• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2000.10a
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• pp.490-493
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• 2000

The technology for characteristics analysis of device for high integration is changing rapidly. Therefore to understand characteristics of high integrated device by computer simulation and to fabricate the device having such characteristics became one of very important subjects. As devices become smaller to submicron, we have investigated MOSFET built on an epitaxial layer(EPI) of a heavily-doped ground plane by TCAD(Technology Computer Aided Design) to develop optimum device structure. We compared and analyzed the characteristics of such device structure, i.e., impact ionization, electric field and I-V characteristics curve with lightly-doped drain(LDD) MOSFET. Also, we presented that TCAD simulator is suitable for device simulation.

• Geotechnical Engineering
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• v.13 no.2
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• pp.39-54
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• 1997

Laboratory testings were carried out on plastic board drains (PBDs) using large scale test apparatus to evaluate the physical properties and the drainage performance. The test results reveal that the domestic products of PBDs are well compared with the foreign prod acts as far as the quality and drainage performance are concerned. It has also been confirmed that the discharge capacity decreases with time in such a way that the air bubbles are entrapped inside kinky PBDs and these air bubbles block the water flow through PBDs. It has been found that the vacuum pressure iseffectively applicable to recover the discharge capacity affected by the entrapped air bubbles.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2000.05a
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• pp.470-473
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• 2000

The metal-oxide-semiconductor field-effect transistor(MOSFET) has undergone many changes in the last decade in response to the constant demand for increased speed, decreased power, and increased patting density. The devices are scaled down day by day. Therefore, This paper investigates how MOSFET structures influence on transport properties in according to change of channel length and bias and, observes impact ionization between the drain and the gate. This paper proposes three models, i.e., conventional MOSFET, LDD MOSFET and EPI MOSFET. The gate lengths are 0.3$\mu\textrm{m}$ 0.15$\mu\textrm{m}$, 0.075$\mu\textrm{m}$ and scaling factor is λ = 2. We have presented MOSFET's characteristics such as I-V characteristic, impart ionization, electric field, using the TCAD. We have analyzed the adaptive channel and doping influences

• The Journal of the Korea institute of electronic communication sciences
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• v.11 no.10
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• pp.989-994
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• 2016

This study was conducted the management of a water level through the water sensor, the waterline and the drain applied to the rice paddy. The gateway transfers the information to oneM2M(: Machine to Machine) platform of IoT(: Internet of Thing) standards to the height of the water level sensor information through the LoRa connection. Depending on the water level requested by the IoT platform, the gateway is to On or Off waterline or drain motor switch and send the information of the water level sensor. IoT platform performs the intelligent application function according to the condition of the water level.

• Journal of IKEEE
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• v.11 no.3
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• pp.95-99
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• 2007

In this study, the electrical characteristics of Symmetric and Asymmetric High Voltage MOSFET(HV-MOSFET) under high temperature were investigated. And, the specific on-resistance, threshold voltage, transconductance, drain current of the HV-MOSFETs were measured over a temperatures range of 300K ${\leq}$ T ${\leq}$400K. From the result of measured data, specific on-resistance increases slightly with increasing temperature. Especially, at high temperature(at 400K) specific on-resistance was increased about 30% than that in room temperature. And, in high temperature condition (at 400K), drain current was decreased about 30%, Also, transconductance(gm) was decreases with increasing temperature.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.49 no.4
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• pp.1-6
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• 2012

This paper presents the extraction and analysis of small-signal parameters of tunneling field-effect transistors (TFETs) by using TCAD device simulation. The channel lengths ($L_G$) of the simulated devices varies from 50 nm to 100 nm. The parameter extraction for TFETs have been performed by quasi-static small-signal model of conventional MOSFETs. The small-signal parameters of TFETs with different channel lengths were extracted according to gate bias voltage. The $L_G$-dependency of the effective gate resistance, transconductance, source-drain conductance, and gate capacitance are different with those of conventional MOSFET. The $f_T$ of TFETs is inverely proportional not to $L_G{^2}$ but to $L_G$.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2007.10a
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• pp.751-753
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• 2007

Organic field-effect transistors (OFETs) are of interest for use in widely area electronic applications. We fabricated a copper phthalocyanine (CuPc) based field-effect transistor with different metal electrode. The CuPc FET device was made a top-contact type and the substrate temperature was room temperature. The source and drain electrodes were used an Au and Al materials. The CuPc thickness was 40nm. and the channel length was $50{\mu}m$, channel width was 3mm. We observed a typical current-voltage (I-V) characteristics in CuPc FET with different electrode materials.

• Korean Journal of Materials Research
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• v.24 no.3
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• pp.140-144
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• 2014

The contact mechanism of devices is usually researched at electrode contacts. However, the contact between a dielectric and channel at the MOS structure is more important. The graphene was used as a channel material, and the thin film transistor with MOS structure was prepared to observe the contact mechanism. The graphene was obtained on Cu foil by the thermal decomposition method with $H_2$ and $CH_4$ mixed gases at an ambient annealing temperature of $1000^{\circ}C$ during the deposition for 30 min, and was then transferred onto a $SiO_2/Si$ substrate. The graphene was doped in a nitrogen acidic solution. The chemical properties of graphene were investigated to research the effect of nitric atoms doping. The sheet resistance of graphene decreased after nitrogen acidic doping, and the sheet resistance decreased with an increase in the doping times because of the increment of negative charge carriers. The nitric-atom-doped graphene showed the Ohmic contact at the curve of the drain current and drain voltage, in spite of the Schottky contact of grapnene without doping.

• STI Policy Review
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• v.1 no.2
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• pp.1-18
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• 2010

The development and maintenance of human capacity in economies is critical to long term competitiveness, but also for the overall health and environment of regions. Yet, human science and technology-based capacity is multidimensional and has interrelated characteristics which present certain policy challenges. This paper addresses a range of issues specific to a discussion on human capacity in S&T. First, the paper emphasizes the importance of acknowledging the complexity of human capacity issues and how they evolve along the STEM (science, technology, engineering, and mathematics) pipeline. The pipeline is an often used reference to describe the training and development in STEM disciplines, from early childhood education, to more advanced training, and finally to professional collaboration and interaction and serves as a useful organizing framework for the discussion of capacity along the career evolution process. Second, the paper offers an organizing framework for discussion of policy mechanisms that have been developed to address issues and gaps that occur along this STEM pipeline. Specifically, it contrasts the traditional mechanisms of building human capacity in STEM areas with newer "gap filling" and integrated approached to addressed human capacity disparities and priorities. Third, the paper addresses core challenges in human capacity in STEM, including the education and training, participation of women and underrepresented groups, brain drain/brain circulation issues, and the globalization of science. The paper concludes with a discussion of policy implication for the development of human capacity.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2001.10a
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• pp.665-668
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• 2001

As reducing the physical size of devices, we can integrate more devices per the unit chip area and make its speed better. We have investigated MOSFET built on an epitaxial layer(EPI) of a heavily-doped ground plane. We compared and analyzed the characteristics of such device structure, i.e., impact ionization, electric field and I-V characteristics curve with lightly-doped drain(LDD) MOSFET. We simulated MOSFET with gate lengths from 0.10 to 0.06${\mu}{\textrm}{m}$ step 0.01${\mu}{\textrm}{m}$ in according to constant voltage scaling theory.