• Journal of the Korean Ceramic Society
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• v.34 no.8
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• pp.870-876
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• 1997

Ge-Ga-S glasses, contrary to other well-known chalcogenide glasses, show high rare-earth solubility. Raman spectra of GeS2-Ga2S3 glasses showed that two peaks at 260 cm-1 and 385 cm-1 increased in intensity with the addition of Ga2S3. These peaks are associated with the vibration of Ge-Ge bonds and edge-shared [GsS4] tetrahedra, respectively. In GeS2-Ga2S3-La2S3 glasses, the peak at 260 cm-1 decreased in intensity with addition of La2S3 and the one at 375 cm-1 due to the vibration of tetrahedra with non-bridging sulfurs increased. It indicated that La, or rare-earths in general, can easily be dissolved into the glass network as charge compensators for non-bridging sulfurs which were formed through the dissociation of Ge-Ge bonds and edge-shared [GaS4] tetrahedra. Since no such structural modification is expected in glasses as Ga-As-S, these peculiar transitions on the connection scheme in Ga-containing chalcogenide glasses seem to be playing the most important role on the enhanced rare-earth solubility.

• Korean Journal of Materials Research
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• v.15 no.8
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• pp.491-495
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• 2005

(Zn,Mg)O (ZMO) thin films doped with Ga $(0\~0.03mol\%)$ in the target source were prepared by pulsed laser deposition on c-plane sapphire substrates at $500^{\circ}C$, and the effect of Ga contents on the properties of the electrical, optical and crystal properties of the deposited films was investigated. From X-ray diffraction patterns, ZMO film doped with $0.02 mol\%$ Ga showed crystal structure with c-axis preferred orientation, showing only the (0002) and (0004) diffraction peaks. In contrast, ZMO film doped with $Ga=0.03 mol\%$ showed a randomly oriented crystal structure. All the samples were highly transparent, showing the transmittance values of above $85\%$ in the visible region. For all the Ga doped ZMO films, the value of energy band gap was found to be about 3.5 eV, regardless of their Ga contents. From the Hall measurements, the resistivity and the carrier density for the ZMO film doped with $0.01 mol\%$ Ga were about $5\times10^{-4}\Omega-cm$ and $2\times10^{21}cm^{-3}$, respectively.

• Electronics and Telecommunications Trends
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• v.36 no.3
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• pp.53-64
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• 2021

As the 5G service market is expected to grow rapidly, the development of high-power, high-efficiency power amplifiers for the 5G communication infrastructure is indispensable. Gallium nitride (GaN) is attracting great interest as a key device in power devices and integrated circuits due to its wide bandgap, high carrier concentration, high electron mobility, and high-power saturation characteristics. In this study, we investigate the technology trends of Ka-band GaN radio frequency (RF) power devices and integrated circuits for operation in the millimeter-wave band of recent 5G mobile communication services. We review the characteristics of GaN RF high electron mobility transistor (HEMT) devices to implement power amplifiers operating at frequencies around 28 GHz and compare the technology of foreign companies with the device characteristics currently developed by the Electronics and Telecommunication Research Institute (ETRI). In addition, the characteristics of Ka-band GaN monolithic microwave integrated circuit (MMIC) power amplifiers manufactured using various GaN HEMT device technologies are reviewed by comparing characteristics such as frequency band, output power, and output power density of integrated circuits. In addition, by comparing the performance of the power amplifier developed by ETRI, the current status and future direction of domestic GaN power devices and integrated circuit technology will be discussed.

• Journal of the Korean Ceramic Society
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• v.35 no.7
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• pp.757-763
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• 1998

The effect of {{{{ {Ga }^{3+ } }} addition on the photoluminescence and cathodoluminescence of {{{{ {SrTiO}_{3 } }}:{{{{ { Pr}^{3+ } }} was stu-died by performing the excitation emission and decay time measurements. Addition of {{{{ {Ga }^{3+ } }} in {{{{ {SrTiO}_{3 } }}:{{{{ { Pr}^{3+ } }} resulted in a considerable enhancement of {{{{ { Pr}^{3+ } }} emission intensity. From the analysis of the experimental results the following mechanism is proposed. Excitation in the {{{{ {SrTiO}_{3 } }} host lattice leads to the formation of electrons in the conduction band and holes in the valence band. The electrons in the conduction band re-combine radiatively with the holes trapped at {{{{ { Ga}^{3+ } }} and the energy is transferred to {{{{ { Pr}^{3+ } }} ion which give its own characteristic red emission.

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.25-28
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• 2001

In this paper, we have investigated the effects of gas flow rate, rf power, process pressure and Ar addition on reactive ion etching of InP, InGaAs and InAlAs using Sic14 and Cl$_2$ gases. The etch rates were measured by using a surface profiler. The etched profiles, sidewall roughness, and surface morphology were observed by scanning electron microscopy and by atomic force microscopy. The selective etching of InGaAs to InP and InAlAs was studied by varying the etching parameters. It was found that Cl$_2$ gas is more efficient for the selective etching of InGaAs to InAlAs than SiCl$_4$ gas. The etch selectivity of InGaAs to InAlAs is strongly dependent on the rf power and the process pressure.

