• Title/Summary/Keyword: Gate Design

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Gate Location Design of an Automobile Junction Box with Integral Hinges (복합힌지를 갖는 차량용 정션박스의 게이트 위치설계)

  • 김홍석
    • Transactions of Materials Processing
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    • v.12 no.2
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    • pp.134-140
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    • 2003
  • Polymers such as polypropylene or polyethylene offer a unique feature of producing an integral hinge, which can flex over a million times without causing a failure. With such advantage manufacturing, time and cost required at the assembly stage can be eliminated by injecting the whole part as one piece. However, due to increased fluidity resistance at hinges during molding, several defects such as short shot or premature hinge failure can occur with the improper selection of gate locations. Therefore, it is necessary to optimize flow balancer in injection molding of part with hinges before actually producing molds. In this paper, resin flow patterns depending on several gate positions were investigated by numerical analyses of a simple strip part with a hinge. As a result, we found that the properly determined gate location leads to better resin flow and shorter hesitation time. Finally, injection molding tryouts using a mold that was designed one of the proposed gate systems were conducted using polypropylene that contained 20% talc. The experiment showed that hinges without defects could be produced by using the designed gate location.

Design of Unified Trench Gate Power MOSFET for Low on Resistance and Chip Efficiency (낮은 온저항과 칩 효율화를 위한 Unified Trench Gate Power MOSFET의 설계에 관한 연구)

  • Kang, Ey-Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.26 no.10
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    • pp.713-719
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    • 2013
  • Power MOSFET operate voltage-driven devices, design to control the large power switching device for power supply, converter, motor control, etc. We have optimal designed planar and trench gate power MOSFET for high breakdown voltage and low on resistance. When we have designed $6,580{\mu}m{\times}5,680{\mu}m$ of chip size and 20 A current, on resistance of trench gate power MOSFET was low than planar gate power MOSFET. The on state voltage of trench gate power MOSFET was improved from 4.35 V to 3.7 V. At the same time, we have designed unified field limit ring for trench gate power MOFET. It is Junction Termination Edge type. As a result, we have obtained chip shrink effect and low on resistance because conventional field limit ring was convert to unify.

Design of XOR Gate Based on QCA Universal Gate Using Rotated Cell (회전된 셀을 이용한 QCA 유니버셜 게이트 기반의 XOR 게이트 설계)

  • Lee, Jin-Seong;Jeon, Jun-Cheol
    • Asia-pacific Journal of Multimedia Services Convergent with Art, Humanities, and Sociology
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    • v.7 no.3
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    • pp.301-310
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    • 2017
  • Quantum-dot cellular automata(QCA) is an alternative technology for implementing various computation, high performance, and low power consumption digital circuits at nano scale. In this paper, we propose a new universal gate in QCA. By using the universal gate, we propose a novel XOR gate which is reduced time/hardware complexity. The universal gate can be used to construct all other basic logic gates. Meanwhile, the proposed universal gate is designed by basic cells and a rotated cell. The rotated cell of the proposed universal gate is located at the central of 3-input majority gate structure. In this paper, we propose an XOR gate using three universal gates, although more than five 3-input majority gates are used to design an XOR gate using the 3-input majority gate. The proposed XOR gate is superior to the conventional XOR gate in terms of the total area and the consumed clock because the number of gates are reduced.

A Study on the Electrical Characteristics with Design Parameters in 1,200 V Trench Gate Field Stop IGBT (1,200 V급 Trench Gate Field Stop IGBT 소자의 전기적 특성 향상 방안에 관한 연구)

  • Geum, Jong-Min;Jung, Eun-Sik;Kang, Ey-Goo;Sung, Man-Young
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.25 no.4
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    • pp.253-260
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    • 2012
  • IGBT (insulated gate bipolar transistor) have received wide attention because of their high current conduction and good switching characteristics. To reduce the power loss of IGBT, the on state voltage drop should be lowered and the switching time should be shorted. However, there is Trade-off between the breakdown voltage and the on state voltage drop. To achieving good electrical characteristics, field stop IGBT (FS IGBT) is proposed. In this paper, 1,200 V planar gate non punch-through IGBT (planar gate NPT IGBT), planar gate FS IGBT and trench gate FS IGBT is designed and optimized. The simulation results are compared with each three structures. In results, we optain optimal design parameters and confirm excellence of trench gate FS IGBT. Experimental result by using medici, shows 40% improvement of on state voltage drop.

Design of 1,200 V Class High Efficiency Trench Gate Field Stop IGBT with Nano Trench Gate Structure (1 um 미만의 나노트렌치 게이트 구조를 갖는 1,200 V 고효율 트렌치 게이트 필드스톱 IGBT 설계에 관한 연구)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.31 no.4
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    • pp.208-211
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    • 2018
  • This paper details the design of a 1,200 V class trench gate field stop IGBT (insulated gate bipolar transistor) with a nano gate structure smaller than 1 um. Decreasing the size is important for lowering the cost and increasing the efficiency of power devices because they are high-voltage switching devices, unlike memory devices. Therefore, in this paper, we used a 2-D device and process simulations to maintain a gate width of less than 1 um, and carried out experiments to determine design and process parameters to optimize the core electrical characteristics, such as breakdown voltage and on-state voltage drop. As a result of these experiments, we obtained a wafer resistivity of $45{\Omega}{\cdot}cm$, a drift layer depth of more than 180 um, an N+ buffer resistivity of 0.08, and an N+ buffer thickness of 0.5 um, which are important for maintaining 1,200 V class IGBTs. Specially, it is more important to optimize the resistivity of the wafer than the depth of the drift layer to maintain a high breakdown voltage for these devices.

