• Journal of the Korean Vacuum Society
• /
• v.18 no.2
• /
• pp.133-140
• /
• 2009

$Ta_{2}O_{5}$ thin films were deposited by RF magnetron sputtering method under various RF power, substrates and oxygen partial pressure. Elliptic constants were measured by using a phase modulated spectroscopic ellipsometer and analyzed with the Tauc-Lorentz dispersion formula and best fit method in the range of 310$\sim$1239 nm. Also, transmittance spectra of the films were measured by UV -Vis spectrophotometer in the range of 300$\sim$1000 nm. From these data, thickness of $Ta_{2}O_{5}$ and surface layer were analyzed and changes of magnitude and shape of dispersion of optical constants according to fabricated conditions were measured. Also, to evaluate thickness and optical constants data analyzed by Tauc-Lorentz dispersion formula, the measured and analyzed transmittance spectra were compared. In result of the comparison, two spectra were in good agreement each other. Accordingly, it indicates that our ellipsometric analysis is valid.

• Journal of the Korean Ceramic Society
• /
• v.39 no.3
• /
• pp.252-258
• /
• 2002

Transparent $TiO_2$ thin films prepared by sol-gel process using the modification of titanium(IV) alkoxide showed improved thermal stability and high refraction index. Compared to the pure $TiO_2$ film, the modified $TiO_2$ films show the increased index of refraction under proper condition at pH 2.5. Transparency of these $TiO_2$ thin films were more than 80% in the visible region. It has been demonstrated that the reaction occurs in the amorphous phase: an exchange of phase results in anatase before and after 400$^{\circ}C$, in rutile over 700$^{\circ}$C form the XRD results. The particle sizes, shapes and structures of these nanoclusters in the $TiO_2$ films have been identified through a SEM and XRD. The physical properties and structures of their powders have also been studied through a SEM, XRD, TGA and DSC. The thickness and index of refraction have been determined by the analysis of ellipsometric spectra.

• Journal of the Korean Vacuum Society
• /
• v.16 no.2
• /
• pp.134-140
• /
• 2007

Optical structure of $V_{2}O_{5}$ thin films were analyzed and confirmed, the films were deposited in oxygen partial pressure 0% and 10% by RF magnetron sputtering system. Measurements of the elliptic constants were made in the range of $0.75{\sim}4.0\;eV$ by using phase modulated spectroscopic ellipsometer. The elliptic constants of the thin films were analyze by Double Amorphous dispersion relation. The calculated n, k spectra of $V_{2}O_{5}$ layer were obtained over the range of $0.75{\sim}4.0\;eV$ photon energy. SEM and XRD measurements were also made to validate the ellipsometric analysis and they give good agreement with the structural properties of the films. It was found that optical structure of the $V_{2}O_{5}$ layer has a 3 phase(roughness/film/substrate) and optical absorption properties are greatly depend on the partial pressure of the oxygen.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.18 no.1
• /
• pp.216-221
• /
• 2017

Reducing optical reflection in the visible light range, in order to increase the share of transmitted light and avoid the formation of ghost images in imaging, is important for polymer lens applications. In this study, polymer lenses with refractive indices of n=1.56, 1.60, and 1.67 were fabricated by the injection-molding method with a polymer lens monomer, dibutyltin dichloride as the catalyst and an alkyl phosphoric ester as the release agent. To investigate their anti-reflection (AR) effects, various AR coating structures, viz. a multi-layer AR coating structure, tri-layer AR coating structure with a discrete approximation Gaussian gradient-index profile, and tri-layer AR coating structure with a quarter-wavelength approximation, were designed and coated on the polymer lens by an E-beam evaporation system. The optical properties of the polymer lenses were characterized by UV-visible spectrometry. The material properties of the thin films, refractive index and surface roughness, were analyzed by ellipsometry and AFM, respectively. The most effective AR coating structure of the polymer lens with low refractive index, n=1.56, was the both side coating of multi-layer AR coating structure. However, both side coating of the tri-layered discrete approximation Gaussian gradient-index profile AR coating structure gave comparable results to the both side coating of the multi-layer AR coating structure for the polymer lens with a high refractive index of n=1.67.

• Korean Journal of Optics and Photonics
• /
• v.8 no.1
• /
• pp.31-36
• /
• 1997

We measured refractive indices and thicknesses of SiO$_2$ thin films that have been plated on LCD glass substrate for the purpose of preventing the out-diffusion of sodium ions. The best experimental condition to determine refractive index and thickness of SiO$_2$ thin film by using ellipsometry is searched for, where ⅰ) the film thickness is increased uniformly by 20 $\AA$ from 0 $\AA$ to the period thickness while the angle of incidence is fixed and ⅱ) the angle of incidence is increased uniformly by 1$^{\circ}$ from 45$^{\circ}$ to 70$^{\circ}$ while the film thickness is fixed. We estimated the errors in determining the refractive index and thickness by comparing the measurement error of $\Delta$ and Ψ with the calculated one. The ellipsometric constants of SiO$_2$ thin film on LCD glass substrate are measured at several angle of incidence around the Brewster angle, which is the best angle if the experimental error of ellipsometer is not sensitive to the incident angle. Also the best fit refractive index and thickness of SiO$_2$ thin film to these ellipsometric constants measured at several angle of incidenc eas well as the best fit ones to the SE data are obtained using regressional analysis.

