• Title/Summary/Keyword: Density current

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Deformation in a nonlocal magneto-thermoelastic solid with hall current due to normal force

  • Lata, Parveen;Singh, Sukhveer
    • Geomechanics and Engineering
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    • v.22 no.2
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    • pp.109-117
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    • 2020
  • The present article is concerned about the study of disturbances in a homogeneous nonlocal magneto-thermoelastic medium under the combined effects of hall current, rotation and two temperatures. The model under assumption has been subjected to normal force. Laplace and Fourier transform have been used for finding the solution to the field equations. The analytical expressions for conductive temperature, stress components, normal current density, transverse current density and displacement components have been obtained in the physical domain using a numerical inversion technique. The effects of hall current and nonlocal parameter on resulting quantities have been depicted graphically. Some particular cases have also been figured out from the current work. The results can be very important for the researchers working in the field of magneto-thermoelastic materials, nonlocal thermoelasticity, geophysics etc.

Characteristics of Latch-up Current of the Dual Gate Emitter Switched Thyristor (Dual Gate Emitter Switched Thyristor의 Latch-up 전류 특성)

  • 이응래;오정근;이형규;주병권;김남수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.8
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    • pp.799-805
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    • 2004
  • Two dimensional MEDICI simulator is used to study the characteristics of latch-up current of Dual Gate Emitter Switched Thyristor. The simulation is done in terms of the current-voltage characteristics, latch-up current density, ON-voltage drop and electrical property with the variations of p-base impurity concentrations. Compared with the other power devices such as MOS Controlled Cascade Thyristor(MCCT), Conventional Emitter Switched Thyristor(C-EST) and Dual Channel Emitter Switched Thyristor(DC-EST), Dual Gate Emitter Switched Thyristor(DG-EST) shows to have the better electrical characteristics, which is the high latch-up current density and low forward voltage-drop. The proposed DG-EST which has a non-planer p-base structure under the floating $N^+$ emitter indicates to have the better characteristics of latch-up current and breakover voltage.

Calculation of Eddy Current Distribution in Conducting Bulk with Voltage Source (전압원이 인가된 도체 내에서의 와전류 분포 해석)

  • Kim, Do-Wan;Jeong, Hyeon-Gyo;Han, Song-Yeop
    • The Transactions of the Korean Institute of Electrical Engineers B
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    • v.49 no.1
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    • pp.9-14
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    • 2000
  • When current flows through a thick conductor such, most of the current flows along outside of the conductor, which is called skin effect. This paper represents a method calculating such a current distribution in the conductor region. The conductor region is divided into some pieces and each piece has its own unknown variable, i.e. current density. The governing equation which expresses Maxwell's equation is combined with the circuit equation with voltage source. The combined equation is solved to obtain current distribution in the conductor. This algorithm is applied to EMC(Electromagnetic Casting) to calculate current density with voltage source.

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DC Voltage-Current Characteristics of a High Temperature Superconducting Conductor (고온초전도체의 DC 전압 - 전류 특성)

  • Woo Ryu-Kyung;Li Zhu-Yong;Ma Yang-Hu;Choi Byoung-Ju;Park Kwon-Bae;Oh Il-Sung
    • Progress in Superconductivity and Cryogenics
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    • v.8 no.3
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    • pp.49-53
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    • 2006
  • A high temperature superconductor (HTS) has been developed for power applications such as power cables, fault current limiters and superconducting magnetic energy storage devices. For such applications it is required to understand the DC voltage-current characteristic of the HTS. which is important in analyzing AC loss and flux flow loss quantitatively. In this work, we have experimentally investigated influence of several factors, e.g. critical current density. degradation and AC external magnetic field, on the DC voltage-current characteristic. The measured results have been discussed in engineering application point of view.

