• Journal of Convergence for Information Technology
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• v.11 no.6
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• pp.146-153
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• 2021

Recently, research on perovskite semiconductor materials has been performed, and the evaluation of properties using surface treatment for this material is the basis for subsequent studies. We studied the results of surface treatment of perovskite thin films exposed to air for about 6 months by generating oxygen plasma with an atmospheric pressure plasma equipment. The reason for exposure for 6 months is that the perovskite thin film is made of organic and inorganic substances, so when exposed to air, the surface changes through reaction with oxygen or water vapor. Therefore, this change is to investigate whether it is possible to restore the original film. The surface shape and the ratio of elements were analyzed by varying the process time from 1 s to 1200 s in an oxygen plasma atmosphere. It was found that the crystal grains change over a process time of 5 s or more. In order to maintain the properties of the deposited film, it is the optimal process condition between 2 s and 5 s.

• Journal of the Korean institute of surface engineering
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• v.54 no.1
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• pp.25-29
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• 2021

The fabrication of nanopore membrane by deposition of Al2O3 film using electron-beam evaporation, which is fast, cost-effective, and negligible dependency on substance material, is investigated for potential applications in water purification and sensors. The decreased nanopore diameter owing to increased wall thickness is observed when Al2O3 film is deposited on anodic aluminum oxide membrane at higher deposition rate, although the evaporation process is generally known to induce a directional film deposition leading to the negligible change of pore diameter and wall thickness. This behavior can be attributed to the collision of evaporated Al2O3 particles by the decreased mean free path at higher deposition rate condition, resulting in the accumulation of Al2O3 materials on both the surface and the edge of the wall. The reduction of nanopore diameter by Al2O3 film deposition can be applied to the nanopore membrane fabrication with sub-100 nm pore diameter.

• Fashion & Textile Research Journal
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• v.24 no.1
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• pp.138-145
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• 2022

Today, graphene loaded textiles are being considered promising smart clothing due to their high conductivity. In this study, we reported reduced graphene oxide(r-GO) deposited pure cotton fabrics fabricated with a colloidal solution of graphene(GO), using a one-step aerosol spray pyrolysis(ASP) process and their potential application on smart textiles. The ASP process is advantageous in that it is easily implementable and can be applied for continuous processing. Moreover, this process has never been applied to deposit r-GO on pure cotton fabric. The field emission-scanning microscopy (FE-SEM) observation, Fourier transform-infrared(FT-IR) analysis, Raman spectroscopy, X-ray diffraction(XRD) analysis, and ultraviolet transmittance(UVT) were used to evaluate material properties of the r-GO colloids. The resistance was also measured to evaluate the electrical conductivity of the specimens. The results revealed that the r-GO was successfully deposed on specimens, and the specimen with the highest electrical conductivity demonstrated an electrical resistance value of 2.27 kΩ/sq. Taken together, the results revealed that the ASP method demonstrated a high potential for effective deposition of r-GO on cotton fabric specimens and is a prospect for the development of conductive cotton-based smart clothing. Therefore, this study is also meaningful in that the ASP process can be newly applied by depositing r-GO on the pure cotton fabric.

• Journal of the Semiconductor & Display Technology
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• v.21 no.4
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• pp.138-143
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• 2022

We analyzed the influence of post-annealing on Ga₂O₃/n-type 4H-SiC heterojunction diode. Gallium oxide (Ga₂O₃) thin films were deposited by radio frequency (RF) sputtering. Post-deposition annealing at 950℃ in an Oxygen atmosphere was performed. The material properties of Ga₂O₃ and the electrical properties of the diodes were investigated. Atomic Force Microscopy (AFM), X-Ray Diffraction and Scanning Electron Microscope (SEM) images show a significant increase in the roughness and crystallinity of the O₂-annealed films. After Oxygen annealing X-ray Photoelectron Spectroscopy (XPS) shows that the atomic ratio of oxygen increases which is related to a decrease in oxygen vacancy within the Ga₂O₃ film. The O₂-annealed diodes exhibited higher on-current and lower leakage current. Moreover, the ideality factor, barrier height, and thermal activation energy were derived from the current-voltage curve by increasing the temperature from 298 - 434K.