• Korean Journal of Optics and Photonics
• /
• v.25 no.1
• /
• pp.29-37
• /
• 2014

We have studied and demonstrated general, systematic error-correction methods for a dual rotating quarter-wave plate ellipsometer. To estimate and correct 5 systematic error sources (three offset angles and two unexpected retarder phase delays), we used 11 of the 25 Fourier components of the ellipsometry signal obtained in the absence of an optical sample. Using these 11 Fourier components, we can determine the errors from the 5 sources with nonlinear optimization methods. We found systematic errors ${\epsilon}_3$, ${\epsilon}_4$, ${\epsilon}_5$) are more sensitive to the inverted Mueller matrix than retarder phase delay errors (${\epsilon}_1$, ${\epsilon}_2$) because of their small condition numbers. To correct these systematic errors we have found that error of any variety must be less than 0.05 rad. Finally, we can use the magnitudes of these errors to correct the Mueller matrix of optical components. From our experimental ellipsometry signals, we can measure phase delay and the rotational angular position of its fast axis for a half-wave plate.

• Korean Journal of Optics and Photonics
• /
• v.25 no.5
• /
• pp.262-272
• /
• 2014

Using an ellipsometer with dual rotating quarter-wave plates, we have analyzed the relationship between Fourier coefficients and Mueller matrices in the cases of an error-free optical system and of five systematic errors (alignment errors and retardation errors in the quarter-wave plates, and alignment error in the analyzer). In the case with five systematic errors, simulation results show that retardation errors cause more error in the diagonal elements of the Mueller matrix than do alignment errors. We have found that errors in the Mueller matrix caused by initial misalignment of the dual quarter-wave plates were the same. We have chosen the rotation rates of two quarter-wave plates such that the rotational frequencies ${\omega}_1$ and ${\omega}_2$ differ by a factor of 5, i.e. ${\omega}_2=5{\omega}_1$. The simulation results show 0.18% relative error in the diagonal elements ($m_{22}$ and $m_{33}$) and 200% relative error in the off-diagonal elements ($m_{23}$ and $m_{32}$), when we compare errors caused by misalignment of the analyzer to those caused by initial misalignment of the quarter-wave plates. We can use these results in measuring accurate Mueller matrices of optical materials.

• Korean Journal of Optics and Photonics
• /
• v.10 no.3
• /
• pp.181-187
• /
• 1999

We prepared the side-chain type nonlinear optical NPP(N-(6-nitrophenyl)-(L)-prolinol) polymer films by spin coating method. Ellipsometric spectra were in situ collected by using spectroscopic phase modulated ellipsometer while the NPP polymer films were being corona poled at the temperature above glass transition. We calculated film thickness and the refractive index dispersion by modeling the spectro-ellipsometry data in transparent region. We also calculated the refractive index and the extinction coefficient of the polymer films by numerically inverting the spectro-ellipsometry data in absorbing region, while the previously determined film thickness was used. The independently determined extinction coefficient spectra from the analysis of transmission spectra were compared with those by spectro-ellipsometry and they showed an excellent agreement with each other. From the analysis of the complex refractive index change of the NPP polymer thin films induced by the corona poling, we could determine the vertical complex refractive index and the horizontal complex refractive index separately. Using the volume fraction of the vertical component f⊥, the degree of poling of poled NPP polymer films was quantitatively addressed. It is suggested that the present method can be used to quantitatively address the degree of poling in an absolute manner and to depth profile the poled fraction of thick polymer films. It will be useful to understand the structural change of polymer films and hence the poling mechanism during the poling process.

• Journal of the Korean Vacuum Society
• /
• v.18 no.1
• /
• pp.60-65
• /
• 2009

We performed a study on optical properties of $BaSm_2Ti_4O_{12}$ thin films by vacuum ultra violet spectroscopic ellipsometry in the $0.92{\sim}8.6\;eV$ energy range. For the analysis of the measured ellipsometric spectra, a 5-layer model was applied where optical property of the $BaSm_2Ti_4O_{12}$ layer was well represented by a Tauc-Lorentz dispersion function. Our analysis clearly showed new structure in high energy region at about 7.5 eV Consistent changes of refractive index & extinction coefficient of the $BaSm_2Ti_4O_{12}$ thin film by the growth and annealing temperatures were also confirmed.

• Journal of the Korea Academia-Industrial cooperation Society
• /
• v.8 no.4
• /
• pp.726-732
• /
• 2007

We fabricated UV absorption functional $10{\sim}50nm-TiO_{2-x}/quartz$ structures layer using ALD (atomic layer deposition) method. We deposited $10nm-TiO_{2-x}$ layer on quartz substrate using ALD, and film thickness was determined by an ellipsometer. The others specimen thickness was controlled by ALD time lineally. We characterized controlling phase UV and visible optical property using an X-ray difractometer, a UV-VIS-IR spectrometer and a digital camera. $ALD-TiO_{2-x}$ layers were non-stoichiometric $TiO_{2-x}$ form and amorphous phases comparing with bulk $TiO_2$. While the conventional bulk $TiO_2$ had band gap of $3.0{\sim}3.2eV$ resulting in absorption edges at 380 nm and 415 nm, $ALD-TiO_{2-x}$ layers showed absorption edges at 197 nm and 250 nm. Therefore, our nano-thick $ALD-TiO_{2-x}$ was able to absorb shorter UV region and showed excellent transmittance in visible region. Our result implies that our newly proposed nano-thick $TiO_{2-x}$ using ALD process may improve transmittance in visible rays and be able to absorb shorter UV light effectively.