• Title/Summary/Keyword: E-beam Process

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Comparison between BSCCO Thin Films Fabricated by Co-Deposition and Layer-by-Layer Deposition

  • Lee, Hee-Kab;Park, Yong-Pil;Lee, Joon-Ung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2000.07a
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    • pp.230-234
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    • 2000
  • Bi$_2$Sr$_2$Ca$_{n}$Cu$_{n+1}$ O$_{y}$(n$\geq$0; BSCCO)thin film is fabricated via two different processes using an ion beam sputtering method i.e. co-deposition and layer-by-layer deposition. A single phase of Bi2212 can be fabricated via the co-deposition process. While it cannot be obtained by the layer-by-layer process. Ultra-law growth rate in our ion beam sputtering system brings out the difference in Bi element adsorption between the two processes and results in only 30% adsorption against total incident Bi amount by layer-by-layer deposition, in contrast to enough Bi adsorption by co-deposition.on.n.

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Using Electron-beam Resists as Ion Milling Mask for Fabrication of Spin Transfer Devices

  • Nguyen Hoang Yen Thi;Yi, Hyun-Jung;Shin, Kyung-Ho
    • Journal of Magnetics
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    • v.12 no.1
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    • pp.12-16
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    • 2007
  • Magnetic excitation and reversal by a spin polarized current via spin transfer have been a central research topic in spintronics due to its application potential. Special techniques are required to fabricate nano-scale magnetic layers in which the effect can be observed and studied. This work discusses the possibility of using electron-beam resists, the nano-scale patterning media, as ion milling mask in a subtractive fabrication method. The possibility is demonstrated by two resists, one positive tone, the ZEP 520A, and one negative tone, the ma-N2403. The advantage and the key points for success of this process will be also addressed.

Study on the Residual Stress and Fatigue Strength of Welded Joint by High Energy Density Welding -Fatigue Scrength of Welded Joint of HT80 Steel by Electron Beam Welding- (고(高) Energy밀도용접(密度熔接)에 의(依)한 용접(熔接)이음에 있어서의 잔류응력(殘留應力)과 피로특성(疲勞特性)에 관(關)한 연구(硏究) -HT80강(鋼)의 전자(電子) Beam 용접(熔接)이음 피로강도(疲勞强度)-)

  • J.E.,Park
    • Bulletin of the Society of Naval Architects of Korea
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    • v.20 no.2
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    • pp.51-59
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    • 1983
  • The versatile practical use of electron beam welding which is very high energy density is still in early stage, but in the special welding field, the welding process is used in manufactured goods. The investigation for electron beam welding up to the present was almost achieved not for the mechanical properties of welded joint but for the process itself. On this investigation, the fatigue strength, crack propergation phenomena and hardness of weld metal and heat affected zone of partially penetrated welded joint of HT80 steel by electron beam welding was accomplished. The tensile fatigue strength in weld line direction of the joint was about $25kg/mm^2$. There still appeared spikes on the tips of penetration, and the crack initiated at the tips of spikes not from the roots. The hardness of the weld metal was higher than it of base metal because of production of martensite by rapid cooling.

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Polarization-dependence of liquid crystal alignment on an organic surface with ion beam irradiation

  • Choi, Dae-Sub;Han, Jeong-Min
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.208-208
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    • 2009
  • We used Brewster's Law to examine the mechanism of liquid crystal (LC) alignment on an organic insulation layer when subjected to ion-beam irradiation. Brewster's Law implies that the maximum rate polarized ray on a slanted insulation layers on the substrate and it illustrates the dependence of polarization and themechanical structure on the ion beam irradiation process. The pretilt angle of nematic LCs on the organic insulation surface was about $1.13^{\circ}$ for an ion beam exposure of $45^{\circ}$ for 1 minute at 1800eV. This shows the dependence of LC alignment on the polarization ratio in a slanted organic insulation layer.

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Hot Stamping Simulations and Experiments for CTBA Tubular Beams (CTBA Tubular Beam의 열간 성형해석 및 실험)

  • Suh, C.H.;Kim, W.S.;Sung, J.H.;Park, J.K.;Kim, Y.S.;Kim, Y.S.
    • Transactions of Materials Processing
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    • v.24 no.1
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    • pp.13-19
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    • 2015
  • For an accurate analysis of hot stamping, a coupled simulation with different aspects of the process(i.e. mechanical, thermal, and phase transformation) is needed. However, coupled simulations are time consuming and costly. Therefore, the current study proposes a simplified method focused on the forming for the hot stamping simulation of a coupled torsion beam axle (CTBA) tubular beam. In this simplified method, non-isothermal conditions were assumed and only conduction was considered, since it represents the majority of the heat transfer during hot stamping. In addition, temperature and strain rate effects were also included. Moreover, an isothermal simulation was conducted and compared with a non-isothermal simulation. Finally, the simulations were verified by experiments. In conclusion, the proposed method is shown to be effective for the development of tube-type parts, and it effectively predicts the deformation of the tubular beam during hot stamping.