The Effect of Additives on the High Current Density Copper Electroplating (고전류밀도에서 첨가제에 따른 구리도급의 표면 특성 연구)

  • Shim, Jin-Yong;Moon, Yun-Sung;Hur, Ki-Su;Koo, Yeon-Soo;Lee, Jae-Ho
    • Journal of the Microelectronics and Packaging Society
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    • v.18 no.1
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    • pp.29-33
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    • 2011
  • The current density in copper electroplating is directly related with the productivity and then to increase the productivity, the increase in current density is required. To obtain the high mass flow rate, rotating disk electrode(RDE) was employed. High rotational speed in RDE can increase the mass flow rate and then high speed electroplating was possible using RDE to control mass flow. Two types of cathode were used. One is RDE and another is rotating cylindrical electrode(RCE). A constant-current, constant-voltage and linear sweep voltammetry were applied to investigate current and voltage relationship. The maximum current density without evolution of hydrogen gas was increased with rotational speed. Over 400 rpm, maximum current density was higher than 1000 A/$m^2$. The diffusion coefficients of copper calculated from the slope of the plots are $5.5{\times}10^6\;cm^2\;s^{-1}$ at $25^{\circ}C$ and $10.5{\times}10^6\;cm^2\;s^{-1}$ at $62^{\circ}C$. The stable voltage without evolution of hydrogen gas was -0.05 V(vs Ag/AgCl). Additives were added to prevent dendritic growth on cathode deposits. The surface roughness was analyzed with UV-Vis Spectrophotometer. The reflectance of the copper surface over 600 nm was measured and was related with the surface roughness. As the surface roughness improved, the reflectance was also increased.

Dual-frequency Capacitively Coupled Plasma-enhanced Chemical Vapor Deposition System for Solar Cell Manufacturing

  • Gwon, Hyeong-Cheol;Won, Im-Hui;Sin, Hyeon-Guk;Rehman, Aman-Ur;Lee, Jae-Gu
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.310-311
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    • 2011
  • Dual-frequency (DF) capacitively coupled plasmas (CCP) are used to separately control the mean ion energy and flux at the electrodes [1]. This separate control in capacitively coupled radio frequency discharges is one of the most important issues for various applications of plasma processing. For instance, in the Plasma Enhanced Chemical Vapor Deposition processes such as used for solar cell manufacturing, this separate control is most relevant. It principally allows to increase the ion flux for high deposition rates, while the mean ion energy is kept constant at low values to prevent highly energetic ion bombardment of the substrate to avoid unwanted damage of the surface structure. DF CCP can be analyzed in a fashion similar to single-frequency (SF) driven with effective parameters [2]. It means that DF CCP can be converted into SF CCP with effective parameters such as effective frequency and effective current density. In this study, comparison of DF CCP and its converted effective SF CCP is carried out through particle-in-cell/Monte Carlo (PIC-MCC) simulations. The PIC-MCC simulation shows that DF CCP and its converted effective SF CCP have almost the same plasma characteristics. In DF CCP, the negative resistance arises from the competition of the effective current and the effective frequency [2]. As the high-frequency current increases, the square of the effective frequency increases more than the effective current does. As a result, the effective voltage decreases with the effective current and it leads to an increase of the ion flux and a decrease of the mean ion energy. Because of that, the negative resistance regime can be called the preferable regime for solar cell manufacturing. In this preferable regime, comparison of DF (13.56+100 or 200 MHz) CCP and SF (60 MHz) CCP with the same effective current density is carried out. At the lower effective current density (or at the lower plasma density), the mean ion energy of SF CCP is lower than that of DF CCP. At the higher effective current density (or at the higher plasma density), however, the mean ion energy is lower than that of SF CCP. In this case, using DF CCP is better than SF CCP for solar cell manufacturing processes.

