• Title/Summary/Keyword: DC Sputtering

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Adhesion Enhancement of Thin Film Metals on Polyimide Substrates by Bias Sputtering

  • Kim S. Y.;Jo S. S.;Kang J. S.;Kim Y. H.
    • Journal of the Microelectronics and Packaging Society
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    • v.12 no.3 s.36
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    • pp.207-212
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    • 2005
  • Al, Ti, Ta, and Cr thin films were deposited on a polyimide substrate using DC magnetron sputter to study the adhesion characteristics of metal films on polyimide substrates, while RF bias of 0 - 400 W was applied to the substrate during DC sputtering. The adhesion strength was evaluated using a 90-degree peel test. The peel tests showed that the adhesion strength was enhanced by applying the RF bias to the substrate in all specimens. Scanning electron microscopy and Auger depth profile of the fractured surfaces indicate that the polyimide underwent cohesive failure during peeling and heavy deformation was also observed in the metal films peeled from the polyimide substrate when the RF bias applied during the deposition. Cross-sectional transmission electron microscopy revealed that the metal/polyimide interface was not clear and complicated. This complicated interface, likely formed due to the RF bias applied to the substrate, was attributed to the adhesion enhancement observed during the bias sputtering.

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Preparation and Characterization of IZO Thin Films grown by DC Magnetron Sputtering (DC 마그네트론 스퍼터링을 이용한 IZO 박막의 제조와 특성 연구)

  • Park Chang-Ha;Lee Hak-Jun;Kim Hyeon-Boum;Kim Dong-Ho;Lee Gun-Hwan
    • Journal of the Korean institute of surface engineering
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    • v.38 no.5
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    • pp.188-192
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    • 2005
  • Indium zinc oxide (IZO) thin films were deposited on glass substrate by dc magnetron sputtering. The effects of oxygen flow rate and deposition temperature on electrical and optical properties of the films were investigated. With addition of small amount of oxygen gas, the characteristic properties of amorphous IZO films were improved and the specific resistivity was about $4.8{\times}10^{-4}\Omega{\cdot}cm$. Change of structural properties according to the deposition temperature was observed with XRD, SEM, and AFM. Films deposited above $300^{\circ}C$ were found to be polycrystalline. Surface roughness of the films was increased due to the formation of grains on the surface. Electrical conductivity became deteriorated for polycrystalline IZO films. Consequently, high quality IZO films could be prepared by do sputtering with $O_{2}/Ar{\simeq}0.03$ and deposition temperature in range of $150\~200^{\circ}C$; a specific resistivity of $3.4{\times}10^{-4}{\Omega}{\cdot}cm$, an optical transmission over $90\%$ at wavelength of 550 nm, and a rms value of surface roughness about $3{\AA}$.

The Effect of Sputtering Process Variables on the Properties of Pd Alloy Hydrogen Separation Membranes (스퍼터 공정변수가 팔라듐 합금 수소분리막의 특성에 미치는 영향)

  • Han, Jae-Yun;Joo, Sae-Rom;Lee, Jun-Hyong;Park, Dong-Gun;Kim, Dong-Won
    • Journal of the Korean institute of surface engineering
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    • v.46 no.6
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    • pp.248-257
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    • 2013
  • It is generally recognized that thin Pd-Cu alloy films fabricated by sputtering show a wide range of microstructures and properties, both of which are highly dependent on the sputtering conditions. In view of this, the present study aims to investigate the relationship between the performance of hydrogen separation membranes and the microstructure of Pd alloy films depending on sputtering deposition conditions such as substrate temperature, working pressure, and DC power. We fabricated thin and dense Pd-Cu alloy membranes by the micro-polishing of porous Ni support, an advanced Pd-Cu sputtered multi-deposition under the conditions of high substrate temperature / low working pressure / high DC power, and a followed by Cu-reflow heat-treatment. The result of a hydrogen permeation test indicated that the selectivity for $H_2/N_2$ was infinite because of the void-free and dense surface of the Pd alloy membranes, and the hydrogen permeability was 10.5 $ml{\cdot}cm^{-2}{\cdot}min^{-1}{\cdot}atm^{-1}$ for a 6 ${\mu}m$ membrane thickness.