• Title/Summary/Keyword: Dry film thickness

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Influence of $TiO_2$ Thin Film Thickness and Humidity on Toluene Adsorption and Desorption Behavior of Nanoporous $TiO_2/SiO_2$ Prepared by Atomic Layer Deposition (ALD)

  • Sim, Chae-Won;Seo, Hyun-Ook;Kim, Kwang-Dae;Park, Eun-Ji;Kim, Young-Dok;Lim, Dong-Chan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.268-268
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    • 2012
  • Adsorption and desorption of toluene from bare and $TiO_2$-coated silica with a mean pore size of 15 nm was studied using breakthrough curves and temperature programmed desorption. Thicknesses of $TiO_2$ films prepared by atomic layer deposition on silica were < 2 nm, and ~ 5 nm, respectively. For toluene adsorption, both dry and humid conditions were used. $TiO_2$-thin film significantly improved toluene adsorption capacity of silica under dry condition, whereas desorption of toluene from the surface as a consequence of displacement by water vapor was more pronounced for $TiO_2$-coated samples with respect to the result of bare ones. In the TPD experiments, silica with a thinner $TiO_2$ film (thickness < 2 nm) showed the highest reactivity for toluene oxidation to $CO_2$ in the absence and presence of water. We show that the toluene adsorption and oxidation reactivity of silica can be controlled by varying thickness of $TiO_2$ thin films.

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Thermal and Humidity Sensing Properties of Heat Resistant Polyimide Thin Film Manufactured by Dry Process (건식법에 의해 제조된 내열성 폴리이미드박막의 열적특성 및 습도감지특성)

  • Lim, Kyung-Bum;Kim, Ki-Hwan;Hwang, Sun-Yang;Kim, Jong-Yoon;Hwang, Myung-Hwan
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.6
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    • pp.1080-1086
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    • 2007
  • The aim of this paper is to establish the optimum fabrication condition of specimens, using the Vapor Deposition Polymerization Method(VDPM), which is one of modesto prepare functional organic thin films using a dry process, and to develop a thin film type humidity sensor which has good humidity sensitive characteristics. The inner part of the film became denser and roughness of the film surface eased as curing temperature increased so that thickness of the film could be made uniform. This also shows the appropriate curing temperature was $250^{\circ}C$. The basic structure of the humidity sensor is a parallel capacitor which consists of three layers of Aluminum/Polyimide/Aluminum. The result of SEM and AFM measurement shows that the thickness of PI thin films decreased and the refraction increased as curing temperature increased, which indicates that a capacitance-type humidity sensor utilizing polyimide thin film is fabricated on a glass substrate. The characteristics of fabricated samples were measured under various conditions, and the samples had linear characteristics in the range of 20-80 %RH, independent of temperature change, and low hysteresis characteristic.

Evaluation of Characteristics of Oxidized Thin LPCVD-$Si_{3}N_{4}$ Film (얇은 열산화-질화막의 특성평가)

  • 구경완;조성길;홍봉식
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.29-35
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    • 1992
  • Dielectric thin film of N/O (Si$_{3}N_[4}/SIO_{2}$) for high density stacked dynamic-RAM cell was formed by LPCVD and oxidation(Dry & pyrogenic oxidation methods) of the top Si$_{3}N_[4}$ film. The thickness, structure and composition of this film were measured by ellipsometer, high frequency C-V meter, high resolution TEM, AES, and SIMS. The thickness limit of Si$_{3}N_[4}$ film in making thin N/O structure layer was 7nm. In this experiment, the film with thinner than 7nm was not thick enough as oxygen diffusion barrier, and oxygen punched through the film and interfacial oxidation occurred at the phase boundary between Si$_{3}N_[4}$ and polycrystalline silicon electrode.