Assessment of Microbial and Radioactive Contaminations in Korean Cold Duck Meats and Electron-Beam Application for Quality Improvement

  • An, Kyung-A;Jo, Yunhee;Arshad, Muhammad Sajid;Kim, Gui-Ran;Jo, Cheorun;Kwon, Joong-Ho
    • Food Science of Animal Resources
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    • v.37 no.2
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    • pp.297-304
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    • 2017
  • Animal-origin food products pose serious threat to public food safety due to high microbial loads. The microbial and radioactive contaminations in commercial cold duck meat products were evaluated. Ten different lots of commercial samples ($C_1-C_{10}$) were classified based on type and smoking process. All samples were highly contaminated (< 4-7 Log CFU/g) with total aerobic bacteria (TAB), yeasts and molds (Y&M), and 7 samples ($C_1-C_7$) were positive for coliforms. Furthermore, three samples were contaminated with Listeria monocytogenes ($C_4-C_6$) and one with Salmonella typhimurium ($C_6$). No radionuclides ($^{131}I$, $^{137}Cs$, and $^{134}Cs$) were detected in any sample. The results of DEFT (direct epifluorescent filter technique)/APC (aerobic plate count), employed to screen pre-pasteurization treatments of products, indicated that smoked samples were positive showing DEFT/APC ratios higher than 4. Notably, the samples showed a serious threat to microbial safety, thus were irradiated with electron-beam (e-beam). The $D_{10}$ values for S. typhimurium and L. monocytogenes were 0.65 and 0.42 kGy, respectively. E-beam application at 3 and 7 kGy resulted in reduction of initial TAB, Y&M, and coliform populations by 3 and 6 log cycles, respectively. Thus, e-beam was proven to be a good decontamination approach to improve the hygiene of cold duck meat.

Fabrication technology of the focusing grating coupler using single-step electron beam lithography (Single-step 전자빔 묘화 장치를 이용한 Focusing Grating Coupler 제작 연구)

  • Kim, Tae-Youb;Kim, Yark-Yeon;Sohn, Yeung-Joon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07b
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    • pp.976-979
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

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Fabrication Technology of the Focusing Grating Coupler using Single-step Electron Beam Lithography

  • Kim, Tae-Youb;Kim, Yark-Yeon;Han, Gee-Pyeong;Paek, Mun-Cheol;Kim, Hae-Sung;Lim, Byeong-Ok;Kim, Sung-Chan;Shin, Dong-Hoon;Rhee, Jin-Koo
    • Transactions on Electrical and Electronic Materials
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    • v.3 no.1
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    • pp.30-37
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    • 2002
  • A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control'writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm). To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and 0.5 $\times$ 0.5 mm$^2$area, respectively. This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

A Study on the MgO Protective Layer Deposited by Oxygen-Neutral-Beam-Assisted Deposition in AC PDP (산소 중성빔으로 보조증착된 MgO 보호막을 갖는 AC PDP의 특성에 관한 연구)

  • Li, Zhao-Hui;Kwon, Sang-Jik
    • Journal of the Korean Vacuum Society
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    • v.17 no.2
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    • pp.96-101
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    • 2008
  • The magnesium oxide (MgO) protective layer plays an important role in plasma display panels (PDPs). Our previous work demonstrated that the properties of MgO thin film could be improved, which were deposited by Ion-Beam-Assisted Deposition (IBAD). However arc discharge always occurs during the IBAD process. To avoid this problem, Oxygen-Neutral-Beam-Assisted Deposition (NBAD) is used to deposit MgO thin films in this paper. The energy of the oxygen neutral beam was used as the parameter to control the deposition. The experimental results showed that the oxygen neutral beam energy was effective in determining in structural and discharge characteristics. The lowest firing inception voltage, the highest brightness and the highest luminous efficiency were obtained when the MgO thin film was deposited with an oxygen neutral beam energy of 300eV. The surface morphology of MgO thin film was also analyzed using AFM (Atomic Force Microscopy) and SEM (Scanning Electron Microscopy).

Influence of Electron Beam Irradiation on the Structural, Optical, and Electrical Properties of ZTO/Ag/ZTO Trilayer Films

  • Eom, Tae-Young;Song, Young-Hwan;Gong, Tae-Kyung;Kim, Daeil;Cheon, Joo-Yong;Cha, Byung-Chul
    • Transactions on Electrical and Electronic Materials
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    • v.18 no.4
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    • pp.217-220
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    • 2017
  • We deposited transparent conductive ZTO/Ag/ZTO trilayer thin films on glass substrates through magnetron sputtering, and then conducted intense electron beam irradiation on their surfaces to investigate the effects of electron irradiation on the structural, optical, and electrical properties of these films. After deposition, we electron irradiated the ZTO/Ag/ZTO films for 10 min at electron energies of 300, 500, and 700 eV. The films that were electron irradiated at 700 eV showed a higher optical transmittance (84.2%) in the visible wavelength region and a lower resistivity ($7.2{\times}10^{-5}{\Omega}cm$) compared with the other films. The figure of merit revealed that the ZTO/Ag/ZTO films that were electron irradiated at 700 eV had a higher optical and electrical performance than the other films prepared in this study.