• Applied Microscopy
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• 제39권4호
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• pp.349-354
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• 2009

TFT-LCD의 구조불량이 발생한 박막 트랜지스터에 대해서 집속이온빔 가공장치(Dual-beam FIB/SEM)를 이용하여 연속절편법(Serial sectioning)과 일련의 연속적인 2차원 주사전자현미경 이미지를 얻었고, IMOD 소프트웨어를 통해서 3차원 구조구현(3D reconstruction) 연구를 하였다. 3차원 구조구현 결과, Gate막과 Data막이 접합되어 있는 불량이 관찰되었다. 두 막이 접합되어서 ON/OFF 역할을 하는 Gate의 기능이 상실되었고, Data신호는 Drain을 통해서 투명전극에 전류를 공급하여 계속 빛나는 선 불량(line defect)이 발생한 것으로 판단된다. 이 논문의 결과인 집속이온빔 가공장치(Dual-Beam FIB/SEM)를 이용한 3차원 구조구현 연구와 연속절편법, 주사전자현미경 이미지작업, 이미지 프로세싱에 대한 결과는 향후 연구의 기초자료로 활용될 수 있을 것으로 판단된다.

• 한국전자파학회논문지
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• 제16권5호
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• pp.465-471
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• 2005

본 논문에서는 빔 전파법(BPM: Beam Propagation Method)을 이용하여 안테나 배열에서 발생된 집속된 빔의 전파 또는 집속 현상을 파악하는 방법을 제시하였다. 대물 쪽(object side)으로 적응적 집속을 위해 로트맨 렌즈를 이용하는 경우에 대해 회절이론을 바탕으로 집속 현상을 이론적으로 고찰하였다. 이를 검증하기 위해 상용 EM simulation tool을 이용하여 분석하기에는 구조물의 복잡성과 집속된 빔의 입전 설정 등 몇 가지 어려움이 있기에 이의 차선책(alternative solution)으로 푸리에 회절 이론에 기초한 빔 전파법을 이용하여 집속 현상을 계산하는 방법인 BPM을 소개하였다. 즉, 개구면을 통한 빔 전파는 Fresnel Diffraction Integral(FDI)에서 푸리에 변환 형태로 표현될 수 있으며 이는 BPM으로 발전시켜 개구면 형(aperture-type) 안테나로부터 전파되는 파의 빔 폭(beam width or spot size), 세 기(intensity or gain), 그리고 실제 초점거리를 산출하였다. $10\lambda$의 배 열 크기를 갖는 안테나에 대해 $20\lambda,\;30\lambda$, 그리고 $50\lambda$의 기하 초점거리(geometrical fecal length)를 갖는 파에 대해 BPM을 통해 계산한 결과, 빔 폭은 차례로 1.1\lambda,\;1.3\lambda,\;1.9\lambda$이 산출되었다.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2004년도 춘계학술대회 논문집
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• pp.490-493
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• 2004

There is great difficulty in machine below 10 micrometers by conventional machining methods, such as micro-EDM. However, ultra micro machining using focused ion beam(FIB) is able to machine to 50 nanometers. Bie ＆ moulds techniques are better than one-to-one machining techniques in regards to production costs in the mass production of ultra size structures. Also, it is advantageous to machine die ＆ moulds to the 10 micrometers level by FIB technique rather than other techniques. It is difficult to machine the three dimensional machining, such as micro lens, using FIB system because of their machining characteristics. In this paper, three dimensional machining techniques were properly introduced, and also experiments showed effectiveness of their techniques.

• 한국공작기계학회:학술대회논문집
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• 한국공작기계학회 2004년도 춘계학술대회 논문집
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• pp.482-486
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• 2004

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies, such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. This paper presents that the recent development and our research goals in FIB nano machining technology are given. The emphasis will be on direct milling, or chemical vapor deposition techniques (CVD), and this can distinguish the FIB technology from the contemporary photolithography process and provide a vital alternative to it. After an introduction to the technology and its FIB principles, the recent developments in using milling or deposition techniques for making various high-quality devices and high-precision components at the micro/nano meter scale are examined and discussed. Finally, conclusions are presented to summarize the recent work and to suggest the areas for improving the FIB milling technology and for studying our future research.