• Journal of Electrochemical Science and Technology
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• v.13 no.1
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• pp.78-89
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• 2022

ANODE-free Li-metal batteries (AFLMBs) operating with Li of cathode material have attracted enormous attention due to their exceptional energy density originating from anode-free structure in the confined cell volume. However, uncontrolled dendritic growth of lithium on a copper current collector can limit its practical application as it causes fatal issues for stable cycling such as dead Li formation, unstable solid electrolyte interphase, electrolyte exhaustion, and internal short-circuit. To overcome this limitation, here, we report a novel dual-salt electrolyte comprising of 0.2 M LiPF₆ + 3.8 M lithium bis(fluorosulfonyl)imide in a carbonate/ester co-solvent with 5 wt% fluoroethylene carbonate, 2 wt% vinylene carbonate, and 0.2 wt% LiNO₃ additives. Because the dual-salt electrolyte facilitates uniform/dense Li deposition on the current collector and can form robust/ionic conductive LiF-based SEI layer on the deposited Li, a Li/Li symmetrical cell exhibits improved cycling performance and low polarization for over 200 h operation. Furthermore, the anode-free LiFePO₄/Cu cells in the carbonate electrolyte shows significantly enhanced cycling stability compared to the counterparts consisting of different salt ratios. This study shows an importance of electrolyte design guiding uniform Li deposition and forming stable SEI layer for AFLMBs.

• Journal of the Korean institute of surface engineering
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• v.34 no.5
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• pp.503-509
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• 2001

Thin films of hydrogenated amorphous silicon (a-Si : H) and hydrogenated amorphous silicon carbide (a-SiC:H) of different compositions were deposited on Si(100) wafer and glass by RF plasma-enhanced chemical vapor deposition (RF-PECVD). In the present work, we have investigated the effects of the RF power on the properties, such as optical band gap, transmittance and crystallinity. The Raman data show that the a-Si:H material consists of an amorphous and crystalline phase for the co-presence of two peaks centered at 480 and $520 cm^{-1}$ . The UV-VIS data suggested that the optical energy band gap ($E_{g}$ ) is not changed effectively with RF power and the obtained $E_{g}$(1.80eV) of the $\mu$c-Si:H thin film has almost the same value of a-Si:H thin film (1.75eV), indicating that the crystallity of hydrogenated amorphous silicon thin film can mainly not affected to their optical properties. However, the experimental results have shown that$ E_{g}$ of the a-SiC:H thin films changed little on the annealing temperature while $E_{g}$ increased with the RF power. The Raman spectrum of the a-SiC:H thin films annealed at high temperatures showed that graphitization of carbon clusters and microcrystalline silicon occurs.

• Journal of the Microelectronics and Packaging Society
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• v.31 no.1
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• pp.23-28
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• 2024

Electronic products utilizing flexible devices experience harsh mechanical deformations in real-use environments. As a result, researches on the mechanical reliability of these flexible devices have attracted considerable interest among researchers. This study employed previous bending strain models and finite element analysis to predict the maximum bending strain of metal films deposited on flexible substrates. Bending experiments were simulated using finite element analysis with variations in the material and thickness of the thin films, and the substrate thickness. The results were compared with the strains predicted by existing models. The distribution of strain on the surface of film was observed, and the error rate of the existing model was analyzed during bending. Additionally, a modified model was proposed, providing mathematical constants for each case.

• Journal of Korean Ophthalmic Optics Society
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• v.16 no.4
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• pp.383-390
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• 2011

Purpose: The present study was conducted to investigate whether refractive powers of soft contact lenses were induced by the deposition of tear proteins when wearing soft contact lenses. Methods: The soft contact lenses (material: etafilcon A, hilafilcon A and comfilcon A) with refractive powers of -1.00 D, -3.00 D, -5.00 D and -7.00 D were incubated in artificial tear for 1 day, 3 days, 5 days, 7 days and 14 days, respectively. After incubation, their refractive powers were measured by wet cell method with an auto-lens meter and their protein deposited on the lenses was determined by the method of Lowry. Results: Among three types of soft contact lenses, the most protein deposition was detected in ionic etafilcon A lens material and significant change of its refractive power was manifested. In other words, refractive powers of etafilcon A lenses firstly decreased after 1 day incubation in artificial tear and then gradually increased with increasing incubation period again. The observed change in refractive powers of all diopters of etafilcon A material was beyond the scope of standard error and bigger in the lens with lower optical power. On the other hand, non-ionic hilafilcon A showed less protein deposition as much as about 20% in etafilacon A and statistically significant increase of refractive powers with increasing incubation period in artificial tear. The change in refractive power of hilafilcon A was also beyond the scope of the standard of error when incubating in artificial tear and greater in the lens with lower diopter. The least protein deposit was shown in silicone hydrogel lens material, comfilcon A as approximately 10% of it in etafilcon A, indicating less change in refractive power within the standard range of error. Conclusions: The large change of refractive powers that was beyond the scope of standard error by the deposition of tear proteins on soft contact lenses was differently detected depending on lens materials in the current study. Thus, the deposition of tear proteins induced by longer period of lens wearing may be one of the causes that induces blurred vision, suggesting that soft contact lens wearers with the amount of tear proteins may need to choose proper lens material.

