• Transactions of the Korean Society of Mechanical Engineers A
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• v.29 no.6 s.237
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• pp.852-859
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• 2005

Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and Nose-Hoover thermostat is used to control the system temperature. As the simulation results, the adhesion forces between stamp and polymer are calculated and the mechanism of deformation are investigated. The effects of the adhesion and friction forces on the polymer deformation are also studied to analyze the pattern transfer in nanoimprint lithography. The mechanism of polymer deformation is investigated by means of inspecting the indentation process, molecular configurational properties, and molecular configurational energies.

• Proceedings of the KSME Conference
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• 2004.11a
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• pp.410-415
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• 2004

Molecular dynamics simulations of nanoimprint lithography in which a stamp with patterns is pressed onto amorphous poly-(methylmethacrylate) (PMMA) surface are performed to study the deformation of polymer. Force fields including bond, angle, torsion, inversion, van der Waals and electrostatic potential are used to describe the intermolecular and intramolecular force of PMMA molecules and stamp. Periodic boundary condition is used in horizontal direction and $Nos\acute{e}$-Hoover thermostat is used to control the system temperature. As the simulation results, the adhesion forces between stamp and polymer are calculated and the mechanism of deformation are investigated. The effects of the adhesion force and friction force on the polymer deformation are also studied to analyze the pattern transfer in nanoimprint lithography. The mechanism of polymer deformation is investigated by means of inspecting the indentation process, molecular configurational properties, and molecular configurational energies.

• Journal of the Semiconductor & Display Technology
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• v.16 no.4
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• pp.68-74
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• 2017

Nanoimprint lithography (NIL) is a next generation technology for fabrication of micrometer and nanometer scale patterns. There have been considerable attentions on NIL due to its potential abilities that enable cost-effective and high-throughput nanofabrication to the display device and semiconductor industry. Up to now there have been a lot of researches on thermal NIL, but most of them have been focused on polymer deformation in the molding process and there are very few studies on the cooling and demolding process. In this paper a cooling process of the polymer resist in thermal NIL is analyzed with finite element method. The modeling of cooling process for mold, polymer resist and substrate is developed. And the cooling process is numerically investigated with the effects of imprinting temperature and residual layer thickness of polymer resist on stress distribution of the polymer resist. The results show that the lower imprinting temperature, the higher the maximum von Mises stress and that the thicker the residual layer, the greater maximum von Mises stress.

• Proceedings of the KSME Conference
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• 2007.05a
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• pp.337-342
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• 2007

In this study, molecular dynamics simulation of nano imprint lithography in which patterned stamp is pressed onto amorphous polyethylene(PE) surface are performed to study the behaviour of polymer. Force fields including bond, angle, torsion, and Lennard Jones potential are used to describe the inter-molecular and intra-molecular force of PE molecules and stamp, substrate. Periodic boundary condition is used in horizontal direction and canonical NVT ensemble is used to control the system temperature. As the simulation results, the behaviour of polymer is investigated during the imprinting process. The mechanism of polymer deformation is studied by means of inspecting the surface shape, volume, density, atom distribution. Deformation of the polymer resist was found for various of the stamp geometry and the alignment state of the polymer molecules.

• Journal of the Semiconductor & Display Technology
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• v.9 no.3
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• pp.29-34
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• 2010

Nanoimprint lithography (NIL) is an emerging technology enabling cost effective and high throughput nanofabrication. To successfully imprint a nanometer scale patterns, the understanding of the mechanism in nanoimprint forming is essential. In this paper, a numerical analysis of polymer flow in thermal NIL was performed. First, a finite element model of the periodic mold structure with prescribed boundary conditions was established. Then, the volume of fluid (VOF) and grid deformation method were utilized to calculate the free surfaces of the polymer flow based on an Eulerian grid system. From the simulation, the velocity fields and the imprinting pressure for constant imprinting velocity in thermal NIL were obtained. The velocity field is significant because it can directly describe the mode of the polymer deformation, which is the key role to determine the mechanism of nanoimprint forming. Effects of different mold shapes and various thicknesses of polymer resist were also investigated.

