• 대한기계학회논문집A
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• 제29권6호
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• pp.852-859
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• 2005

Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and Nose-Hoover thermostat is used to control the system temperature. As the simulation results, the adhesion forces between stamp and polymer are calculated and the mechanism of deformation are investigated. The effects of the adhesion and friction forces on the polymer deformation are also studied to analyze the pattern transfer in nanoimprint lithography. The mechanism of polymer deformation is investigated by means of inspecting the indentation process, molecular configurational properties, and molecular configurational energies.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2004년도 추계학술대회
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• pp.410-415
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• 2004

Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and $Nos\acute{e}$-Hoover thermostat is used to control the system temperature. As the simulation results, the adhesion forces between stamp and polymer are calculated and the mechanism of deformation are investigated. The effects of the adhesion force and friction force on the polymer deformation are also studied to analyze the pattern transfer in nanoimprint lithography. The mechanism of polymer deformation is investigated by means of inspecting the indentation process, molecular configurational properties, and molecular configurational energies.

• 반도체디스플레이기술학회지
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• 제16권4호
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• pp.68-74
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• 2017

Nanoimprint lithography (NIL) is a next generation technology for fabrication of micrometer and nanometer scale patterns. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. Up to now there have been a lot of researches on thermal NIL, but most of them have been focused on polymer deformation in the molding process and there are very few studies on the cooling and demolding process. In this paper a cooling process of the polymer resist in thermal NIL is analyzed with finite element method. The modeling of cooling process for mold, polymer resist and substrate is developed. And the cooling process is numerically investigated with the effects of imprinting temperature and residual layer thickness of polymer resist on stress distribution of the polymer resist. The results show that the lower imprinting temperature, the higher the maximum von Mises stress and that the thicker the residual layer, the greater maximum von Mises stress.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회A
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• pp.337-342
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• 2007

In this study, molecular dynamics simulation of nano imprint lithography in which patterned stamp is pressed onto amorphous polyethylene(PE) surface are performed to study the behaviour of polymer. Force fields including bond, angle, torsion, and Lennard Jones potential are used to describe the inter-molecular and intra-molecular force of PE molecules and stamp, substrate. Periodic boundary condition is used in horizontal direction and canonical NVT ensemble is used to control the system temperature. As the simulation results, the behaviour of polymer is investigated during the imprinting process. The mechanism of polymer deformation is studied by means of inspecting the surface shape, volume, density, atom distribution. Deformation of the polymer resist was found for various of the stamp geometry and the alignment state of the polymer molecules.

• 반도체디스플레이기술학회지
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• 제9권3호
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• pp.29-34
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• 2010

Nanoimprint lithography (NIL) is an emerging technology enabling cost effective and high throughput nanofabrication. To successfully imprint a nanometer scale patterns, the understanding of the mechanism in nanoimprint forming is essential. In this paper, a numerical analysis of polymer flow in thermal NIL was performed. First, a finite element model of the periodic mold structure with prescribed boundary conditions was established. Then, the volume of fluid (VOF) and grid deformation method were utilized to calculate the free surfaces of the polymer flow based on an Eulerian grid system. From the simulation, the velocity fields and the imprinting pressure for constant imprinting velocity in thermal NIL were obtained. The velocity field is significant because it can directly describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming. Effects of different mold shapes and various thicknesses of polymer resist were also investigated.

• Elastomers and Composites
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• 제45권3호
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• pp.217-222
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• 2010