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A Simulation study on the Cardiac Current Density distribution during the Defibrillation Shock (제세동 쇼크에 의한 심장 전류밀도 분포에 관한 시뮬레이션 연구)

  • Lee, J.;Park, K. L.;Lee, K. J.
    • Journal of Biomedical Engineering Research
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    • v.21 no.4
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    • pp.403-409
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    • 2000
  • This paper is about to simulate the defibrillation situations using 3D FE(finite element) thorax model and describes the effects of three clinical electrodes' positions and size and organ's resistivity used in simulation on the characteristics of current density distribution over myocardium. The model was constructed with a eillipsoidal cylinder for the thorax and the 2D Visible Human images for remains. And, the distributions of current density were computed by a commercial program ANSYS 5.4. The electrical shock of the AP(anterior-posterior ) electrode provided more current flows with heart than the others and that of the LL(lateral-lateral) electrode showed the most uniform current density distribution. However, the electrode size had little effect on the current density distribution. In the evaluation of model's sensitivity to tissue resistivity variation, the variation of the myocardium's resistivity most affected the minimum, average and maximum current densities.

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Simulation of a Langmuir Probe in an ECR Reactor (ECR Reactor 내의 Langmuir Probe 시뮬레이션)

  • Kim, Hoon;Porteous, Robert K.;Boswell, Rod W.
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1609-1611
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    • 1994
  • In ECR and helicon reactors for plasma processing, a high density plasma is generated in a source region which is connected to a diffusion region where the processing takes place. Large density and potential gradients can develop at the orifice of the source which drive ion currents into the diffusion region. The average ion velocity may become the order of the sound velocity. Measurements of the ion saturation current to a Langmuir probe are used as a standard method of determining the plasma density in laboratory discharges. However, the analysis becomes difficult in a steaming plasma. We have used the HAMLET plasma simulator to simulate the ion flow to a large langmuir probe in an ECR plasma. The collection surface was aligned with the Held upstream, normal to the field, and downstream. ion trajectories through the electric and magnetic fields were calculated including ion-neutral collisions. We examines the ratio of ion current density to plasma density as a function of magnetic field and pressure.

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Synthesis of Pd and Pt Based Low Cost Bimetallic Anode Electrocatalyst for Glycerol Electrooxidation in Membraneless Air Breathing Microfluidic Fuel Cell

  • Panjiara, Deoashish;Pramanik, Hiralal
    • Journal of Electrochemical Science and Technology
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    • v.12 no.1
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    • pp.38-57
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    • 2021
  • The different weight ratios of Pd to Pt, i.e., 16:4, 10:10, 4:16 in Pd-Pt/C and Pd (20 wt. %) /C electrocatalysts with low metal loading were synthesized for glycerol electrooxidation in an air breathing microfluidic fuel cell (MFC). The cell performance on Pd-Pt (16:4)/C anode electrocatalyst was found best among all the electrocatalysts tested. The single cell when tested at a temperature of 35℃ using Pd-Pt (16:4)/C, showed maximum open circuit voltage (OCV) of 0.70 V and maximum power density of 2.77 mW/㎠ at a current density of 7.71 mA/㎠. The power density increased 1.45 times when cell temperature was raised from 35℃ to 75℃. The maximum OCV of 0.78 V and the maximum power density of 4.03 mW/㎠ at a current density of 10.47 mA/㎠ were observed at the temperature of 75℃. The results of CV substantiate the single cell performance for various operating parameters.

Detail relation of negative ion density with positive ion mass and sheath parameters

  • Kim, Hye-Ran;Woo, Hyun-Jong;Sun, Jong-Ho;Chung, Kyu-Sun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.02a
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    • pp.470-470
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    • 2010
  • Negative ions are generated in fusion edge plasmas, material processing plasmas, ionospheric plasmas. Analytic formulas for the deduction of the absolute density of negative ions was given by using the current-voltage(IV) characteristics of two electric probes at two different pressures [1], and negative ion density has been measured by one electric probe using the current-voltage characteristics of three different pressures [2]. Ratios of ion and electron saturation currents and electron temperatures and sheath areas of different pressures are usually incorporated into two equations with two unknowns for the negative ion density. In the previous publications, the sheath factor(sheath area, sheath density, sheath velocity) and effective masses of background ions with different pressures are qualitatively incorporated for the deduction of negative density. In this presentation, the quantitative and detailed relation of negative ion density with sheath factor and effective masses are going to be given. The effect of these parameters on the change of IV characteristics will be addressed.

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