• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.427-428
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.383-384
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• Journal of the Korean Society for Precision Engineering
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• v.24 no.9
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• pp.95-102
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• 2007

The scanning electron microscope (SEM) is one of the most popular instruments available for the measurement and analysis of the micro/nano structures. It is equipped with an electron optical system that consists of an electron beam source, magnetic lenses, apertures, deflection coils, and a detector. The magnetic lenses playa role in refracting electron beams to obtain a focused spot using the magnetic field driven by an electric current from a coil. A SEM column usually contains two condenser lenses and an objective lens. The condenser lenses generate a magnetic field that forces the electron beams to form crossovers at desired locations. The objective lens then focuses the electron beams on the specimen. The present work concerns finite element analysis for the electron magnetic lenses so as to analyze their magnetic characteristics. To improve the performance of the magnetic lenses, the effect of the excitation current and pole-piece design on the amount of resulting magnetic fields and their peak locations are analyzed through the finite element analysis.

• The Journal of Korean Society for Radiation Therapy
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• v.9 no.1
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• pp.40-45
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• 1997

When therapeutic irradiation is indicated for the orbital tumors, the greatest concern is the risk of radiation-induced cataract. Conjunctival lymphoma is one of the good examples. We would like to report the procedure of the lens shielding device(L.S.D) and the result of irradiated dose to the lens. L.S.D. consistes of two parts : load alloy to attenuate electron beam, and dental acryl which completely covers the lead alloy to avoid discomfort of cornea from contacting directly with cerrobend and side scattering by cerrobend. And for easy location and removal, side bars were made on each side. Radiation doses were meaured with TLD(TLD 3500 Hawshaw). Markus chamber in a polystyrene phantom. The phantom was irradiated with 9MeV electron beams from Clinac 2100C with $6{\times}6cm$ electron cone. The relative dose at 6mm depth where the lens is located was $4.2\%$ with TLD and $5.1\%$ with Markus chamber clinically when 2600 cGy are irradiated to the eyeball, the mapinary dose to the lens will be 109 cGy or 132 cGy, which will significently reduce the cataract.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.24 no.3
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• pp.270-277
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• 2015

In this paper, we describe the production of a specific electrostatic-type scanning electron microscope based on miniaturization for application in other types of vacuum equipment. The initial configuration of the SEM starts with a minimal configuration that allows people to view sample images. After improving the stability of the SEM operation and resolution, we conducted experiments on identifying the characteristics and development of an einzel-type condenser lens with reference to the demagnification lens system of an SEM. The experiments were conducted at an acceleration voltage of 5 kV and we found the shape of the lens to be more reliable than a conventional lens. The lens was then added to improve the resolution in the nanometer region. The current measured on the sample was approximately 40 pA and its magnification was 4,000 times.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.35D no.9
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• pp.42-47
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• 1998

We have fabricated electron-optical lens for micro E-beam system that can overcome the limitation of current E-beam lithography. Our electron-optical lens consists of multiple silicon electrodes which were fabricated by micromachining technology and assembled by anodic bonding. The assembled system was installed in UHV chamber to observe the emission characteristics of focused electrons by the electro-optical lens. We used STM(Scanning Tunneling Microscope) tip for electron source. By performing lithography with the focused electrons with PMMA(poly-methylmethacrylate) as E-beam resist. We could draw 0.13${\mu}{\textrm}{m}$ nano-scale lines.

• Korean Journal of Optics and Photonics
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• v.19 no.5
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• pp.365-369
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• 2008

The optimal condition for focusing an electron beam was investigated employing an electrostatic deflector in a low voltage micro-column. At fixed voltage of the electron emission tip, the focusing electron beam with source lens showed a larger scan field size and poorer visibility than those with an Einzel lens. Theoretical 3-D simulation indicated that a focusing electron beam with a source lens should have a larger spot size and deflection than those of a focusing Einzel lens.

• Korean Journal of Optics and Photonics
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• v.14 no.2
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• pp.194-199
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• 2003

The analysis of operation characteristics of a miniaturized electrostatic electron lens system called an Einzel lens was performed using a simulation tool of FCM method. The potential distributions of Einzel lenses operated both in retarding and accelerating modes show similar features. But the electric fields determined from the potential distributions show opposite directions, which results in different features in the electron beam trajectory in each mode of operation. For the same working distance, focusing voltage in the accelerating mode is higher than that in the retarding mode.

• Korean Journal of Optics and Photonics
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• v.16 no.5
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• pp.428-432
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• 2005

Microlens precisely fabricated by MEMS process, is a key component of the Microcolumn, Since, miniaturization can reduces aberrations, microcolumn is expected to have better performance than conventional columns. Depending on the fabrication techniques, the sectional view of micro lens has different shape. In the paper, the effect of the sectional shape of extractor lens and limiting aperture on the focusing property of microcolumns have been studied.