• 제목/요약/키워드: Electrical Doping

검색결과 1,088건 처리시간 0.029초

저압 CVD에 의한 $Si_{0.8}Ge_{0.2}$ epitaxial growth에 대한 Phosphorus doping 효과 (Phosphorus doping effect on $Si_{0.8}Ge_{0.2}$ epitaxial growth by LPCVD)

  • 이철진;엄문종;성만영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1997년도 추계학술대회 논문집 학회본부
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    • pp.314-316
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    • 1997
  • We have studied the epitaxial growth and electrical properties of $Si_{0.8}Ge_{0.2}$, films on Si substrates at $550^{\circ}C$ by LPCVD. In a low $PH_3$, partial pressure region such as below 1.25 mPa, the phosphorus doping concentration increased proportionally with increasing $PH_3$ partial pressure while the deposition rate and the Ge fraction x were constant. In a higher $PH_3$ partial pressure region, the phosphorus doping concentration and the deposition rate decreased, while the Ge fraction slightly increased. The dependence of P incorporation rate on the $PH_3$ partial pressure was similar to the phosphorus doping concentration. According to test results, it suggests that high surface coverage of phosphorus atoms suppress both the $SiH_4$ adsorption/reaction and the $GeH_4$ adsorption/reaction on the surfaces, and the effect is more stronger on $SiH_4$ than on $GeH_4$. In a higher $PH_3$ partial pressure region, the deposition is largely controlled by surface coverage effect of phosphorus atoms.

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Doping Effect of Yb2O3 on Varistor Properties of ZnO-V2O5-MnO2-Nb2O5 Ceramic Semiconductors

  • Nahm, Choon-Woo
    • 한국재료학회지
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    • 제29권10호
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    • pp.586-591
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    • 2019
  • This study describes the doping effect of $Yb_2O_3$ on microstructure, electrical and dielectric properties of $ZnO-V_2O_5-MnO_2-Nb_2O_5$ (ZVMN) ceramic semiconductors sintered at a temperature as low as $900^{\circ}C$. As the doping content of $Yb_2O_3$ increases, the ceramic density slightly increases from 5.50 to $5.54g/cm^3$; also, the average ZnO grain size is in the range of $5.3-5.6{\mu}m$. The switching voltage increases from 4,874 to 5,494 V/cm when the doping content of $Yb_2O_3$ is less than 0.1 mol%, whereas further doping decreases this value. The ZVMN ceramic semiconductors doped with 0.1 mol% $Yb_2O_3$ reveal an excellent nonohmic coefficient as high as 70. The donor density of ZnO gain increases in the range of $2.46-7.41{\times}10^{17}cm^{-3}$ with increasing doping content of $Yb_2O_3$ and the potential barrier height and surface state density at the grain boundaries exhibits a maximum value (1.25 eV) at 0.1 mol%. The dielectric constant (at 1 kHz) decreases from 592.7 to 501.4 until the doping content of $Yb_2O_3$ reaches 0.1 mol%, whereas further doping increases it. The value of $tan{\delta}$ increases from 0.209 to 0.268 with the doping content of $Yb_2O_3$.

Effect of Sm2O3 Doping on Microstructure and Electrical Properties of ZPCCA-Based Varistors

  • Nahm, Choon-Woo
    • 한국재료학회지
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    • 제31권10호
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    • pp.539-545
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    • 2021
  • The effect of Sm2O3 doping on the microstructure and electrical properties of the ZPCCA-based varistors is comprehensively investigated. The increase of doping content of Sm2O3 results in better densification (from 5.70 to 5.82 g/cm3) and smaller mean grain size (from 7.8 to 4.1 ㎛). The breakdown electric field increases significantly from 2568 to 6800 V/cm as the doping content of Sm2O3 increases. The doping of Sm2O3 remarkably improves the nonlinear properties (increasing from 23.9 to 91 in the nonlinear coefficient and decreasing from 35.2 to 0.2 µA/cm2 in the leakage current density). Meanwhile, the doping of Sm2O3 reduces the donor concentration (the range of 2.73 × 1018 to 1.18 × 1018 cm-3) of bulk grain and increases the barrier height (the range of 1.10 to 1.49 eV) at the grain boundary. The density of the interface states decreases in the range of of 5.31 × 1012 to 4.08 × 1012 cm-2 with the increase of doping content of Sm2O3. The dielectric constant decreases from 1594.8 to 507.5 with the increase of doping content of Sm2O3.

