Run-to-Run Process Control and the Analysis of Process Parameters using Design of Experiment in Surface Finishing

실험계획법에 의한 파라미터 분석과 Run to Run 제어를 이용한 폴리싱 공정 제어

  • 안병운 (서울산업대 대학원 기계공학과) ;
  • 박성준 (연세대학교 나노과학기술연구단) ;
  • 이상조 (연세대학교 기계공학부) ;
  • 윤종학 (서울산업대 기계공학과)
  • Published : 2004.10.01

Abstract

In this paper, polishing method using bonded magnetic abrasive particle has been applied to the micro mold polishing. Through process control using the Run-to-Run control, it tried to form the surface roughness In order to grasp the influence of the surface roughness which is reached by selection of control factor and the factor, a design of experiment was been processed. The study is processed with a purpose of to embody and to maintain the surface roughness of nano scale by the basis of an influence between a control factor and the factors which has been selected in this way. As a result, the result of the process control converged at a target value of surface roughness Ra 10nm and Rmax 50nm

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