Analysis of Design Application for Separated Gate System in Port Container Terminal (컨테이너터미널의 분리게이트 설계적용 분석)

  • Choi Yong-Seok;Ha Tae-Young;Kim Woo-Seon
    • Proceedings of the Korean Institute of Navigation and Port Research Conference
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    • 2005.10a
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    • pp.125-131
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    • 2005
  • Gate operations are very important as they are the starting point for export containers and the end point for import containers as far as checking and control exercised by terminal operators are concerned. The objective of this paper is to propose the design of separated gate system in order to reduce the truck turnaround time and to distribute the truck traffic volume in port container terminal. Because of a lot of container load and unload within short term, many trucks have to pass the gate at a time. This study suggests the separated gate system as an efficient design for gate operation considering integration of two individual berth.

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A Study on Parameters for Design of IGBT (IGBT 설계 Parameter 연구)

  • Lho, Young-Hwan;Lee, Sang-Yong;Kim, Yoon-Ho
    • Proceedings of the KSR Conference
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    • 2009.05a
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    • pp.1943-1950
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    • 2009
  • The development of high voltage Insulated Gate Bipolar Transistor (IGBT) have given new device advantage in the areas where they compete with conventional GTO (Gate Turnoff Thyristor) technology. The IGBT combines the advantages of a power MOSFET (Metal-Oxide Semiconductor Field-Effect Transistor) and a bipolar power transistor. The change of electrical characteristics for IGBT is mainly coming from the change of characteristics of MOSFET at the input gate and the PNP transistors at the output. The gate oxide structure gives the main influence on the changes in the electrical characteristics affected by environments such as radiation and temperature, etc.. The change of threshold voltage, which is one of the important design parameters, is brought by charge trapping at the gate oxide. In this paper, the electrical characteristics are simulated by SPICE simulation, and the parameters are found to design optimized circuits.

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A Study on the Circuit Design Methodology and Performance Evaluation for Hybrid Gate Driver (하이브리드 게이트 드라이버를 위한 회로 디자인 방법과 성능 평가에 관한 연구)

  • Cho, Geunho
    • Journal of IKEEE
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    • v.25 no.2
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    • pp.381-387
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    • 2021
  • As Head-Mounted Displays(HMDs), which are mainly used to maximize realism in games and videos, have experienced increased demand and expanded scope of use in education and training, there is growing interest in methods to enhance the performance of conventional HMDs. In this study, a methodology to utilize Carbon NanoTubes(CNTs) to improve the performance of gate drivers that send control signals to each pixel circuit of the HMD is discussed. This paper proposes a new circuit design method that replaces the transistors constituting the buffer part of the conventional gate driver with transistors incorporating CNTs and compare the performance of the suggested gate drive with that of a gate driver comprising only conventional transistors via simulations. According to the simulation results, by including CNTs in the gate driver, the output voltage can be increased by approximately 0.3V compared to the conventional gate driver high voltage(1.1V) at a speed of 12.5 GHz and the gate width also can be reduced by up to 20 times.

Simulations of Gate Driving Schemes for Large Size, High Quality TFT-LCD (대면적 고화질 TFT-LCD용 게이트 Driving에 관한 Simulation)

  • Jung, Soon-Shin;Yun, Young-Jun;Kim, Tae-Hyung;Choi, Jong-Sun
    • Proceedings of the KIEE Conference
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    • 1999.07d
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    • pp.1809-1811
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    • 1999
  • In recent years, attempts have been made to greatly improve the display quality of active-matrix liquid crystal display devices, and many techniques have been proposed to solve such problems as gate delay, feed-through voltage and image sticking. Gate delay is one of the biggest limiting factors for large-screen-size, high-resolution thin-film transistor liquid crystal display (TFT/LCD) design. Many driving method proposed for TFT/LCD progress. Thus we developed gate driving signal generator. Since Pixel-Design Array Simulation Tool (PDAST) can simulate the gate, data and pixel voltages of a certain pixel on TFT array at any time and at any location on an array, the effect of the driving signals of gate lines on the pixel operations can be effectively analyzed.

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사출성형의 게이트 위치 최적화

  • Lim, Won-Gil;Kim, Young-Il;Seol, Kwon
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1996.04a
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    • pp.787-791
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    • 1996
  • In injection molding, location of gates have great influence on the quality of plastic parts. Usually, they are located by releated trial and errors of experienced mold designers. In this topic we will present the numerical algorithm for finding the optimal gate locations. Optimization algorithm is devided into two stages. In the first stage, candidated optimal gate locations can be found by geometry of part only; whereas in the next step, more acculate gate locations are selected byiterative computation with optimization part and analysis part. So from the following study, we suggested the modified flow-volume method, which will define the optimal gate locations in injection mold design.

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