Control of Short-Channel Effects in Nano DG MOSFET Using Gaussian-Channel Doping Profile

  • Charmi, Morteza
    • Transactions on Electrical and Electronic Materials
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    • 제17권5호
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    • pp.270-274
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    • 2016
  • This article investigates the use of the Gaussian-channel doping profile for the control of the short-channel effects in the double-gate MOSFET whereby a two-dimensional (2D) quantum simulation was used. The simulations were completed through a self-consistent solving of the 2D Poisson equation and the Schrodinger equation within the non-equilibrium Green’s function (NEGF) formalism. The impacts of the p-type-channel Gaussian-doping profile parameters such as the peak doping concentration and the straggle parameter were studied in terms of the drain current, on-current, off-current, sub-threshold swing (SS), and drain-induced barrier lowering (DIBL). The simulation results show that the short-channel effects were improved in correspondence with incremental changes of the straggle parameter and the peak doping concentration.

SOD(Spin On Doping)법을 이용한 저가 고효율 태양전지에 관한 연구 (A Study of low cost and high efficiency Solar Cell using SOD(spin on doping))

  • 박성현;김경해;문상일;김대원;이준신
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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    • pp.1054-1056
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    • 2002
  • High temperature Kermal diffusion from $POCl_3$ source usually used for conventional process through put of a cell manufacturing line and potentially reduce cell efficiency through bulk like time degradation. To fabricate high efficiency solar cells with minimal thermal processing, spin-on-doping(SOD) technique can be employed to emitter diffusion of a silicon solar cell. A technique is presented to emitter doping of a mono-crystalline solar cell using spin-on doping (SOD). Moreover it is shown that the sheet resistance variation with RTA temperature and time fer mono-crystalline and multi-crystalline silicon samples. This novel SOD technique was successfully used to produces 11.3% efficiency l04mm by 104mm size mono-crystalline silicon solar cells.

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온도, 가스량 및 도핑시간변화에 따른 $POCI_3$ 도핑 공정의 최적화 (Optimization of the $POCI_3$ doping process according to the variation of deposition temperature, gas flow rate and doping time)

  • 정경화;강정진
    • E2M - 전기 전자와 첨단 소재
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    • 제7권3호
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    • pp.206-212
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    • 1994
  • In this paper, We discuss the $POCI_3$ doping process according to the variation of deposition temperature, gas flow rate and doping time. The factors acted with $POCI_3$ doping are gas flow rate deposition temperature and time etc. Among them the temperature is the most important factor. For the $POCI_3$ flow rate, it should not exceed the resistivity saturation point developed on poly surface by annealing treatment. Therefore, this study suggests the optimum conditions of Poly-silicon treatments with the $POCI_3$ flow rate.

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Bi-Sr-Ca-Cu-O 계에 서 초전도상 형성에 미치는 도우핑 원소의 영향 (Influence of Doping Elements on the. Formation of Superconducting Phase in the Bi-Sr-Ca-Cu-O System)

  • 양승호;정지인;박용필
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 추계학술대회 논문집
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    • pp.217-220
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    • 1999
  • We investigated the effects of doping elements on the Bi-Sr-Ca-Cu-0 ceramics. The doping elements can be classified into groups depending on their supeconducting characteristics in the Bi -Sr-Ca-Cu -O structure. The first group of doping elements(Co, Fe, Ni and Zn) substitute into the copper site and can reduce the critical temperatures of the 2223 and 2212 phases. The second group of doping elements(Y and La) substitute into the Ca site and cause the disappearance of the 2223 phase and increase the critical temperatures in the 2212 phase.

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Pb($Zr_{0.52}Ti_{0.48}$)$O_3$의 전기전도도에 미치는 MgO의 첨가영향 (Effect of MgO Addition on the Electrical Conductivity of Pb($Zr_{0.52}Ti_{0.48}$)$O_3$)

  • 전석택;최경만
    • 한국세라믹학회지
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    • 제28권12호
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    • pp.953-960
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    • 1991
  • Effect of MgO doping was studied by measuring complex impedance of PZT[Pb(Zr0.52Ti0.48)O3] samples doped with 0.25~6 mol% MgO. Electrical conductivity of PZT samples increased within 1.5 mol% of MgO doping. However above 1.5 mol%, no noticeable changes were found. Activation energy and pre-exponential factor of electrical conductivity were found to decrease within 1.5 mol% of MgO doping, but increase above 1.5 mol%. Therefore it was concluded that the decrease of electrical conductivity with MgO doping was due to the decrease of activation energy.

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Analyze the channel doping concentration characteristics of junctionless nanowire transistors by using Edison simulation

  • Choi, Jun Hee;Lee, Byung Chul;Kim, Jung Do
    • EDISON SW 활용 경진대회 논문집
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    • 제2회(2013년)
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    • pp.266-268
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    • 2013
  • In this paper, we study the channel doping concentration characteristics of junctionless nanowire transistors (JLT) using Edison nanowire FET device simulation. JLT has no junctions by very simple fabrication process. And this device has less variability and better electrical properties than classical inversion-mode transistors with PN junctions at the source and drain. In this simulation we use tri-gate structure. Source and drain doping concentration is $10^{20}atoms/cm^3$. The simulation results show that I-V characteristics of JLT change due to the variation of channel doping concentration.

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