• 한국정밀공학회지
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• 제28권2호
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• pp.245-250
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• 2011

A high-resolution shadow mask, a nanostencil, is widely used for high resolution lithography. This high-resolution shadowmask is often fabricated by a combination of MEMS processes and focused ion beam (FIB) milling. In this study, FIB milling on 500-nm-thin SiN membrane was tested and characterized. 500 nm thick and $2{\times}2$ mm large membranes were made on a silicon wafer by micro-fabrication processes of LPCVD, photolithography, ICP etching and bulk silicon etching. A subsequent FIB milling enabled local membrane thinning and aperture making into the thinned silicon nitride membrane. Due to the high resolution of the FIB milling process, nanoscale apertures down to 60 nm could be made into the membrane. The nanostencil could be used for nanoscale patterning by local deposition through the apertures.

• Tribology and Lubricants
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• 제26권2호
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• pp.122-128
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• 2010

Focused Ion Beam (FIB) has been used for site-specific TEM sample preparation and small scale fabrication. Moreover, analysis on the surface microstructure and phase distribution is possible by ion channeling contrast of FIB with high resolution. This paper describes FIB applications and deformed surface structure induced by sliding. The effect of FIB process on the surface damage was explored as well. The sliding experiments were conducted using high purity aluminum and OFHC(Oxygen-Free High Conductivity) copper. The counterpart material was steel. Pin-on-disk, Rotational Barrel Gas Gun and Explosively Driven Friction Tester were used for the sliding experiments in order to investigate the velocity effect on the microstructural change. From the FIB analysis, it is revealed that ion channeling contrast of FIB has better resolution than SEM and the tribolayer is composed of nanocrystalline structures. And the thickness of tribolayer was constant regardless of sliding velocities.

• Nuclear Engineering and Technology
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• 제50권2호
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• pp.259-267
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• 2018

Focused ion beam-scanning electron microscope and electron backscattered diffraction examinations were conducted in the center of a $73\;GWd/t_U\;UO_2$ fuel. They showed the formation of subdomains within the initial grains. The local crystal orientations in these domains were close to that of the original grain. Most of the fission gas bubbles were located on the boundaries. Their shapes were far from spherical and far from lenticular. No interlinked bubble network was found. These observations shed light on previous unexplained observations. They plead for a revision of the classical description of fission gas release mechanisms for the center of high burn-up $UO_2$. Yet, complementary detailed observations are needed to better understand the mechanisms involved.

• Applied Science and Convergence Technology
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• 제25권5호
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• pp.92-97
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• 2016

Surface erosion using focused ion beam irradiation is the most promising technology for the realization of micro/nanofabrication. However, accurate fabrication of predefined structures is still challenging. This article introduces a single step surface driving method to fabricated predefined curved structures. The previously reported multi step surface driving method (MSDM) has been modified so that a single ion dose profile can be used instead of multiple ion dose profiles. Experimental realization of the method is presented with the fabrication of predefined curved surfaces as well as reference to surface propagation theory. For the purpose of verification, simulations are performed on the basis of a sound mathematical model.

• 한국정밀공학회지
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• 제22권5호
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• pp.175-180
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• 2005

The application of focused ion beam (FIB) technology in micro/nano machining has become increasingly popular. Its use in micro/nano machining has advantages over contemporary photolithography or other micro/nano machining technologies such as small feature resolution, the ability to process without masks and being accommodating for a variety of materials and geometries. In this research, fabrication of micro plasma electrode was carried out using FIB. The one of problems of FIB-sputtering is the redeposition of material including Ga+ ion source during sputtering process. Therefore the effect of the redeposition was verified by EDX. And the micro plasma electrode of copper was fabricated by FIB.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2005년도 추계학술대회 논문집
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• pp.326-329
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• 2005

As a flexible method to fabricate sub-micrometer patterns, Focused Ion Beam (FIB) instrument and Self-Assembled Monolayer (SAM) resist are introduced in this work. FIB instrument is known to be a very precise processing machine that is able to fabricate micro-scale structures or patterns, and SAM is known as a good etch resistance resist material. If SAM is applied as a resist in FIB processing fur fabricating nano-scale patterns, there will be much benefit. For instance, low energy ion beam is only needed for machining SAM material selectively, since ultra thin SAM is very sensitive to $Ga^+$ ion beam irradiation. Also, minimized beam spot radius (sub-tens nanometer) can be applied to FIB processing. With the ultimate goal of optimizing nano-scale pattern fabrication process, interaction between SAM coated specimen and $Ga^+$ ion dose during FIB processing was observed. From the experimental results, adequate ion dose for machining SAM material was identified.