thickness. Until now, this result shows the best quality of ZnTe/GaAs films in reported.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.11 no.6
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• pp.111-117
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• 2002

The high quality and a nearly stoichometric growth of $Cd_{1-y} Zn_y$/Te(y＝0.04) epilayers have been successfully grown on GaAs substrate by hot wall epitaxy (HWE) by optimizing the growth condition including the preheating treatment and Cd reservoir temperature. The relationship between quality and thickness was examined and best value of FWHM from X-ray rocking curve of 121 arcsec are obtained. Also, emission peaks related to the recombination of free excitons such as the ground state and the first excited state were observed in the PL spectrum at 4.2K. The ($A^0$, X) emission related to Cd vacancy and deep level emission was not measured. These results indicated that the grown CZT/GaAs epilayer was high qualify and purity.

• Journal of the Korean institute of surface engineering
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• v.47 no.6
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• pp.287-292
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• 2014

The present study deals with a numerical analysis on the island growth of heteroepitaxial thin-films through local surface diffusivity enhancement. A non-linear governing equation for the surface waviness evolution in lattice-mismatched material systems is developed for the case of spatially-varying surface diffusivity. Results show that a flat film that is stable under constant diffusivity conditions evolves to form nanostructures upon externally-induced spatial diffusivity modulation. The periodicity of waviness can be controlled by changing the modulation parameters, which allows for generation of pattern arrays. The present study therefore points towards a post-deposition treatment technique that achieves controllability and order in the structure formation process for applications in nanoelectronics and thin-film devices.