• Journal of the Korean Ceramic Society
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• v.30 no.11
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• pp.911-918
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• 1993

X-ray photoelectron spectroscopy(XPS) has been empolyed to investigate the structure of PbO-Bi2O3-Ga2O3 glasses. XPS OIS spectra recorded from binary PbO-Ga2O3 glasses clearly showed the presence of two peacks due to bridging and non-bridging oxygens, respectively. Gaussin best-fit deconvolution of the OIS peaks suggested there are substaintial amount of non-bridging oxygens in the structure. Therefore, in addition to the glassforming and charge compensating roles of PbO as suggested from the previous works, role of PbO as network modifiers needs to be considered. Addition of Bi2O3 to binary glasses resulted in the rapid decrease in the amount of non-bridging oxygens as well as in values of FWHM (Full Width at the Half Maximum intensity). It is believed that Bi2O3 form distorted BiO6 octahedra and therefore, work as intermediates. Infrared spectra also suggested that Ga2O3 behave as network-formers in the form of GaO4- tetrahedra.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.20 no.3
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• pp.113-116
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• 2010

We report on the growth and characteristics of the structural and optical properties of InGaN nano-structures doped with antimony (Sb) as a catalyst. The use of catalyst has been explored to modify the growth and defect generation during strained layer heteroepitaxial growth. We performed the growth of the InGaN nano-structures on c-sapphire substrates using mixed-source hydride vapor phase epitaxy (HVPE). The characteristic of samples was measured by scanning electron microscope (SEM) and photoluminescence (PL). The aligning direction of c-axis of the InGaN nano-structures was changed from vertical to parallel or inclined to the surface of substrates when the Sb was added as a catalyst. The indium composition was estimated about 3.2% in both cases of with or without the addition of Sb in the InxGal-xN structures. From the results of InGaN nano-structures formed with the addition of Sb, we can expect the performance of optical devices would be more improved by reduced piezo-electric field if we use the InGaN nano-structures of which c-axes are aligned parallel to the substrates as an active layer.

• Journal of the Korean Ceramic Society
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• v.50 no.3
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• pp.206-211
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• 2013

The effect of a $WO_3$ or $Ga_2O_3$ addition on the densification, phase evolution, optical reflectance, and elastic and dielectric properties of $Y_2O_3$-doped AlN ceramics sintered at $1800^{\circ}C$ for 3 h is investigated. The investigated compositions of the additives are 4.5 wt% $Y_2O_3$ (YA), 3.5 wt% $Y_2O_3$-1.0 wt% $Ga_2O_3$ (YGA), and 3.5 wt% $Y_2O_3$-1.0 wt% $WO_3$ (YWA). $YAlO_3$ and $Y_4Al_2O_9$ form as the secondary phases in all of the investigated compositions, whereas $W_2B$ appears additionally in the YWA. In the YGA, Ga is detected in the AlN grains, indicating that the dissolution of $Ga_2O_3$ into the AlN lattice occurs. The addition of $WO_3$ blackens the specimen more significantly than that of $Ga_2O_3$ does. In all of the investigated specimens, the linear shrinkage and the apparent density are above 20 percent and in the range of 3.34-3.37 $g/cm^3$, respectively. The elastic modulus, Poisson's ratio, the dielectric constant, and the dielectric loss are in the ranges of 335-368 GPa, 0.146-0.237, 8.60-8.63, $2.65-3.95{\times}10^{-3}$, respectively. The sinterability and the properties of $Y_2O_3$-doped AlN ceramics are not much altered by the addition of $WO_3$ or $Ga_2O_3$.

• Proceedings of the KIEE Conference
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• 1999.07d
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• pp.1925-1927
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• 1999

At the study, it has fabricated Al/AlN/GaAs MIS capacitor using DC reactive sputtering method. To applicate GaAs semiconductor in a MIS devices, investigated capability of AIN thin film by the insulator layer. Also it has investigated inversion of C-V characteristics by addition of the hydrogen(hydrogen concentration: 5%) and it has investigated that leakage current has $10^{-8}A/cm^2$ for 1 MV/cm breakdown electric field of I-V characteristics.

• The Korean Journal of Ceramics
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• v.4 no.1
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• pp.43-46
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• 1998

We have investigated the formation and thermal stability of cobalt aluminide(CoAl) thin films on GaAs. In order to obtain cobalt-aluminide thin films, we deposited a multilayer of Co/Al on GaAs, and subsequently annealed the samples at 80$0^{\circ}C$ for 30 min. After annealing, single-phase cobalt aluminide was produced showing a flat and uniform interface with GaAs. which indicates that cobalt aluminide (CoAl) is thermally stable with GaAs. In addition, the adherence and mechanical properties of the as-deposited, and annealed Co/Al multilayer structure on GaAs are compatible with those required for device fabrication processes. The electrical property of the CoAl/GaAs contact shows rectifying characteristics, indicating that the diodes were usable as rectifying gate electrodes.