• 제목/요약/키워드: Drain engineering

검색결과 987건 처리시간 0.028초

ZnO 나노와이어를 이용한 FET 소자 제작 및 특성 평가 (Fabrication and Characterization of FET Device Using ZnO Nanowires)

  • 김경원;오원석;장건익;박동원;이정오;김범수
    • 한국표면공학회지
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    • 제41권1호
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    • pp.12-15
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    • 2008
  • The zinc oxide(ZnO) nanowires were deposited on Si(001) substrates by thermal chemical vapour deposition without any catalysts. SEM data suggested that the grown nanostructures were the well-aligned ZnO single crystals with preferential orientation. Back-gate ZnO nanowire field effect transistors(FET) were successfully fabricated using a photolithography process. The fabricated nanowire FET exhibits good contact between the ZnO nonowire and Au metal electrodes. Based on I-V characteristics it was found out that the ZnO nanowire revealed a characteristic of n-type field effect transistor. The drain current increases with increasing drain voltage, and the slopes of the $I_{ds}-V_{ds}$ curves are dependent on the gate voltage.

MMIC by 120nm InAlAs/InGaAs Metamorphic HEMT를 이용한 77 GHz 전력 증폭기 제작 (77 GHz Power Amplifier MMIC by 120nm InAlAs/InGaAs Metamorphic HEMT)

  • 김성원;설경선;김경운;최우열;권영우;서광석
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2006년도 하계종합학술대회
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    • pp.553-554
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    • 2006
  • In this paper, 77 GHz CPW power amplifier MMIC, which are consisted of a 2 stage driver stage and a power stage employing $8{\times}50um$ gate width, have been successfully developed by using 120nm $In_{0.4}AlAs/In_{0.35}GaAs$ Metamorphic high electron mobility transistors (MHEMTs). The devices show an extrinsic transconductance $g_m$ of 660 mS/mm, a maximum drain current of 700 mA/mm, and a gate drain breakdown voltage of -8.5 V. A cut-off frequency ($f_T$) of 172 GHz and a maximum oscillation frequency ($f_{max}$) of over 300 GHz are achieved. The fabricated PA exhibited high power gain of 20dB only with 3 stages. The output power is measured to be 12.5 dBm.

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연약지반 변형해석을 위한 다목적 Program개발

  • 박병기;정진섭
    • 한국지반공학회:학술대회논문집
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    • 한국지반공학회 1991년도 추계학술발표회 논문집 지반공학에서의 컴퓨터 활용 COMPUTER UTILIZATION IN GEOTECHNICAL ENGINEERING
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    • pp.362-375
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    • 1991
  • Background and Necessity of the study : For more than 20 years, the soil engineering reserach group of Chonnam National University has been performing the deformation analysis of soft clayey foundation, since the University is located near the south-western coast of Korean Peninsulla, along which tide reclamation works have been under proaressing. Associsted with the fact mentioned above, the researchers have been developing a computer program in order to carry out deformation analysis of soft foundation since early 1980. Case-studies : In this research, the Biot's equation was selected as the governing equation coupled with several constitutive models including original and modified Cam-clay models, elasto-viscoplastic model, Lade's model etc. The anisotropy of soi1 can be considered in this program. To validate the accuracy of the computer program developed a couple of case-studies were performed. These include the pilot banking, sand drain considering smear effect and compound foundation reinforced with sheet pile into soft foundation.i) The pilot banking Good results could be acquired by assuming banking load as the body force composed of finite element mesh rather than equivalent concentrated load.ii) The sand drain Due to smear, the delay of consolidation was remarkable at the early stsge. so safety for the failure of foundation should be checked for the initial step of consolidation. iii) The compound foundation Accurate results were obtained by introducing the joint element method for the soft foundation reinforced with sheet pile into soiㅣ.

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Dual-Gate Surface Channel 0.1${\mu}{\textrm}{m}$ CMOSFETs

  • Kwon, Hyouk-Man;Lee, Yeong-Taek;Lee, Jong-Duk;Park, Byung-Gook
    • Journal of Electrical Engineering and information Science
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    • 제3권2호
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    • pp.261-266
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    • 1998
  • This paper describes the fabrication and characterization of dual-polysilicon gated surface channel 0.1$\mu\textrm{m}$ CMOSFETs using BF2 and arsenic as channel dopants. We have used and LDD structure and 40${\AA}$ gate oxide as an insulator. To suppress short channel effects down to 0.1$\mu\textrm{m}$ channel length, shallow source/drain extensions implemented by low energy implantation and SSR(Super Steep Retrograde) channel structure were used. The threshold voltages of fabricated CMOSFETs are 0.6V. The maximum transconductance of nMOSFET is 315${\mu}$S/$\mu\textrm{m}$, and that of pMOSFET is 156 ${\mu}$S/$\mu\textrm{m}$. The drain saturation current of 418 ${\mu}$A/$\mu\textrm{m}$, 187${\mu}$A/$\mu\textrm{m}$ are obtained. Subthreshold swing is 85mV/dec and 88mV/dec, respectively. DIBL(Drain Induced Barrier Lowering) is below 100mV. In the device with 2000${\AA}$ thick gate polysilicon, depletion in polysilicon near the gate oxide results in an increase of equivalent gate oxide thickness and degradation of device characteristics. The gate delay time is measured to be 336psec at operation voltage of 2V.