• Journal of the Korean Magnetics Society
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• v.12 no.5
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• pp.184-188
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• 2002

The Cu/Ni/Cu(002)/Si(100) films which have perpendicular magnetic anisotropy were deposited by e-beam evaporation methods. From the reflection high energy electron diffraction pattern, the films were confirmed to be grown epitaxially on silicon. After 2X lots ions/$\textrm{cm}^2$ C+ irradiation, magnetic easy-axis was changed from surface normal to in-plane as shown in the hysteresis loop of magneto-optical Kerr effects. It became manifest from analysis of X-ray reflectivity and grazing incident X-ray diffraction that even though interface between top Cu layer and Ni layer became rougher, the contrast of Cu and Ni's electron density became manifest after ion irradiation. In addition, the strain after deposition of the films was relaxed after ion irradiation. Strain relaxation related with change of magnetic properties and mechanism of intermixed layer's formation was explained by thermo-chemical driving force due to elastic and inelastic collision of ions.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.08a
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• pp.254-255
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• 2012

Interest in nano-crystalline silicon (nc-Si) thin films has been growing because of their favorable processing conditions for certain electronic devices. In particular, there has been an increase in the use of nc-Si thin films in photovoltaics for large solar cell panels and in thin film transistors for large flat panel displays. One of the most important material properties for these device applications is the macroscopic charge-carrier mobility. Hydrogenated amorphous silicon (a-Si:H) or nc-Si is a basic material in thin film transistors (TFTs). However, a-Si:H based devices have low carrier mobility and bias instability due to their metastable properties. The large number of trap sites and incomplete hydrogen passivation of a-Si:H film produce limited carrier transport. The basic electrical properties, including the carrier mobility and stability, of nc-Si TFTs might be superior to those of a-Si:H thin film. However, typical nc-Si thin films tend to have mobilities similar to a-Si films, although changes in the processing conditions can enhance the mobility. In polycrystalline silicon (poly-Si) thin films, the performance of the devices is strongly influenced by the boundaries between neighboring crystalline grains. These grain boundaries limit the conductance of macroscopic regions comprised of multiple grains. In much of the work on poly-Si thin films, it was shown that the performance of TFTs was largely determined by the number and location of the grain boundaries within the channel. Hence, efforts were made to reduce the total number of grain boundaries by increasing the average grain size. However, even a small number of grain boundaries can significantly reduce the macroscopic charge carrier mobility. The nano-crystalline or polymorphous-Si development for TFT and solar cells have been employed to compensate for disadvantage inherent to a-Si and micro-crystalline silicon (${\mu}$-Si). Recently, a novel process for deposition of nano-crystralline silicon (nc-Si) thin films at room temperature was developed using neutral beam assisted chemical vapor deposition (NBaCVD) with a neutral particle beam (NPB) source, which controls the energy of incident neutral particles in the range of 1~300 eV in order to enhance the atomic activation and crystalline of thin films at room temperature. In previous our experiments, we verified favorable properties of nc-Si thin films for certain electronic devices. During the formation of the nc-Si thin films by the NBaCVD with various process conditions, NPB energy directly controlled by the reflector bias and effectively increased crystal fraction (~80%) by uniformly distributed nc grains with 3~10 nm size. The more resent work on nc-Si thin film transistors (TFT) was done. We identified the performance of nc-Si TFT active channeal layers. The dependence of the performance of nc-Si TFT on the primary process parameters is explored. Raman, FT-IR and transmission electron microscope (TEM) were used to study the microstructures and the crystalline volume fraction of nc-Si films. The electric properties were investigated on Cr/SiO2/nc-Si metal-oxide-semiconductor (MOS) capacitors.