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http://dx.doi.org/10.3807/KJOP.2003.14.2.194

Electro-optical analysis of a miniaturized electrostatic electron lens  

Kim, Ho-Seob (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University)
Kim, Dae-Wook (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University)
Kim, Young-Chul (Dept. of Physics and Advanced Material Science, and Center for Next Generation Semiconductor Technology, Sun Moon University)
Choi, Sang-Kuk (ETRI)
Kim, Dae-Yong (ETRI)
Publication Information
Korean Journal of Optics and Photonics / v.14, no.2, 2003 , pp. 194-199 More about this Journal
Abstract
The analysis of operation characteristics of a miniaturized electrostatic electron lens system called an Einzel lens was performed using a simulation tool of FCM method. The potential distributions of Einzel lenses operated both in retarding and accelerating modes show similar features. But the electric fields determined from the potential distributions show opposite directions, which results in different features in the electron beam trajectory in each mode of operation. For the same working distance, focusing voltage in the accelerating mode is higher than that in the retarding mode.
Keywords
Einzel lens; microcolumn; electron beam; resolution;
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  • Reference
1 E. Kratschmer, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'Sub-40 nm resolution 1 keV scanning tunneling microscope field-emission microcolumn,' J. Vac. Sci. Technol. B vol. 12, no. 6, pp. 3503-3507, 1994   DOI
2 Miroslav Sedlacek, Electron Physics of Vacuum and Gaseous Devices (JOHN WILEY & SONS, INC., New York, USA, 1996), Chapter 4
3 P. W. Hawkers and E. Kasper, Principles of Electron Optics (ACADEMIC PRESS, San Diego, USA, 1989), Vol. 1,2
4 H. S. Kim, M. L. Yu, U. Staufer, L. P. Muray, D. P. Kern, and T. H. P. Chang, 'Oxygen processed field emission tips for microcolurnn applications,' J. Vac. Sci. Technol. B Vol. 11, no. 6, pp. 2327-2331,1993   DOI   ScienceOn
5 M. L. Yu, B. W. Hussey, H. S. Kim, and T. H. P. Chang, 'Emission characteristics of ultrasharp cold field emitters,' J. Vac. Sci. Technol. B vol. 12, no. 6, pp. 3431-3435, 1994   DOI
6 E. Kratschrner, H. S. Kim, M. G. R. Thomson, K. Y. Lee, S. A. Rishton, M. L. Yu, and T. H. P. Chang, 'An electronbeam microcolumn with improved resolution, beam current, and stability,' J. Vac. Sci. Technol. B vol.,13, no. 6, pp. 2498-2503, 1995   DOI
7 D. W. Kim and Y. Kim, 'Point collocation methods using the fast moving least-square reproducing kernel approximation,' Int. J. Numer. Meth. Engng., vol. 56, pp. 1445-1464, 2003   DOI   ScienceOn