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Analysis on the Drying Characteristics for the Drying Process of a Thin Film Layer of Sludge (슬러지 박막의 건조과정에 대한 건조 특성 해석)

  • Lee, Kong-Hoon;Kim, Ook-Joong
    • Proceedings of the SAREK Conference
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    • 2008.06a
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    • pp.1128-1133
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    • 2008
  • Drying process in the thin film layer of sludge with the thickness less than a few millimeters has been investigated using the simple one-dimensional model. Thin film drying is usually used to dry the viscous materials like sewage sludge. The thin film layer of sludge is dried on the metallic surface through which thermal energy is supplied to the layer during drying. In order to solve the equations, the mass transfer rate on the drying surface should be determined. The mass flux of evaporated water vapor on the surface is estimated with the formulation given in the literature. The effect of heating temperature, film thickness, and air velocity on drying has been examined to figure out the drying characteristics of the sludge layer.

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Effect of Intense Regulated Pulse Light on Thickness of Tear Film Lipid Layer and Dry Eye Syndrome (조절펄스광선조사가 눈물막 지질층 두께 및 안구건조증에 미치는 효과)

  • Gil, Tae Young;Bae, Gi Hyun;Kwag, Joo Young;Hyun, Joo;Choi, Jin Seok;Pak, Kyu Hong;Chung, Sung Kun
    • Journal of The Korean Ophthalmological Society
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    • v.59 no.12
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    • pp.1103-1107
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    • 2018
  • Purpose: To evaluate the clinical effect of intense regulated pulse light (IRPL) and changes in tear film thickness in dry eye patients. Methods: A retrospective study was conducted on 25 patients with Meibomian gland dysfunction who had subjective dry eye discomfort and whose tear film break-up time (TBUT) was < 10 seconds. All patients were treated with IRPL three times on days 1, 15, and 45. TBUT, Schirmer 1 test results, cornea staining score with fluorescein, ocular surface disease index (OSDI), and lipid layer thickness were measured and compared before and after the procedure. Results: TBUT was significantly increased from $3.7{\pm}1.2s$ to $4.4{\pm}2.1s$ after IRPL (p = 0.03). Schirmer 1 test and cornea staining scores changed significantly (p < 0.01 and p = 0.01, respectively). OSDI also showed a statistically significant improvement from $39.5{\pm}17.5points$ to $30.4{\pm}18.7points$ (p = 0.01). However, no significant difference in lipid layer thickness was observed (p = 0.49). Conclusions: IRPL is an effective treatment modality to improve TBUT, Schirmer 1 test scores, cornea staining scores, and subjective dry eye symptoms.

A Study on the curing characteristics of 6FDA/4-4' DDE Polyimide thin film fabricated by vapor deposition polymerization (진공증착중합에 의해 제조된 6FDA/4-4' DDE 폴리이미드 박막의 열처리 특성에 관한 연구)

  • Hwang, S.Y.;Lee, B.J.;Kim, H.G.;Kim, J.T.;Kim, Y.B.;Park, K.S.;Lee, D.C.
    • Proceedings of the KIEE Conference
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    • 1998.11c
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    • pp.816-818
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    • 1998
  • In this paper Polyimide(PI) thin film are fabricated by vapor deposition polymerization(VDP) of dry process which are easy to control the film's thickness and hard to pollute due to volatile solvent. The FT-IR spectrum show that PAA thin films fabricated by VDP are changed to PI thin film by thermal curing. From AFM(Atomic Force Microscopy) experimental as the higher curing temperature. the thin film thickness decreases and roughness decresse.

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Numerical Analysis of Damping Effect of Liquid Film on Material in High Speed Liquid Droplet Impingement

  • Sasaki, Hirotoshi;Ochiai, Naoya;Iga, Yuka
    • International Journal of Fluid Machinery and Systems
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    • v.9 no.1
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    • pp.57-65
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    • 2016
  • By high speed Liquid Droplet Impingement (LDI) on material, fluid systems are seriously damaged, therefore, it is important for the solution of the erosion problem of fluid systems to consider the effect of material in LDI. In this study, by using an in-house fluid/material two-way coupled method which considers reflection and transmission of pressure, stress and velocity on the fluid/material interface, high-speed LDI on wet/dry material surface is simulated. As a result, in the case of LDI on wet surface, maximum equivalent stress are less than those of dry surface due to damping effect of liquid film. Empirical formula of the damping effect function is formulated with the fluid factors of LDI, which are impingement velocity, droplet diameter and thickness of liquid film on material surface.

