• Journal of Korean Society of Industrial and Systems Engineering
• /
• v.24 no.67
• /
• pp.27-36
• /
• 2001

A standard assumption when using a control chart to monitor a process is that the observations from the process output are statistically independent. However, for many processes the observations are autocorrelated and this autocorrelation can have a significant effect on the performance of the control chart. In this paper, we consider combined control chart of monitoring the mean of a process in which the observations can be modeled as a first-order autoregressive process. The Shewhart control chart of residuals-EWMA control chart of the observations is considered and the method of combination is recommended. The performance of the proposed control chart is compared with the performance of other control charts using a simulation.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2004.10a
• /
• pp.92-96
• /
• 2004

In this paper, polishing method using bonded magnetic abrasive particle has been applied to the micro mold polishing. Through process control using the Run-to-Run control, it tried to form the surface roughness In order to grasp the influence of the surface roughness which is reached by selection of control factor and the factor, a design of experiment was been processed. The study is processed with a purpose of to embody and to maintain the surface roughness of nano scale by the basis of an influence between a control factor and the factors which has been selected in this way. As a result, the result of the process control converged at a target value of surface roughness Ra 10nm and Rmax 50nm

• Journal of the Korean Data and Information Science Society
• /
• v.28 no.4
• /
• pp.937-945
• /
• 2017

The purpose of using a control chart is to detect any change that occurs in the process. When control charts are used to monitor processes, we want to identify this changes as quickly as possible. Many problems in quality control involve a vector of observations of several characteristics rather than a single characteristic. Multivariate CUSUM or EWMA charts have been developed to address the problem of monitoring covariance matrix or the joint monitoring of mean vector and covariance matrix. However, control charts tend to work poorly when we use the highly correlatted variables. In order to overcome it, Hawkins (1991) proposed the use of regression adjustment variables. In this paper, to monitor covariance matrix, we investigate the performance of MEWMA-type control charts with and without the use of regression adjusted variables.

• Journal of the Korean Data and Information Science Society
• /
• v.14 no.2
• /
• pp.289-301
• /
• 2003

In this paper, we propose Shewhart control chart and EWMA control chart using the autocorrelated data which are common in chemical and process industries and lead to increase the number of false alarms when conventional control charts are applied. The effect of autocorrelated data is modeled as a autoregressive process, and canonical analysis is used to reduce the dimensionality of the data set and find the canonical variables that explain as much of the data variation as possible. Charting statistics are constructed based on the residual vectors from the canonical variables which are uncorrelated over time, and the control charts for these statistics can attenuate the autocorrelation in the process data. The charting procedures are illustrated with a numerical example and simulation is conducted to investigate the performances of the proposed control charts.

• Journal of the Korea Safety Management & Science
• /
• v.13 no.4
• /
• pp.225-235
• /
• 2011

Autoregressed Controller, which have trend algorithm, seeks to minimize variability by transferring the output variable to the related process input variable, while multivariate process control techniques seek to reduce variability by detecting and eliminating assignable causes of variation. In the case of process control, a very reasonable objective is to try to minimize the variance of the output deviations from the target or set point. We also investigate algorithm with relevant Shewhart chart, Theoretical control charts, precontrol and process capability. To help the people who want to make the theoretical system, we compare the main techniques in "a study on the relation between multivariate process control techniques and trend algorithms".

• Journal of the Korea Safety Management & Science
• /
• v.7 no.5
• /
• pp.255-273
• /
• 2005

Overlay parameter control of the semiconductor photolithography process is researched in this paper. Overlay parameters denote the error in superposing the current pattern to the pattern previously created. The reduction of the overlay deviation is one of the key factors in improving the quality of the semiconductor products. The semiconductor process is affected by numerous environment and equipment factors. Through process condition prediction and control, the overlay inaccuracy can be reduced. Generally, three types of process condition change exist; uncontrollable white noise, slowly changing drift, and abrupt condition shift. To effectively control the aforementioned process changes, control scheme using adaptive deadband is proposed. The suggested approach and existing control method are cross evaluated through simulation.

• Proceedings of the Korean Society for Quality Management Conference
• /
• 2004.04a
• /
• pp.436-441
• /
• 2004

Knowing the time of the process change could lead to quicker identification of the responsible special cause and less process down time, and it could help to reduce the probability of incorrectly identifying the special cause. In this paper, we propose a generalized maximum likelihood estimate. (MLE) of the process change point when a control chart with variable sample size (VSS) scheme signals a change in the process mean, and evaluate the performance of this estimator when it mi used with a VSS EWMA chart.

• Journal of Korean Society of Industrial and Systems Engineering
• /
• v.18 no.34
• /
• pp.107-114
• /
• 1995

The objective of this study is to design a one-stage dynamic prediction model with Kalman state space model. For a model verification, it is compared with EWMA(Exponentially Weighed Moving Average) model. The model designed in this research can be extended to process prevention control and quality monitoring.

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 1992.10a
• /
• pp.47-51
• /
• 1992

Automatic detection of tool breakage during NC machining is a key issue not only for improving productivity but to implement the unattended manufacturing system. In this paper, we develop a vibration sensor-based tool breakage detection system for NC milling processes. The system obtains the time-domain vibration signal from the sensor attached on the spindle bracket of our CNC machine and declares tool failures through the on-line monitoring schemes. For on-line detection, our approach is to use the PSC(statistical process control) methods being increasingly used for on-line process control. The main thrust of this paper is to propose and compare the performance of SPC methods including : a) X-bar control scheme, b) S control scheme, c)EWMA (exponentially weighted moving average) scheme, and d) AEWMA (adaptive exponentially weighted moving average) scheme. The performance of the control schemes are compared in terms of the type 1 and 2 error calculated from the experiment data.

• Journal of Korean Society of Industrial and Systems Engineering
• /
• v.23 no.56
• /
• pp.83-92
• /
• 2000

This paper presents a study on control schemes for gradual increases (drifts) in a process variance. A new control chart, the Drifting Variance Control Chart (DVCC) is designed using Likelihood Ratio Test (LRT), and the ARL performance of the chart is evaluated for different subgroup sizes. The performance of this chart is then compared to some of the popular control schemes for the process dispersion, like the Shewhart S$^2$chart, the CUSUM chart and the EWMA chart. Results are presented and discussed. Also included is a sensitivity analysis that investigates how the DVCC performs when applied to a stepped change in process variance.