• Korean Journal of Optics and Photonics
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• v.14 no.4
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• pp.392-398
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• 2003

We present a novel concept of a phase-shifting diffraction-grating interferometer, which is intended for the optical testing of concave mirrors with high precision. The interferometer is configured with a single reflective diffraction grating, which performs multiple functions of beam splitting, beam recombination, and phase shifting. The reference and test wave fronts are generated by means of reflective diffraction at the focal plane of a microscope objective with large numerical aperture, which allows testing fast mirrors with low f-numbers. The fiber-optic confocal design is adopted for the microscope objective to focus a converging beam on the diffractive grating, which greatly reduces the alignment error between the focusing optics and the diffraction grating. Translating the grating provides phase shifting, which allows measurement of the figure errors of the test mirror to nanometer accuracy.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.55 no.9
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• pp.423-428
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• 2006

We have been carried out the two-beam interference method to form the diffraction grating on chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ thin films for Holography Data Storage (HDS). In the present work, we have been formed holographic diffraction gratings using He-Ne laser (632.8nm) under different Polarization state combinations (intensity polarization holography, phase polarization holography). It was obtained the diffraction grating efficiency by 11st order intensity and investigated the formed grating structure using Atomic Force Microscopy (AFM). As the results, it is shown that the diffraction efficiency of (P: P) polarized recording was maximum 2.4% and we found that its value was rather higher than that of other-polarized recordings. From the results, it is confirmed that the efficient holographic grating formation on amorphous chalcogenide $AS_{40}Se_{15}S_{35}Ge_{10}$ films depend on both the spatial variation of intensity and the polarization state of the incident field pattern.

• Journal of the Optical Society of Korea
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• v.15 no.3
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• pp.216-221
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• 2011

A diffraction grating is a highly symmetric optical element with a physical structure that is invariant under translational spatial movements. The translational symmetry is reflected in the fields that are diffracted from the grating. Here, we introduce a plane-parallel mirror pair onto the grating, which translates the fields through double reflections, and we describe a method of exploiting the symmetry to enhance the spectral resolution of a diffraction grating beyond the limit that is set by the number of grooves. The mirror pair creates another virtual grating beside the original one, effectively doubling the number of grooves. Addition of more mirror pairs can further increase the effective number of grooves despite the increased complexity and difficulty of experimental implementation. We experimentally demonstrate the spectral linewidth reduction by a factor of four in a neon fluorescence spectrum. Even though the geometrical restriction on the mirror deployment limits our method to a certain range of the whole spectrum, as a practical application example, a bulky spectrometer that is nearly empty inside can be made compact without sacrificing the resolution.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2004.05a
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• pp.119-122
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• 2004

This paper discovers that we form holographic grating in AsGeSeS thin film. Holographic grating is not developed in the length of 10,20,40nm, while it is formed in the thin film of 80nm though it shows very low diffraction efficiency. On the contrary, holographic grating is established in every thin film of Ag(10nm)/AsGeSeS(10,20,40,80nm). Lattice in 10,20 nm thin film builds up, and immediately disappears. In the case of 40nm thin film, even if holographic grating is made up, it seems to have a low diffraction efficiency. Apart from 10,20,40nm, it shows the highest diffraction efficiency in the thin film of 80nm.

• Transactions on Electrical and Electronic Materials
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• v.5 no.1
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• pp.34-37
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• 2004

Amorphous chalcogenide thin films, especially a-(Se, S) based films, exhibit a number of photo-induced phenomena. In this study, we make the As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag thin film and then we measure the holographic diffraction efficiency according to thickness of Ag. And we form the two-dimensional holographic grating. At first, we formed one-dimensional grating and then we form two-dimensional grating by rotate the sample. We found out the most suitable thickness of Ag and in case of As$\_$40/Ge$\_$10/Se$\_$15/S$\_$35//Ag(600${\AA}$), the diffraction efficiency was more higher than other samples. The holographic grating was formed by He-Ne laser(λ=632.8nm). The intensity of incident beam was 2.5mW and incident angle was 20$^{\circ}$. We confirm. the two-dimensional holographic grating by the pattern of diffracted beam and AFM(Atomic Force Microscope) image. We perform the etching process using by 0.26N NaOH in order to confirm clearly two-dimensional grating.