• Elastomers and Composites
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• v.45 no.3
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• pp.217-222
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• 2010

Paved roads are suffered from the permanent plastic deformation in hot summer and cracks in cold winter, which are detrimental to safe driving. This leads to necessity of modification of asphalt to resist those deformation. In this study, two kinds of modifiers were examined; organic polymers and a photoinitiator which is activated by ultraviolet lay. The mechanical and rheololgical properties of modified asphalts were examined using UTM and rheometer. Results showed that the properties were varied depending on the types of polymer and irradiation time. UV irradiation increased the tensile strength and storage modulus of thermoplastic polymer-modified asphalt, however UV was not effective on thermoset polymer. According to long term ultraviolet curing test, properties of the polymer/photoinitiator-modified asphalt did not decrease, but rather increase for 20 years. This indicates that the useful life of the asphalt could be extended by addition of photoinitiator.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.32 no.4
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• pp.303-309
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• 2008

Dense and fine polymer patterns often collapse, as they come into contact with each other at their protruding tips. Resist pattern collapse depends on the aspect ratio of patterns and the surface tension of rinsing materials. The pattern collapse is a very serious problem in microfabrication, because it is one of the factors which limit the device dimensions. The reasons for the pattern collapse are known as the surface tension of rinse liquid, centrifugal force and rinse liquid flow produced in the developing process. In this work, we tried to evaluate the pattern collapse of three-dimensional microstructures that were fabricated by two-photon induced photopolymerization, and showed the way how to reduce the deformation of microstructures.

• Elastomers and Composites
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• v.44 no.1
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• pp.63-68
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• 2009

Recently, much attention has focused on the permanent deformation of roads in hot summer and cracks in cold winter, which are detrimental to safe driving. This leads to necessity of modification of asphalt to resist those deformation. In this study, a type of modified asphalt was prepared by addition of a photoinitiator which is activated by ultraviolet lay. The mechanical and rheololgical properties of photoinitiator-modified asphalt were examined using UTM and rheometer. Results showed that the modified asphalt was effected by ultraviolet and thus tensile strength and storage modulus increased, due to molecular attraction, with initiator content and irradiation dose. Thermal analysis showed less weight loss upon photoinitiator-modification and this indicated that the molecular attraction is the result of cross linking reaction between asphalt molecules induced by photoinitiator. According to long term ultraviolet curing test, properties of the photoinitiator-modified asphalt did not decrease or even increase for 20 years. This indicates that useful life of the asphalt could be extended by addition of photoinitiator.

• Korean Journal of Materials Research
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• v.16 no.4
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• pp.225-230
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• 2006

Nanoimprint lithography (NIL) is a novel method of fabricating nanometer scale patterns. It is a simple process with low cost, high throughput and resolution. NIL creates patterns by mechanical deformation of an imprint resist and physical contact process. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting process. Stiction between the resist and the stamp is resulted from this physical contact process. Stiction issue is more important in the stamps including narrow pattern size and wide area. Therefore, the antistiction layer coating is very effective to prevent this problem and ensure successful NIL. In this paper, an antistiction layer was deposited and characterized by PECVD (plasma enhanced chemical vapor deposition) method for metal stamps. Deposition rates of an antistiction layer on Si and Ni substrates were in proportion to deposited time and 3.4 nm/min and 2.5 nm/min, respectively. A 50 nm thick antistiction layer showed 90% relative transmittance at 365 nm wavelength. Contact angle result showed good hydrophobicity over 105 degree. $CF_2$ and $CF_3$ peaks were founded in ATR-FTIR analysis. The thicknesses and the contact angle of a 50 nm thick antistiction film were slightly changed during chemical resistance test using acetone and sulfuric acid. To evaluate the deposited antistiction layer, a 50 nm thick film was coated on a stainless steel stamp made by wet etching process. A PMMA substrate was successfully imprinting without pattern degradations by the stainless steel stamp with an antistiction layer. The test result shows that antistiction layer coating is very effective for NIL.

• Journal of the Korea institute for structural maintenance and inspection
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• v.19 no.1
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• pp.45-52
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• 2015

Fiber-reinforced polymer (FRP) has been generally accepted by civil engineers as an alternative for steel reinforcing bars (rebar) due to its advantageous specific tensile strength and non-corrosiveness. Even though some glass fiber reinforced polymer (GFRP) rebars are available on a market, GFRP is still somewhat uncompetitive over steel rebar due to their high cost and relatively low elastic modulus, and brittle failure characteristic. If the price of component materials of GFRP rebar is not reduced, it would be another solution to increase the performance of each material to the highest degree. The tensile strength generally decreases with increasing diameter of FRP rebar. One of the reasons is that only fibers except for fibers in center resist the external force due to the lack of force transfer and the deformation of only outer fibers by gripping system. Eliminating fibers in the center, which do not play an aimed role fully, are helpful to reduce the price and finally FRP rebar would be optimized over the price. In this study, the effect of the hollow section in a cross-section of a GFRP rebar was investigated. A GFRP rebar with 19 mm diameter was selected and an analysis was performed for the tensile test results. Parameter was the ratio of hollow section over solid cross-section. Four kinds of hollow sections were planned. A total of 27 specimens, six specimens for each hollow section and three specimens with a solid cross-section were manufactured and tested. The change by the ratio of hollow section over solid cross-section was analyzed and an optimized cross-section design was proposed.