여름철 아스팔트의 표면 온도 상승으로 인한 도로의 소성변형과 겨울철 온도 강하로 인한 도로균열이 도로안전 운전을 위협하는 문제로 등장하면서 아스팔트 물성향상을 위한 아스팔트개질의 필요성이 대두되고 있다. 본 연구에서는 아스팔트의 탄성과 소성변형저항성을 증가시키기 위해 아스팔트 물성 노화의 직접적 원인인 햇빛, 특히 자외선을 이용하기 위해, 고분자중합에 사용되는 광개시제를 사용하여 고분자로 개질된 아스팔트를 다시 개질하였다. 인장시험기와 레오미터를 이용하여 기계적 물성과 유변학적 물성을 실험한 결과 열가소성고분자개질아스팔트는 자외선에 의한 가교반응으로 인해 인장강도와 저장탄성률이 크게 증가하였으나 열경화성고분자개질아스팔트에는 영향을 끼치지 못하였다. 장시간 자외선조사 시험에서는 조사시간이 길어짐에 따라 그 물성이 증가되거나 유지되는 거동을 보임으로써 자외선이 아스팔트의 사용수명이 20년이 될 수 있는 효과를 나타내었다.

• 대한기계학회논문집A
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• 제32권4호
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• Elastomers and Composites
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• 제44권1호
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• pp.63-68
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• 2009

여름철 아스팔트의 표면 온도 상승으로 인한 도로의 소성변형과 겨울철 온도 강하로 인한 도로균열이 도로안전운전을 위협하는 문제로 등장하면서 아스팔트 물성향상을 위한 아스팔트개질의 필요성이 대두되고 있다. 본 연구에서는 소성변형 저항성을 증가시키기 위해 소성변형의 직접적인 원인인 햇빛을 이용하기 위해, 고분자중합에 사용되는 광개시제를 사용하여 개질아스팔트를 제조하였다. 인장시험기와 레오미터를 이용하여 기계적 물성과 유변적 물성을 실험한 결과 개질아스팔트는 자외선에 의한 분자간 결합으로 인해 인장강도와 저장탄성률이 크게 증가하였다. 열분석에서는 온도에 따른 잔류 무게 분율이 증가하는 거동을 보여 분자간 결합이 가교반응의 결과임을 나타내었다. 장시간 자외선조사 시험에서는 조사시간이 길어짐에 따라 그 물성이 증가되거나 유지되는 거동을 보임으로써 사용수명이 연장될 수 있는 효과를 나타내었다.

• 한국재료학회지
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• 제16권4호
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• pp.225-230
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• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• 한국구조물진단유지관리공학회 논문집
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• 제19권1호
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• pp.45-52
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• 2015

섬유복합체 (Fiber Reinforced Polymer, FRP)는 비강도가 높고, 비부식성 재료라는 특징을 가지고 있어서 건설 분야에서 철근을 대체할 수 있는 보강근 재료로 인식되고 있다. 몇몇 유리섬유 복합체 (Glass FRP, GFRP) 보강근이 상용화되어 있지만 GFRP는 철근에 비해 가격이 비싸고 상대적으로 낮은 탄성계수와 취성 파괴 특성 때문에 다소 경쟁력이 떨어진다. GFRP 보강근의 재료가격을 낮출 수 없다면 사용된 재료의 성능을 최대로 하여 보강근의 성능을 높이는 것이 상대적인 가격을 낮추는 방법이 될 수 있다. 일반적으로 FRP 보강근의 직경이 커질수록 인장강도는 감소하는 것으로 알려져 있다. 이의 원인 중 하나는 보강근이 인장을 받을 때 외력이 중앙에 위치한 섬유에 충분히 전달되지 못하여 외측에 위한 섬유들만이 인장에 저항하기 때문이다. 따라서 본연의 역할을 수행하지 못하는 섬유는 제거함으로써 보강근의 단가를 낮추면서 보강근이 소정의 성능을 발휘하도록 한다면 가격대비 성능이 최적화된 FRP 보강근을 제작할 수 있다. 본 연구에서는 직경 19 mm의 GFRP 보강근에 대해 단면 내에 중공이 존재하는 경우 중공비율에 따른 인장특성의 변화를 실험적으로 관찰하였다. 중공이 없는 GFRP 보강근 세 개, 네 가지 중공비율에 대해 각각 여섯 개의 GFRP 보강근 시편을 준비하여 인장실험을 실시하였으며 결과 분석을 통하여 인장특성 변화를 도출하였으며 이를 바탕으로 최적의 중공비율을 제안하였다.