• Proceedings of the KIEE Conference
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• 2008.07a
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• pp.1440-1441
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• 2008

In this paper, we investigated the diffraction grating efficiency on AsSeS and Ag-doped amorphous chalcogenide Ag/AsSeS thin film for used to volume hologram. The Chalcogenide film thickness was 0.5um and Ag thin film was varied from 10nm and 20nm. Diffraction efficiency was obtained from (P:P) polarized Diode Pumped Solid State laser(DPSS, 532.0nm: 200mW) beam on AsSeS and Ag/AsSeS thin films. As a results, diffraction grating was not formed at AsSeS thin film but at Ag-doped AsSeS thin film, diffraction grating was formed well compare with the former.

• Proceedings of the KSME Conference
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• 2000.04a
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• pp.415-419
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• 2000

Multi-degree-of-freedom (MDOF) displacement measurement Is needed In many application fields: precision machine control, precision assembly, vibration analysis, and so on. This paper presents a new MDOF displacement measurement method using a laser diode (LD), two position-sensitive detectors (PSDs), and a conventional diffraction grating. It utilizes typical features of a diffraction grating to obtain the information of MDOF displacement. MDOF displacement is calculated from the independent coordinate values of the diffracted ray spots on the PSDs. Forward and inverse kinematic problems were solved to compute the MDOF displacement of a rigid body. Experimental results show maximum absolute errors of less than ${\pm}10$ micrometers in translation and ${\pm}30$ arcsecs in rotation.

• Transactions of the Society of Information Storage Systems
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• v.9 no.2
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• pp.48-50
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• 2013

In this work, we investigated the diffraction of inverse-hemisphere shaped polymer grating. The grating was fabricated by using soft lithography of hexagonally close-packed PS nanospheres. The periodicity of the grating was tuned by swelling in acetone and the diffraction wavelength shift induced from lattice change was measured. This device can be used as a strain gauge or a chemical sensor.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.8 s.185
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• pp.72-79
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• 2006

We measured grating pitch standards using optical diffractometry and analyzed measurement uncertainty. Grating pitch standards have been used widely as a magnification standard for a scanning electron microscope (SEM) and a scanning probe microscope (SPM). Thus, to establish the meter-traceability in nano-metrology using SPM and SEM, it is important to certify grating pitch standards accurately. The optical diffractometer consists of two laser sources, argon ion laser (488 nm) and He-Cd laser (325 nm), optics to make an incident beam, a precision rotary table and a quadrant photo-diode to detect the position of diffraction beam. The precision rotary table incorporates a calibrated angle encoder, enabling the precise and accurate measurement of diffraction angle. Applying the measured diffraction angle to the grating equation, the mean pitch of grating specimen can be obtained very accurately. The pitch and orthogonality of two-dimensional grating pitch standards were measured, and the measurement uncertainty was analyzed according to the Guide to the Expression of Uncertainty in Measurement. The expanded uncertainties (k = 2) in pitch measurement were less than 0.015 nm and 0.03 nm for the specimen with the nominal pitch of 300 nm and 1000 nm. In the case of orthogonality measurement, the expanded uncertainties were less than $0.006^{\circ}$. In the pitch measurement, the main uncertainty source was the variation of measured pitch values according to the diffraction order. The measurement results show that the optical diffractometry can be used as an effective calibration tool for grating pitch standards.

• Proceedings of the KIEE Conference
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• 2006.10a
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• pp.55-56
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• 2006

We investigated the diffraction grating efficiency by the DPSS laser beam wavelength to improve the diffraction efficiency on AsGeSeS & Ag/ AsGeSeS thin film. Diffraction efficiency was obtained from DPSS(532nm)(P:P)polarized laser beam on AsGeSeS, Ag/ AsGeSeS and AsGeSeS/Ag/AsGeSeS thin films. As a result, for the laser beam intensity, 0.24 mW, single AsGeSeS thin film shows the highest value of 0.161% diffraction efficiency at 300 s and for 2.4 mW, it was recorded with the fastest speed of 50 s, which the diffraction grating forming speed is faster than that of 0.24 mW beam. Ag/ AsGeSeS and AsGeSeS/ Ag/ AsGeSeS multi-layered thin film also show the faster grating forming speed at 2.4 mW and higher value of diffraction efficiency at 0.24 mW.