• 한국신재생에너지학회:학술대회논문집
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• 2009.11a
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• pp.304-304
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• 2009

In this study, the adsorption behaviors of mercury ions on the electroless Cu-plated activated carbons have been investigated. The amount of copper on activated carbons have been confirmed by atomic absorption spectrophotometer (AAS). The surface properties of the ACs studied have been characterized by using Boehm's titration method and scanning electron microscopy (SEM).Experimental results showed the adsorption capacity of mercury ions was increased as the electroless Cu plating. This was probably due to the introduction of copper on ACs leaded to an increase in the surface basicity.

• Journal of the Korean institute of surface engineering
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• v.47 no.6
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• pp.275-281
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• 2014

An ultrasound-assisted Sn-Ag-Pd activation method for electroless copper plating was presented in this study. With this activation process, it was shown that the fine catalyst particles were homogeneously distributed with high density on the entire specimen. In addition, it was observed that incubation period occurred during the electroless plating step was decreased owing to the absorption of Ag which holds high catalytic activity. Resulting from the refinement and high densification of catalyst, the defect-free gap-fill was achieved within the 20x nm trench.

• Fashion & Textile Research Journal
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• v.10 no.3
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• pp.385-388
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• 2008

Four kinds of PET fabrics were coated with Copper and Nickel by electroless chemical plating, and the electromagnetic wave shielding effectiveness for those samples have been examined. The shielding effectiveness showed between 90 dB and 70 dB, and it related to the fabric structure, such as cover factor and cloth density. The dense fabric structure showed the better shielding effect.

• Journal of the Korean Ceramic Society
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• v.52 no.4
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• pp.264-268
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• 2015

Cu films were plated in an eco-friendly electroless bath (No-Formaldehyde) on Ni/screen printed Ag pattern/PET substrate. For electroless Cu plating, we used sodium-phosphinate ($NaH_2PO_2{\cdot}H_2O$) as reducing agent instead of Formaldehyde. All processes were carried out in electroless solution of pH 7 to minimize damage to the PET substrate. According to the increase of sodium-phosphinate, the deposition rate, the granule size, and rms roughness of the electroless Cu film increased and the Ni content also increased. The electroless Cu films plated using 0.280 M and 0.575 M solutions of sodium-phosphinate were made with Cu of 94 at.% and 82 at.%, respectively, with Ni and a small amount P. All electroless Cu plated films had typical FCC crystal structures, although the amount of co-deposited Ni changed according to the variation of the sodium-phosphinate contents. From these results, we concluded that a formation of higher purity Cu film without surface damage to the PET is possible by use of sodium-phosphinate at pH 7.

• Korean Chemical Engineering Research
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• v.45 no.4
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• pp.384-390
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• 2007

In this study, electroless plating of copper was performed on PET film by using the blend of supercritical $CO_2$ and plating solution. The optimum volumetric ratio of supercritical fluid and plating solution was found to be 1:9 and dispersion property was poor at $CO_2$ vol% langer than 10%. Electroless plating of copper was best at $25^{\circ}C$ and 15 MPa. Role of added supercritical $CO_2$ is not to increase solubility but to disperse and maintain Cu-particles as the 1st particles.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.625-628
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• 1999

Recently. high-density printed circuit boards(PCB) become indispensable with the minaturization of components. Nickel is deposited on the copper patterns and followed by the gold deposition for improving connection reliability between the printed circuit boards and electronic components. Conventionally electrodeposition has been applied to metalization of copper patterns. However metalization by this method is not applicable for the isolated fine and concentrated patterns. Therefore, metalization technology of the fine patterns by electroless plating is required in place of electrodeposition. The application of electroless nickel plating for interconnection with solder strongly relies on the solderability and the interactions between nickel and solder. Factors such as phosphorus content of the deposit additive and bath temperature may influence solderability of the electroless nickel deposit. So solderability of electroless nickel/ gold deposits was investigated with substrates plated changing the condition of nickel solution.

• Transactions of the Korean hydrogen and new energy society
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• v.3 no.2
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• pp.9-15
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• 1992

Electroless copper plating method using an alkaline bath have been employed in copper coating of the (LM)Ni4.5Co0.1MnO.2A10.2 hydrogen storage alloy powders for electrode preparation. The plating were conducted without any pretreatment of alloy powders. For the preparation of the electrodes, about 0.12g of the copper coated alloy powder (copper to alloy ratio 1/3 by weight) was compacted with pressure of 6 tons/cm2 at room temperature. The disk-type compacts had a diameter of 10mm and thickness of about 0.24mm. The electrode characteristics were examined through SEM observations and electrochemical measurements in a half cell. The electrochemical measurement showed that the maximum discharge capacity of the electrodes prepared by using alkaline bath were 245mAh per gram of coated alloy (327mAh per gram of alloy) and appeared a considerable degradation with increasing number of cycles. The decrease of the discharge capacity after 100 cycles was about 30% It can be suggested that, with a slight of improvement, this electroless copper plating method could be applied to the preparation of the rare earth-nickel based alloy electrode.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2013.05a
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• pp.133-134
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• 2013

본 연구는 비전도성 소재 상에 무전해 동도금(Electroless Copper)시 수행되는 씨앗층이나 촉매공정 없이 직접 구리 석출물을 얻는 방법 중 하나에 관한 연구이다. 실리콘 웨이퍼상에 확산방지를 위한 Ta 금속확산방지(Metal barrier)막층 형성 후 무전해 동도금에 침지 후 최소한의 전류를 인가한 결과 균일한 구리피막을 얻을 수 있었으며, 표면 및 단면 조직 분석결과 이를 확인할 수 있었다.

• Journal of the Korean institute of surface engineering
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• v.47 no.4
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• pp.162-167
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• 2014

The primary purpose of this research is to investigate how much the complexing agent in electroless Cu electrolytes will affect adhesion strength between copper film and Ta diffusion barrier for Cu interconnect of semiconductor. The adhesion strength using rochelle's salt as complexing agent was higher than the case of using EDTA-4Na. Effect of complexing agent on adhesion strength and electrical resistivity was studied in crystal structural point of view.

• Journal of the Korean institute of surface engineering
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• v.50 no.4
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• pp.244-250
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• 2017

Effects of plating conditions (dispersant concentration, plating time, and ultrasonication) on electroless Cu plating on SiC fabric woven by crossing of SiC continuous fibers vertically were studied. The ultrasonic dispersion treatment not only did not improve the dispersion of the SiC fibers, but also did not change the plating thickness. The ultrasonication in the pretreatment step of electroless plating did not improve the dispersion of the fibers, while the ultrasonication in the plating step enhanced the dispersion of the fibers and decreased the thickness of the Cu films. It was possible to control the thickness of the Cu coating layer as well as the dispersion of the fibers in the fabric by changing the plating conditions such as dispersant concentration, plating time, and ultrasonication, but it was very difficult to coat copper on the intersection of vertical fibers in the fabric.