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InP 식각정지층을 갖는 MHEMT 소자의 InGaAs/InP 복합 채널 항복 특성 시뮬레이션 (Simulation Study on the Breakdown Characteristics of InGaAs/InP Composite Channel MHEMTs with an InP-Etchstop Layer)

  • 손명식
    • 반도체디스플레이기술학회지
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    • 제12권4호
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    • pp.21-25
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    • 2013
  • This paper is for enhancing the breakdown voltage of MHEMTs with an InP-etchstop layer. The fully removed recess structure in the drain side of MHEMT shows that the breakdown voltage enhances from 2 V to 4 V in the previous work. This is because the surface effect at the drain side decreases the channel current and the impact ionization in the channel at high drain voltage. In order to increase the breakdown voltage at the same asymmetric gate-recess structure, the InGaAs channel structure is replaced with the InGaAs/InP composite channel in the simulation. The simulation results with InGaAs/InP channel show that the breakdown voltage increases to 6V in the MHEMT as the current decreases. In this paper, the simulation results for the InGaAs/InP channel are shown and analyzed for the InGaAs/InP composite channel in the MHEMT.

Si-기반 나노채널 MOSFET의 문턱전압에 관한 분석 (Investigation of Threshold Voltage in Si-Based MOSFET with Nano-Channel Length)

  • 정정수;장광균;심성택;정학기;이종인
    • 한국정보통신학회:학술대회논문집
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    • 한국해양정보통신학회 2001년도 춘계종합학술대회
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    • pp.317-320
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    • 2001
  • 본 논문에서는 Si-기반 나노채널 nMOSFET의 문턱전압에 관하여 분석하였다. 본 논문에서 연구된 소자는 180nm의 n-채널 MOSFET을 기준으로 30 nm까지의 게이트 길이를 가진 소사를 정전압 스켈링 이론에 따라 스켈링하였다. 이들 소자들은 드레인 영역에서의 전계크기 감소와 단채널 효과를 줄이기 위해 LDD(lightly doped drain) 구조를 사용하였으며 이들 소자의 문턱전압을 조사ㆍ분석하였다. 이러한 해석은 IC응용의 한계에 대한 분석을 제공할 것이며 VLSI의 기본 데이터로 활용될 수 있을 것이다.

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CPS 이온주입을 통한 NEDSCR 소자의 정전기 보호 성능 개선 (Improvement of ESD (Electrostatic Discharge) Protection Performance of NEDSCR (N-Type Extended Drain Silicon Controlled Rectifier) Device using CPS (Counter Pocket Source) Ion Implantation)

  • 양준원;서용진
    • 한국위성정보통신학회논문지
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    • 제8권1호
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    • pp.45-53
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    • 2013
  • 기존의 NEDSCR 소자는 매우 낮은 스냅백 홀딩전압과 낮은 온-저항을 가져 정상적인 동작 동안 래치업을 초래하므로 ESD 보호소자로 사용하는데 어려움이 있었다. 본 연구에서는 NEDSCR 소자의 시뮬레이션 및 TLP 테스트를 통해 이러한 단점들을 극복할 수 있는 새로운 방법을 제안하였다. 매우 우수한 ESD 보호 성능과 높은 래치업 면역 특성을 구현하기 위해 N+ 소오스 확산영역을 둘러싸는 P형의 CPS 이온주입공정을 추가함으로써 NEDSCR 소자의 스냅백 홀딩전압과 온 저항을 증가시켜 정전기 보호 성능을 개선시킬 수 있는 것으로 입증되었다.

오일 드레인과 엔진경사각도간의 상관관계 (A Study on the Correlation of Oil Drain and Engine Tilting Angle)

  • 김대열;박병완
    • 한국자동차공학회논문집
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    • 제19권5호
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    • pp.51-57
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    • 2011
  • Parametric studies based on analysis of lubrication system of a four cylinder gasoline engine are illustrated system in this paper. In development process of engine lubrication system, parts of failure cases are related with oil pull over and oil churning phenomenon. The crankcase & head system pressure by oil churning phenomenon are gradual increased. It cause oil pull over phenomenon at engine breather line and oil over-consumption. In order to improve oil reduction and oil pull over phenomenon are also considered in the developing state. For this study, the characteristics of engine lubrication system are measured at various tilting angle and drain hole sizes. In addition, the oil flow & oil quantity are tested by blow by meter and catch jar. Results are presented to stabilize the oil supply system at sever driving condition. The data from present study are available for the engine lubrication system.