Controlled Release of Econazole Nitrate from Skin Adhesive Methyl Methacrylate-Butyl Methacrylate Copolymer-Povidone Films (피부 부착성 메칠메타크릴레이트-부틸메타크릴레이트 공중합체-포비돈 필름으로부터의 질산에코나졸의 제어 방출)

  • Chun, In-Koo;Lee, Ji-Eun
    • Journal of Pharmaceutical Investigation
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    • v.19 no.3
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    • pp.145-154
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    • 1989
  • Methyl methacrylate-butyl methacrylate copolymer (MMBM)-povidone (PVP) films were investigated as a potential topical drug delivery system for the controlled release of econazole nitrate as a model drug. The effect of changes in film composition, drug concentration, film thickness, pH and temperature of release medium on the in vitro release of econazole nitrate were studied. The release rate constant was found to be increased with increasing povidone content in dry films. Drug release followed zero-order kinetics in the initial stage and then release rate increased gradually with time, espicially in the films having larger proportions of PVP. The release rate was found to be dependent on drug content, film thickness, the pH and temperature of release medium. Antimicrobial test showed that microbial growth was inhibited markedly with increasing proportions of PVP in films. Also drug content and film thickness affected the antimicrobial activity.

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Reliability of N/O($SiO_2$/$Si_3$$N_4$) Films According to Top Oxidation Condition (상부산화 조건에 따른 N/O($SiO_2$/$Si_3$$N_4$) 구조막의 신뢰성 평가)

  • 구경완;홍봉식
    • Journal of the Korean Institute of Telematics and Electronics A
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    • v.29A no.9
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    • pp.20-28
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    • 1992
  • Dielectric thin film of N/O ($Si_{3]N_{4}/SiO_{2}$) for high density stacked dynamic-RAM cell was formed by LPCVD and oxidation(dry & pyrogenic oxidation methods) of the top 7nm $Si_{3]N_{4}$ film. The thickness, structure and composition of this film were measured by ellipsometer, high resolution TEM, AES and SIMS. The insulating characteristics(I-V characteristics) were investigated by HP 4145, and the characteristics of TDDB (Time Dependent Dielectric Breakdown) were evaluated by using CCST(Current Constant Stress Time) method. In this experiment, The optimum oxidation condition for preparation of good insulating and TDDB characteristics of N/O film was pyrogenic oxidation at 85$0^{\circ}C$ for 30 minutes. The leakage current was reduced from 400pA to 7.5pA when SiO$_{2}$ film with thickness of 2nm was formed on the top of $Si_{3]N_{4}$ film by the pyrogenic oxidation method.

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Technology of thin Film Formation by Using the Micro Gravure Coater (마이크로 그라비어 코터를 이용한 박막 형성 기술)

  • Kim, Dong Soo;Kim, Jung Su;Bae, Sung Woo
    • Journal of the Korean Society for Precision Engineering
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    • v.30 no.6
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    • pp.596-600
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    • 2013
  • We report here on the processing and manufacturing of thin film for printed electronics by micro-gravure coating system. The micro-gravure coating systems are consisted of various modules such as web and system tension controller, micro-gravure coating units, dispenser and hybrid dry units (UV, NIR, Hot air). Especially, for the optimization of system, the number of idle roller was minimized and tension isolating infeeder was included. Also, we applied four patterns circle, 45 degree, square and 35 degree for the optimizing coating thickness. The micro-gravure coating system which applied various patterns to enable continuous coating process and fast coating time compare with conventional batch coating system. In this paper, introduce of micro-gravure coating system and testing results of coating thickness (20~700nm), coating time (1~2sec) and surface roughness (3~12nm) by using micro-gravure coating system.