대한기계학회논문집A (Transactions of the Korean Society of Mechanical Engineers A)

  • 제29권6호
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  • Pages.852-859
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  • 2005
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  • 1226-4873(pISSN)
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  • 2288-5226(eISSN)
대한기계학회 (The Korean Society of Mechanical Engineers)
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나노임프린트 리소그래피에서의 폴리머 레지스트의 변형에 관한 분자 동역학 시뮬레이션

Molecular Dynamics Simulation of Deformation of Polymer Resist in Nanoimpirnt Lithography

  • 김광섭 (한국과학기술원 기계공학과) ;
  • 김경웅 (한국과학기술원 기계공학과) ;
  • 강지훈 (한국과학기술원 기계공학과)
  • 발행 : 2005.06.01
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초록

Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and Nose-Hoover thermostat is used to control the system temperature. As the simulation results, the adhesion forces between stamp and polymer are calculated and the mechanism of deformation are investigated. The effects of the adhesion and friction forces on the polymer deformation are also studied to analyze the pattern transfer in nanoimprint lithography. The mechanism of polymer deformation is investigated by means of inspecting the indentation process, molecular configurational properties, and molecular configurational energies.

키워드

참고문헌

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피인용 문헌

  1. Fracture Behavior of Glass/Resin/Glass Sandwich Structures with Different Resin Thicknesses vol.34, pp.12, 2010, https://doi.org/10.3795/KSME-A.2010.34.12.1849
  2. Molecular dynamics study of pattern transfer in nanoimprint lithography vol.25, pp.2, 2007, https://doi.org/10.1007/s11249-006-9053-4