Proceedings of the Korean Vacuum Society Conference (한국진공학회:학술대회논문집)
- 2012.02a
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- Pages.268-268
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- 2012
Influence of $TiO_2$ Thin Film Thickness and Humidity on Toluene Adsorption and Desorption Behavior of Nanoporous $TiO_2/SiO_2$ Prepared by Atomic Layer Deposition (ALD)
- Sim, Chae-Won (Department of Chemistry, Sungkyunkwan University) ;
- Seo, Hyun-Ook (Department of Chemistry, Sungkyunkwan University) ;
- Kim, Kwang-Dae (Department of Chemistry, Sungkyunkwan University) ;
- Park, Eun-Ji (Department of Chemistry, Sungkyunkwan University) ;
- Kim, Young-Dok (Department of Chemistry, Sungkyunkwan University) ;
- Lim, Dong-Chan (Materials Processing Division, Korea Institute of Materials of Science)
- Published : 2012.02.08
Abstract
Adsorption and desorption of toluene from bare and
Keywords
- Adsorption;
- Temperature programmed-desorption (TPD);
- Thin film;
- Atomic layer deposition (ALD);
- $TiO_2/SiO_2$